ADVANCED MICRO-FABRICATION EQUIPMENT, INC. CHINA

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1091
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 729
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 4358
 
  
 
H05H PLASMA TECHNIQUE 228
 
  
 
B65G TRANSPORT OR STORAGE DEVICES, e.g. CONVEYERS FOR LOADING OR TIPPING; SHOP CONVEYER SYSTEMS; PNEUMATIC TUBE CONVEYERS 166
 
  
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 1158
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 1127
 
  
 
H05B ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR 1110

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9099284 Method and system for autotuning of RF matchDec 26, 11Aug 04, 15[H01J, H01L, G01R, H03H]
9095038 ICP source design for plasma uniformity and efficiency enhancementDec 26, 11Jul 28, 15[H01J, H01L, H05H, C23F]
8715418 Semiconductor processing system; a semiconductor processing chamber; and a method for loading, unloading and exchanging semiconductor work pieces from a semiconductor processing chamberMay 24, 06May 06, 14[C23C, H01L]
8608851 Plasma confinement apparatus, and method for confining a plasmaOct 10, 06Dec 17, 13[C23C]
8414702 Plasma processing apparatusApr 07, 11Apr 09, 13[C23C, H01L, C23F]
8366829 Multi-station decoupled reactive ion etch chamberJul 02, 07Feb 05, 13[C23C, H01L, C23F]
8336488 Multi-station plasma reactor with multiple plasma regionsDec 20, 07Dec 25, 12[C23C]
8297225 Capacitive CVD reactor and methods for plasma CVD processJul 06, 09Oct 30, 12[C23C, C23F]
8111499 System and method of sensing and removing residual charge from a processed waferJul 17, 09Feb 07, 12[H01L, H01T]
7992518 Silicon carbide gas distribution plate and RF electrode for plasma etch chamberMar 21, 07Aug 09, 11[C23C, H01L, C23F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2013/0048,216 CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESSAbandonedOct 29, 12Feb 28, 13[C23C, H05H, B44C]
2012/0075,033 SINGLE MATCHING NETWORK FOR MATCHING MULTI-FREQUENCY AND METHOD OF CONSTRUCTURING THE SAME AND RADIO FREQUENCY POWER SOURCE SYSTEM USING THE SAMEAbandonedSep 21, 11Mar 29, 12[H01R, H03H]

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