APPLIED MATERIALS, INC.

Patent Owner

Watch Compare Add to Portfolio

Stats

Details

Patent Activity in the Last 10 Years

Technologies

Intl Class Technology MATTERS Rank in Class
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 2692 14
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1592 1
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 634 4
 
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 570 1
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 236 2
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 204 250
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 185 3
 
 
C25D PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING 160 2
 
 
H05H PLASMA TECHNIQUE 154 1
 
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 146 69
  • No Technologies to Display

Top Patents (by citation)

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0319,604 THYROID HORMONE RECEPTOR AGONIST AND USE THEREOF Apr 20, 17 Nov 09, 17 [C07F, A61K]
2017/0321,320 SELECTIVE COBALT DEPOSITION ON COPPER SURFACES May 18, 17 Nov 09, 17 [C23C, H01L]
2017/0321,323 FULL-AREA COUNTER-FLOW HEAT EXCHANGE SUBSTRATE SUPPORT May 06, 16 Nov 09, 17 [C23C, F28D, F28F, H01J]
2017/0321,325 Apparatus And Methods For Depositing ALD Films With Enhanced Chemical Exchange Apr 24, 17 Nov 09, 17 [C23C]
2017/0322,568 GAS PANEL APPARATUS AND METHOD FOR REDUCING EXHAUST REQUIREMENTS Dec 08, 16 Nov 09, 17 [H01L, G05D]
2017/0322,606 DUAL LOOP SUSCEPTOR TEMPERATURE CONTROL SYSTEM May 05, 16 Nov 09, 17 [G05B, G06F, G05D]
2017/0323,768 PLASMA TREATMENT PROCESS FOR IN-SITU CHAMBER CLEANING EFFICIENCY ENHANCEMNET IN PLASMA PROCESSING CHAMBER May 03, 16 Nov 09, 17 [H01J]
2017/0323,772 PROTECTIVE METAL OXY-FLUORIDE COATINGS Apr 26, 17 Nov 09, 17 [C23C, H01J]
2017/0323,775 Methods of Depositing SiCON with C, O and N Compositional Control Apr 13, 17 Nov 09, 17 [H01L]
2017/0323,778 PLASMA POISONING TO ENABLE SELECTIVE DEPOSITION Jul 24, 17 Nov 09, 17 [H01L]
2017/0323,795 METHOD OF SELECTIVE ETCHING ON EPITAXIAL FILM ON SOURCE/DRAIN AREA OF TRANSISTOR May 02, 17 Nov 09, 17 [H01L]
2017/0323,813 ADVANCED TEMPERATURE CONTROL FOR WAFER CARRIER IN PLASMA PROCESSING CHAMBER Jul 22, 16 Nov 09, 17 [C23C, H01L]
2017/0323,821 ROBOT SUBASSEMBLIES, END EFFECTOR ASSEMBLIES, AND METHODS WITH REDUCED CRACKING Aug 01, 16 Nov 09, 17 [H01L, B25J]
2017/0323,822 SYSTEMS, APPARATUS, AND METHODS FOR AN IMPROVED SUBSTRATE HANDLING ASSEMBLY May 05, 17 Nov 09, 17 [H01L]
2017/0304,849 APPARATUS FOR CONTROLLING TEMPERATURE UNIFORMITY OF A SHOWERHEAD Apr 26, 17 Oct 26, 17 [H01J, B05B]
2017/0304,877 TEMPERATURE CONTROLLED REMOTE PLASMA CLEAN FOR EXHAUST DEPOSIT REMOVAL Apr 05, 17 Oct 26, 17 [B08B, H01J, C30B]
2017/0306,474 INTEGRATION OF LASER PROCESSING WITH DEPOSITION OF ELECTROCHEMICAL DEVICE LAYERS Nov 02, 15 Oct 26, 17 [C23C, H01M]
2017/0306,482 SHADOW FRAME SUPPORT Jul 07, 17 Oct 26, 17 [C23C, H01J]
2017/0306,488 GAS FEEDTHROUGH ASSEMBLY Mar 21, 17 Oct 26, 17 [C23C]
2017/0306,491 CHEMICAL DELIVERY CHAMBER FOR SELF-ASSEMBLED MONOLAYER PROCESSES Mar 24, 17 Oct 26, 17 [C23C]
2017/0306,493 METHOD & APPARATUS TO PREVENT DEPOSITION RATE/THICKNESS DRIFT, REDUCE PARTICLE DEFECTS & INCREASE REMOTE PLASMA SYSTEM LIFETIME Apr 21, 17 Oct 26, 17 [B08B, C23C, H01J, H01L]
2017/0306,494 SUBSTRATE SUPPORT PEDESTAL HAVING PLASMA CONFINEMENT FEATURES Jan 26, 17 Oct 26, 17 [C23C, H01L]
2017/0307,387 METHODS FOR AN AUTONOMOUS ROBOTIC MANUFACTURING NETWORK Jul 05, 16 Oct 26, 17 [G05B, G01C, G06Q, G05D]
2017/0308,071 ECO-EFFICIENCY CHARACTERIZATION TOOL Apr 20, 16 Oct 26, 17 [G05B]
2017/0309,509 HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS Jul 06, 17 Oct 26, 17 [H01L]
2017/0309,515 MICROWAVE ANNEAL TO IMPROVE CVD METAL GAP-FILL AND THROUGHPUT Apr 25, 16 Oct 26, 17 [H01L]
2017/0309,525 METHOD FOR PECVD OVERLAY IMPROVEMENT Apr 20, 17 Oct 26, 17 [C23C, H01L]
2017/0309,528 DYNAMIC WAFER LEVELING/TILTING/SWIVELING DURING A CHEMICAL VAPOR DEPOSITION PROCESS Apr 22, 16 Oct 26, 17 [H01L]
2017/0309,719 HORIZONTAL GATE ALL AROUND DEVICE NANOWIRE AIR GAP SPACER FORMATION Apr 24, 17 Oct 26, 17 [H01L]

View all publication…

  • No Publications to Display

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9808906 Polishing system with front side pressure control Jun 03, 16 Nov 07, 17 [B24B]
9809881 Method and apparatus for multizone plasma generation Jul 28, 11 Nov 07, 17 [C23C, H01J]
9811077 Polishing with pre deposition spectrum Jul 16, 14 Nov 07, 17 [G05B, G06F]
9812303 Configurable variable position closed track magnetron Feb 18, 14 Nov 07, 17 [C23C, H01J]
9812318 Low temperature molecular layer deposition of SiCON Jul 16, 15 Nov 07, 17 [C23C, H01L]
9812328 Methods for forming low resistivity interconnects Jun 22, 16 Nov 07, 17 [H01L]
9812341 Rare-earth oxide based coatings based on ion assisted deposition Jan 23, 17 Nov 07, 17 [C23C, H01J, H01L, B65D]
9812344 Wafer processing system with chuck assembly maintenance module Feb 03, 15 Nov 07, 17 [B08B, H01L]
9814099 Substrate support with surface feature for reduced reflection and manufacturing techniques for producing same Jul 07, 14 Nov 07, 17 [F27D, H05B]
D801942 Target profile for a physical vapor deposition chamber target Apr 16, 15 Nov 07, 17 [1303]
9802828 Precursors suitable for high temperature atomic layer deposition of silicon-containing films Oct 02, 15 Oct 31, 17 [H01L, C01B]
9805914 Methods for removing contamination from surfaces in substrate processing systems Apr 28, 15 Oct 31, 17 [B08B, C25F, H01J, H01L]
9805939 Dual endpoint detection for advanced phase shift and binary photomasks Feb 22, 13 Oct 31, 17 [G03F, H01J, H01L]
9805942 Method of modifying epitaxial growth shape on source drain area of transistor Dec 19, 16 Oct 31, 17 [H01L]
9805965 Pixelated capacitance controlled ESC Dec 30, 16 Oct 31, 17 [H01J, H02N, H01L]
9805976 Co or Ni and Cu integration for small and large features in integrated circuits Jan 08, 16 Oct 31, 17 [H01L]
9806258 Substrate imprinted with a pattern for forming isolated device regions Mar 29, 13 Oct 31, 17 [H01L]
9806302 Thin film battery package Jun 03, 16 Oct 31, 17 [H01M]

View all Patent…

  • No Patents to Display

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2017/0110,475 HIGH ASPECT RATIO 3-D FLASH MEMORY DEVICE ABAN Dec 28, 16 Apr 20, 17 [H01L]
2017/0017,146 PROCESS FOR REMOVING CONTAMINATION ON RUTHENIUM SURFACE ABAN Jul 13, 15 Jan 19, 17 [B08B, G03F]
2016/0307,748 Deposition Of Si-H Free Silicon Nitride ABAN Apr 20, 16 Oct 20, 16 [H01L]
2016/0260,602 ADHESION IMPROVEMENTS FOR OXIDE-SILICON STACK ABAN Oct 15, 14 Sep 08, 16 [H01L]
2016/0201,986 SUBSTRATE HOLDER ASSEMBLY, APPARATUS, AND METHODS ABAN Jan 09, 15 Jul 14, 16 [F26B]
2016/0197,015 HYBRID WAFER DICING APPROACH USING A POLYGON SCANNING-BASED LASER SCRIBING PROCESS AND PLASMA ETCH PROCESS ABAN Jan 05, 15 Jul 07, 16 [H01J, H01L]
2016/0176,014 SYSTEMS, APPARATUS, AND METHODS FOR AN IMPROVED POLISHING HEAD GIMBAL USING A SPHERICAL BALL BEARING ABAN Feb 17, 15 Jun 23, 16 [B24B]
2016/0172,238 SELECTIVE SEALANT REMOVAL ABAN Dec 12, 14 Jun 16, 16 [H01L]
2016/0133,441 ETCH ENHANCEMENT VIA CONTROLLED INTRODUCTION OF CHAMBER CONTAMINANTS ABAN Nov 07, 14 May 12, 16 [C23C, H01J]
2016/0104,639 SURFACE TREATMENT TO IMPROVE CCTBA BASED CVD CO NUCLEATION ON DIELECTRIC SUBSTRATE ABAN Dec 21, 15 Apr 14, 16 [H01L]
2016/0099,173 METHODS FOR ETCHING A BARRIER LAYER FOR AN INTERCONNECTION STRUCTURE FOR SEMICONDUCTOR APPLICATIONS ABAN Oct 03, 14 Apr 07, 16 [H01L]
2016/0086,794 NITROGEN DOPED AMORPHOUS CARBON HARDMASK ABAN Jun 18, 13 Mar 24, 16 [H01L]
2016/0079,088 METHOD FOR ETCHING A HARDMASK LAYER FOR AN INTERCONNECTION STRUCTURE FOR SEMICONDUCTOR APPLICATIONS ABAN Sep 12, 14 Mar 17, 16 [H01L]
2016/0068,969 INTEGRATED PROCESSING FOR MICROCONTAMINATION PREVENTION ABAN Sep 05, 14 Mar 10, 16 [C23F, H01J]
2016/0045,934 METHOD FOR PROCESSING A FLEXIBLE SUBSTRATE ABAN Aug 03, 15 Feb 18, 16 [B05D]
2016/0040,040 Slurry for Selective Chemical Mechanical Polishing of Copper ABAN Aug 11, 14 Feb 11, 16 [B24B, C09G, H01L]
2016/0042,961 ELECTRON BEAM PLASMA SOURCE WITH ROTATING CATHODE, BACKSIDE HELIUMCOOLING AND LIQUID COOLED PEDESTAL FOR UNIFORM PLASMA GENERATION ABAN Aug 06, 14 Feb 11, 16 [H01J, H01L]
2016/0042,968 INTEGRATED OXIDE AND SI ETCH FOR 3D CELL CHANNEL MOBILITY IMPROVEMENTS ABAN Aug 05, 14 Feb 11, 16 [H01L]
2016/0043,099 WORDLINE 3D FLASH MEMORY AIR GAP ABAN Aug 05, 14 Feb 11, 16 [H01L]
2016/0027,668 CHEMICAL MECHANICAL POLISHING APPARATUS AND METHODS ABAN Jul 25, 14 Jan 28, 16 [H01L]

View all Patent…

  • No Patents to Display

Top Inventors for This Owner

We are sorry but your current selection exceeds the maximum number of watches () for this membership level. Upgrade to our Level for up to watches!

Owner Watch
APPLIED MATERIALS, INC.
CANCEL
UPGRADE MEMBERSHIP CANCEL

We are sorry but your current selection exceeds the maximum number of comparisons () for this membership level. Upgrade to our Level for up to comparisons!

UPGRADE MEMBERSHIP CANCEL

We are sorry but your current selection exceeds the maximum number of portfolios () for this membership level. Upgrade to our Level for up to portfolios!

UPGRADE MEMBERSHIP CANCEL

We are sorry but your current selection exceeds the maximum number of patents allowed in portfolios () for this membership level. Upgrade to our Level for up to patents!

UPGRADE MEMBERSHIP CANCEL