APPLIED MATERIALS, INC.

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Technologies

Intl Class Technology MATTERS Rank in Class
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 2791 14
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1648 1
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 672 4
 
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 575 1
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 237 2
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 205 254
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 192 3
 
 
H05H PLASMA TECHNIQUE 160 1
 
 
C25D PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING 159 2
 
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 150 69
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Top Patents (by citation)

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0029,126 CONTROLLING AN INTENSITY PROFILE OF AN ENERGY BEAM WITH A DEFORMABLE MIRROR IN ADDITIVE MANUFACTURING Jul 20, 17 Feb 01, 18 [H04N, G02B, B29C, B22F, B33Y]
2018/0030,589 ION ASSISTED DEPOSITION TOP COAT OF RARE-EARTH OXIDE Sep 27, 17 Feb 01, 18 [C23C, H01J]
2018/0031,964 Extreme Ultraviolet Mask Blank With Multilayer Absorber And Method Of Manufacture Jul 18, 17 Feb 01, 18 [G03F]
2018/0031,965 Extreme Ultraviolet Mask Blank With Alloy Absorber And Method Of Manufacture Jul 18, 17 Feb 01, 18 [G03F]
2018/0033,610 CVD SILICON MONOLAYER FORMATION METHOD AND GATE OXIDE ALD FORMATION ON SEMICONDUCTOR MATERIALS Oct 06, 17 Feb 01, 18 [H01L]
2018/0033,615 SILICON GERMANIUM SELECTIVE OXIDATION PROCESS Jan 24, 17 Feb 01, 18 [H01L]
2018/0033,619 PERFORMING DECOUPLED PLASMA FLUORINATION TO REDUCE INTERFACIAL DEFECTS IN FILM STACK Jan 27, 17 Feb 01, 18 [H01L]
2018/0033,621 METHOD OF FORMING STRUCTURES WITH V SHAPED BOTTOM ON SILICON SUBSTRATE Jan 27, 17 Feb 01, 18 [H01L]
2018/0033,652 FLOW CONTROLLED LINER HAVING SPATIALLY DISTRIBUTED GAS PASSAGES Sep 26, 17 Feb 01, 18 [C23C, H01L]
2018/0033,659 GAS PURGE SYSTEM AND METHOD FOR OUTGASSING CONTROL Jan 24, 17 Feb 01, 18 [B08B, H01L, C30B]
2018/0033,667 WAFER EDGE MEASUREMENT AND CONTROL Oct 06, 17 Feb 01, 18 [H01L]
2018/0033,872 METHOD OF EPITAXIAL GROWTH SHAPE CONTROL FOR CMOS APPLICATIONS Jan 27, 17 Feb 01, 18 [H01L]
2018/0033,873 METHOD OF UNIFORM CHANNEL FORMATION Jun 08, 17 Feb 01, 18 [H01L]
2018/0034,240 FAILURE DETECTION OF LASER DIODES Mar 17, 16 Feb 01, 18 [H01S]
2018/0021,918 RETAINING RING FOR CMP Jul 24, 17 Jan 25, 18 [B24B, H01L]
2018/0023,191 Fine Leveling Of Large Carousel Based Susceptor Jul 24, 17 Jan 25, 18 [C23C, H01L]
2018/0023,193 A METHOD AND SYSTEM FOR HIGH TEMPERATURE CLEAN Jul 19, 17 Jan 25, 18 [C23C]
2018/0023,214 HEATING MODULATORS TO IMPROVE EPI UNIFORMITY TUNING Jul 21, 17 Jan 25, 18 [C23C, C30B]
2018/0024,436 ACTIVE EYE-TO-EYE WITH ALIGNMENT BY X-Y CAPACITANCE MEASUREMENT Jun 21, 17 Jan 25, 18 [G03F]
2018/0024,441 TWISTED KALEIDO Jul 21, 17 Jan 25, 18 [G03B, G02B, G03F, F21V]
2018/0024,444 PIECEWISE ALIGNMENT MODELING METHOD Jul 07, 17 Jan 25, 18 [G03F]
2018/0024,447 Cleaning Solution Mixing System With Ultra-Dilute Cleaning Solution And Method Of Operation Thereof Jul 18, 17 Jan 25, 18 [B08B, G03F, C11D, B01F]
2018/0024,448 FOCUS CENTERING METHOD FOR DIGITAL LITHOGRAPHY Jul 13, 17 Jan 25, 18 [G03F]
2018/0024,573 METHODS FOR MONITORING A FLOW CONTROLLER COUPLED TO A PROCESS CHAMBER Aug 28, 17 Jan 25, 18 [G01F, G05D]
2018/0025,890 PLASMA UNIFORMITY CONTROL BY GAS DIFFUSER HOLE DESIGN Sep 28, 17 Jan 25, 18 [C23C, H01J]
2018/0025,895 PHYSICAL VAPOR DEPOSITION (PVD) PLASMA ENERGY CONTROL PER DYNAMIC MAGNETRON CONTROL Oct 11, 16 Jan 25, 18 [C23C, H01J, H01L]
2018/0025,900 ALKALI METAL AND ALKALI EARTH METAL REDUCTION Jul 22, 16 Jan 25, 18 [H01L]
2018/0025,914 METHODS FOR HIGH TEMPERATURE ETCHING A MATERIAL LAYER USING PROTECTION COATING Jul 22, 16 Jan 25, 18 [H01L]
2018/0025,924 METHODS AND APPARATUS FOR RAPIDLY COOLING A SUBSTRATE Oct 02, 17 Jan 25, 18 [H01L]
2018/0025,931 PROCESSED WAFER AS TOP PLATE OF A WORKPIECE CARRIER IN SEMICONDUCTOR AND MECHANICAL PROCESSING Jul 22, 16 Jan 25, 18 [C23C, H01L]
2018/0025,932 LAMINATED TOP PLATE OF A WORKPIECE CARRIER IN MICROMECHANICAL AND SEMICONDUCTOR PROCESSING Nov 21, 16 Jan 25, 18 [H05B, H01L]
2018/0026,054 HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM OXIDE UTILIZED IN DISPLAY DEVICES Jul 12, 17 Jan 25, 18 [H01L]
2018/0026,055 HYBRID HIGH-K DIELECTRIC MATERIAL FILM STACKS COMPRISING ZIRCONIUM OXIDE UTILIZED IN DISPLAY DEVICES Jun 08, 17 Jan 25, 18 [H01L]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9878421 Chemical mechanical polishing retaining ring with integrated sensor May 22, 15 Jan 30, 18 [B24B]
9879341 Method and apparatus for microwave assisted chalcogen radicals generation for 2-D materials Jun 21, 16 Jan 30, 18 [C23C, H01L]
9879348 High purity metallic top coat for semiconductor manufacturing components May 15, 17 Jan 30, 18 [C23C, C25D]
9879358 Heat shield ring for high growth rate EPI chamber May 25, 16 Jan 30, 18 [C23C, H01J, C30B]
9880233 Methods and apparatus to determine parameters in metal-containing films Apr 27, 11 Jan 30, 18 [G01R, G01B, G01N]
9881398 Trend dynamic sensor imaging using contour maps to visualize multiple trend data sets in a single view Nov 01, 13 Jan 30, 18 [G06T, G06F]
9881787 Deposition methods for uniform and conformal hybrid titanium oxide films Jun 16, 16 Jan 30, 18 [H01L]
9881790 Method to enhance growth rate for selective epitaxial growth Apr 05, 16 Jan 30, 18 [H01L]
9881805 Silicon selective removal Feb 29, 16 Jan 30, 18 [H01J, H01L]
9883549 Substrate support assembly having rapid temperature control Jan 16, 16 Jan 30, 18 [H05B, B05C, H01L]
9873179 Carrier for small pad for chemical mechanical polishing Jan 20, 16 Jan 23, 18 [B24B]
9873180 CMP pad construction with composite material properties using additive manufacturing processes Apr 24, 15 Jan 23, 18 [B24B, B29C, B24D, B33Y]
9873945 Common deposition platform, processing station, and method of operation thereof Apr 26, 13 Jan 23, 18 [C23C, H01J]
9874524 In-situ spatially resolved plasma monitoring by using optical emission spectroscopy Mar 04, 16 Jan 23, 18 [G01J, H01J, G01N]
9875888 High temperature silicon oxide atomic layer deposition technology Oct 01, 15 Jan 23, 18 [C23C, H01L]
9875889 Atomic layer deposition of films comprising Si(C)N using hydrazine, azide and/or silyl amine derivatives Jan 19, 16 Jan 23, 18 [C23C, H01L]
9875907 Self-aligned shielding of silicon oxide Aug 11, 16 Jan 23, 18 [H01J, H01L]
9875923 Control systems employing deflection sensors to control clamping forces applied by electrostatic chucks, and related methods Dec 20, 16 Jan 23, 18 [H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2017/0110,475 HIGH ASPECT RATIO 3-D FLASH MEMORY DEVICE ABAN Dec 28, 16 Apr 20, 17 [H01L]
2017/0017,146 PROCESS FOR REMOVING CONTAMINATION ON RUTHENIUM SURFACE ABAN Jul 13, 15 Jan 19, 17 [B08B, G03F]
2016/0307,748 Deposition Of Si-H Free Silicon Nitride ABAN Apr 20, 16 Oct 20, 16 [H01L]
2016/0300,757 DIELECTRIC CONSTANT RECOVERY ABAN Mar 29, 16 Oct 13, 16 [H01L]
2016/0260,602 ADHESION IMPROVEMENTS FOR OXIDE-SILICON STACK ABAN Oct 15, 14 Sep 08, 16 [H01L]
2016/0237,584 ELECTROPLATING WITH REDUCED AIR BUBBLE DEFECTS ABAN Feb 12, 15 Aug 18, 16 [H01L, C25D]
2016/0201,986 SUBSTRATE HOLDER ASSEMBLY, APPARATUS, AND METHODS ABAN Jan 09, 15 Jul 14, 16 [F26B]
2016/0197,015 HYBRID WAFER DICING APPROACH USING A POLYGON SCANNING-BASED LASER SCRIBING PROCESS AND PLASMA ETCH PROCESS ABAN Jan 05, 15 Jul 07, 16 [H01J, H01L]
2016/0176,014 SYSTEMS, APPARATUS, AND METHODS FOR AN IMPROVED POLISHING HEAD GIMBAL USING A SPHERICAL BALL BEARING ABAN Feb 17, 15 Jun 23, 16 [B24B]
2016/0172,238 SELECTIVE SEALANT REMOVAL ABAN Dec 12, 14 Jun 16, 16 [H01L]
2016/0136,780 Using A Carrier Head With Shims ABAN Jan 26, 16 May 19, 16 [B24B]
2016/0133,441 ETCH ENHANCEMENT VIA CONTROLLED INTRODUCTION OF CHAMBER CONTAMINANTS ABAN Nov 07, 14 May 12, 16 [C23C, H01J]
2016/0126,134 SYSTEMS AND METHODS FOR REMOVING CONTAMINATION FROM SEED LAYER SURFACE ABAN Oct 29, 14 May 05, 16 [H01L, C25D]
2016/0104,639 SURFACE TREATMENT TO IMPROVE CCTBA BASED CVD CO NUCLEATION ON DIELECTRIC SUBSTRATE ABAN Dec 21, 15 Apr 14, 16 [H01L]
2016/0104,771 COMMON CONTACT OF N++ AND P++ TRANSISTOR DRAIN REGIONS IN CMOS ABAN Sep 28, 15 Apr 14, 16 [H01L]
2016/0099,173 METHODS FOR ETCHING A BARRIER LAYER FOR AN INTERCONNECTION STRUCTURE FOR SEMICONDUCTOR APPLICATIONS ABAN Oct 03, 14 Apr 07, 16 [H01L]
2016/0086,794 NITROGEN DOPED AMORPHOUS CARBON HARDMASK ABAN Jun 18, 13 Mar 24, 16 [H01L]
2016/0079,088 METHOD FOR ETCHING A HARDMASK LAYER FOR AN INTERCONNECTION STRUCTURE FOR SEMICONDUCTOR APPLICATIONS ABAN Sep 12, 14 Mar 17, 16 [H01L]
2016/0068,969 INTEGRATED PROCESSING FOR MICROCONTAMINATION PREVENTION ABAN Sep 05, 14 Mar 10, 16 [C23F, H01J]
2016/0045,934 METHOD FOR PROCESSING A FLEXIBLE SUBSTRATE ABAN Aug 03, 15 Feb 18, 16 [B05D]

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