AISAWA TECHNOLOGIES, LLC

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Patent Activity in the Last 10 Years

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H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 22340

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
6432772 Method of forming a lower storage node of a capacitorAug 30, 01Aug 13, 02[H01L]
6426256 Method for fabricating an embedded DRAM with self-aligned borderless contactsAug 17, 99Jul 30, 02[H01L]
6337240 Method for fabricating an embedded dynamic random access memoryJan 25, 99Jan 08, 02[H01L]
6303424 Method for fabricating a buried bit line in a DRAM cellOct 21, 99Oct 16, 01[H01L]
6291295 Method of forming a storage electrode of a capacitor on an ion-implanted isolation layerMay 24, 99Sep 18, 01[H01L]
6277685 Method of forming a node contact hole on a semiconductor waferOct 20, 99Aug 21, 01[H01L]
6277694 Fabrication method for a metal oxide semiconductor having a double diffused drainNov 08, 99Aug 21, 01[H01L]
6261968 Method of forming a self-aligned contact hole on a semiconductor waferFeb 04, 00Jul 17, 01[H01L]
6200848 Method of fabricating self-aligned contact in embedded DRAMDec 08, 98Mar 13, 01[H01L]
6156664 Method of manufacturing liner insulating layerMar 11, 99Dec 05, 00[H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
6406971 Fabrication method for an embedded dynamic random access memory (DRAM)ExpiredMar 06, 01Jun 18, 02[H01L]
6403411 Method for manufacturing lower electrode of DRAM capacitorExpiredDec 08, 98Jun 11, 02[H01L]
6368935 Method for upgrading quality of DRAM capacitor and wafer-to-wafer uniformityExpiredJan 31, 01Apr 09, 02[H01L]
6329291 Method of forming a lower storage node of a capacitor for dynamic random access memoryExpiredJan 28, 00Dec 11, 01[H01L]
6313006 Method of field implantationExpiredMar 26, 98Nov 06, 01[H01L]
6238972 Method for increasing capacitanceExpiredJun 12, 98May 29, 01[H01L]
6190962 Method of fabricating capacitorExpiredDec 20, 99Feb 20, 01[H01L]
6169016 Method of forming contactExpiredOct 28, 98Jan 02, 01[H01L]
6169041 Method for enhancing the reliability of a dielectric layer of a semiconductor waferExpiredNov 01, 99Jan 02, 01[H01L]
6150223 Method for forming gate spacers with different widthsExpiredApr 07, 99Nov 21, 00[H01L]

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