4WAVE,INC.
Patent Owner
Stats
- 10 US PATENTS IN FORCE
- 0 US APPLICATIONS PENDING
- Dec 11, 2012 most recent publication
Details
- 10 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 178 Total Citation Count
- Mar 16, 2001 Earliest Filing
- 6 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
Rank in Class
Top Patents (by citation)
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Recent Publications
- No Recent Publications to Display
Recent Patents
Patent #
Title
Filing Date
Issue Date
Intl Class
6819871 Multi-channel optical filter and multiplexer formed from stacks of thin-film layersMar 16, 01Nov 16, 04[G02B, H04J]
6723209 System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicalsJul 22, 02Apr 20, 04[C23C]
6679976 System and method for performing sputter deposition with multiple targets using independent ion and electron sources and independent target biasing with DC pulse signalsMay 02, 02Jan 20, 04[C23C]
6488821 System and method for performing sputter deposition using a divergent ion beam source and a rotating substrateMay 02, 02Dec 03, 02[C23C]
6419802 System and method for controlling deposition thickness by synchronously varying a sputtering rate of a target with respect to a position of a rotating substrateMar 16, 01Jul 16, 02[C23C, B05C]
6402900 System and method for performing sputter deposition using ion sources, targets and a substrate arranged about the faces of a cubeMar 16, 01Jun 11, 02[C23C]
6402901 System and method for performing sputter deposition using a spherical geometryMar 16, 01Jun 11, 02[C23C]
6402904 System and method for performing sputter deposition using independent ion and electron sources and a target biased with an a-symmetric bi-polar DC pulse signalMar 16, 01Jun 11, 02[C23C]
6402905 System and method for controlling deposition thickness using a mask with a shadow that varies along a radius of a substrateMar 16, 01Jun 11, 02[C23C, B05C]
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
7316764 System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signalExpiredMar 29, 04Jan 08, 08[C23C]
6689255 System and method for making thin-film structures using a stepped profile maskExpiredJun 10, 02Feb 10, 04[C23C]
2002/0174,832 System and method for controlling deposition thickness by synchronously varying a sputtering rate of a target with respect to an angular position of a rotating substrateAbandonedApr 25, 02Nov 28, 02[B31C]
2002/0130,040 System and method for performing sputter deposition using a devergent ion beam source and a rotating substrateAbandonedMar 16, 01Sep 19, 02[C23C, G02B]
6419803 System and method for making thin-film structures using a stepped profile maskExpiredMar 16, 01Jul 16, 02[C23C, B05D]
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