AIXTRON AG

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1685
 
  
 
C30B SINGLE-CRYSTAL GROWTH 551
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 4358
 
  
 
B05C APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 144
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 135
 
  
 
F25D REFRIGERATORS; COLD ROOMS; ICE-BOXES; COOLING OR FREEZING APPARATUS NOT COVERED BY ANY OTHER SUBCLASS 145
 
  
 
F27B FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS123

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8685500 Method for depositing a thin-film polymer in a low-pressure gas phaseMay 14, 09Apr 01, 14[C23C]
8152927 CVD coating deviceNov 22, 05Apr 10, 12[C23C]
8052796 CVD reactor comprising a photodiode arrayAug 16, 06Nov 08, 11[C23C]
7842135 Equipment innovations for nano-technology aquipment, especially for plasma growth chambers of carbon nanotube and nanowireJan 09, 06Nov 30, 10[C23C]
7762208 Loading and unloading apparatus for a coating deviceJul 23, 07Jul 27, 10[C23C, B05C, C23F]
7625448 Inlet system for an MOCVD reactorAug 28, 06Dec 01, 09[C30B]
7524532 Process for depositing thin layers on a substrate in a process chamber of adjustable heightOct 18, 04Apr 28, 09[C23C]
7410670 Process and apparatus for depositing single-component or multi-component layers and layer sequences using discontinuous injection of liquid and dissolved starting substances via a multi-channel injection unitMar 16, 06Aug 12, 08[C23C]
7332038 Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substratesMar 03, 03Feb 19, 08[C23C]
7201942 Coating methodAug 09, 02Apr 10, 07[C23C]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2011/0293,832 Method and apparatus for depositing thin layers of polymeric para-xylylene or substituted para-xylyleneAbandonedJun 03, 09Dec 01, 11[C23C]
2011/0070,370 THERMAL GRADIENT ENHANCED CHEMICAL VAPOUR DEPOSITION (TGE-CVD)AbandonedNov 25, 10Mar 24, 11[C23C]
7709398 Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditionedExpiredOct 31, 05May 04, 10[H01L]
2010/0037,827 CVD Device with Substrate Holder with Differential Temperature ControlAbandonedAug 31, 09Feb 18, 10[C23C]
7473316 Method of growing nitrogenous semiconductor crystal materialsExpiredJul 24, 00Jan 06, 09[C30B]
7294207 Gas-admission element for CVD processes, and deviceExpiredMar 24, 03Nov 13, 07[C23C]
7282096 Arrangement comprising a support body and a substrate holder which is driven in rotation and gas-supported thereonExpiredNov 26, 03Oct 16, 07[C23C]
2007/0074,661 CVD reactor with stabilized process chamber heightAbandonedAug 28, 06Apr 05, 07[C23C]
2007/0009,659 Process for the self-limiting deposition of one or more monolayersAbandonedJun 19, 06Jan 11, 07[C23C]
7147718 Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substratesExpiredMar 03, 03Dec 12, 06[C23C]
7135073 Method and system for semiconductor crystal production with temperature managementExpiredJun 01, 01Nov 14, 06[C30B]
2006/0124,055 Mask-retaining deviceAbandonedNov 23, 05Jun 15, 06[B05C]
7048802 CVD reactor with graphite-foam insulated, tubular susceptorExpiredMay 07, 03May 23, 06[H01L]
6972050 Method for depositing in particular crystalline layers, and device for carrying out the methodExpiredMay 15, 03Dec 06, 05[C30B]
6964876 Method and device for depositing layersExpiredNov 17, 03Nov 15, 05[H01L]
6962624 Method and device for depositing in particular organic layers using organic vapor phase depositionExpiredMar 28, 03Nov 08, 05[C30B]
2005/0214,102 Loading and unloading apparatus for a coating deviceAbandonedJan 19, 05Sep 29, 05[B65G]
6932866 Method for depositing in particular crystalline layersExpiredJun 23, 03Aug 23, 05[C30B]
6908838 Method and device for treating semiconductor substratesExpiredJun 23, 03Jun 21, 05[H01L]
6905548 Device for the deposition of crystalline layers on crystalline substratesExpiredMar 03, 03Jun 14, 05[C23C, H01L]

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