ASM INTERNATIONAL N.V.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 155212
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 10225
 
  
 
C30B SINGLE-CRYSTAL GROWTH 2729
 
  
 
B65G TRANSPORT OR STORAGE DEVICES, e.g. CONVEYERS FOR LOADING OR TIPPING; SHOP CONVEYER SYSTEMS; PNEUMATIC TUBE CONVEYERS 1255
 
  
 
F27D DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE 1114
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 11436
 
  
 
H05H PLASMA TECHNIQUE 921
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 681
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 5201
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 432

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0167,020 ATOMIC LAYER DEPOSITION APPARATUS AND METHOD FOR PROCESSING SUBSTRATES USING AN APPARATUSNov 03, 15Jun 15, 17[C23C]
2017/0076,935 FLOATING WAFER TRACK WITH LATERAL STABILIZATION MECHANISMNov 29, 16Mar 16, 17[C23C, H01L]
2016/0281,233 SUBSTRATE PROCESSING APPARATUSMar 18, 14Sep 29, 16[C23C, H01L]
2016/0102,399 APPARATUS AND METHOD FOR HIGH-THROUGHPUT ATOMIC LAYER DEPOSITIONDec 15, 15Apr 14, 16[C23C]
2013/0199,448 METHOD AND APPARATUS FOR CONTACTLESSLY ADVANCING SUBSTRATESJul 06, 11Aug 08, 13[C23C, B65G]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9875893 Methods for forming doped silicon oxide thin filmsJan 10, 17Jan 23, 18[H01L]
9831094 Enhanced thin film depositionJul 29, 15Nov 28, 17[C23C, H01L]
9822447 Dynamic fluid valve and method for establishing the sameJan 31, 11Nov 21, 17[C23C, H01L]
9816203 Crystalline strontium titanate and methods of forming the sameMay 20, 15Nov 14, 17[H01L, C30B]
9783563 Synthesis and use of precursors for ALD of tellurium and selenium thin filmsOct 13, 15Oct 10, 17[C23C, H01L, C07F]
9708707 Nanolayer deposition using bias power treatmentMay 19, 10Jul 18, 17[C23C]
9677173 Precursors and methods for atomic layer deposition of transition metal oxidesMay 18, 16Jun 13, 17[C23C, C01G]
9679808 Selective formation of metallic films on metallic surfacesJan 05, 16Jun 13, 17[C23C, H01L]
9646820 Methods for forming conductive titanium oxide thin filmsDec 15, 14May 09, 17[C23C, H01L, H01G]
9634106 Doped metal germanide and methods for making the sameJul 31, 15Apr 25, 17[C23C, H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2014/0193,579 Combination CVD/ALD method and sourceAbandonedAug 30, 13Jul 10, 14[C23C]
2012/0304,935 BUBBLER ASSEMBLY AND METHOD FOR VAPOR FLOW CONTROLAbandonedMay 31, 11Dec 06, 12[C23C, H01L, F15D, B01F]
8323737 Sequential chemical vapor depositionExpiredJul 22, 08Dec 04, 12[C23C]
2012/0291,707 FLOATING WAFER TRACK WITH LATERAL STABILIZATION MECHANISMAbandonedNov 19, 10Nov 22, 12[C23C]
2012/0255,612 ALD OF METAL OXIDE FILM USING PRECURSOR PAIRS WITH DIFFERENT OXIDANTSAbandonedApr 08, 11Oct 11, 12[H01L]
2012/0202,353 NANOLAYER DEPOSITION USING PLASMA TREATMENTAbandonedApr 17, 12Aug 09, 12[H01L]
2011/0293,830 PRECURSORS AND METHODS FOR ATOMIC LAYER DEPOSITION OF TRANSITION METAL OXIDESAbandonedFeb 24, 11Dec 01, 11[C23C]
2011/0256,718 THIN FILMSAbandonedApr 04, 11Oct 20, 11[H01L]
2011/0020,546 Low Temperature ALD of Noble MetalsAbandonedMay 12, 10Jan 27, 11[C23C]
2010/0124,613 Heater integrated thermocoupleAbandonedNov 19, 08May 20, 10[C23C, B05C, B05D]
2009/0325,391 OZONE AND TEOS PROCESS FOR SILICON OXIDE DEPOSITIONAbandonedJun 30, 08Dec 31, 09[H01L]
2009/0308,315 SEMICONDUCTOR PROCESSING APPARATUS WITH IMPROVED THERMAL CHARACTERISTICS AND METHOD FOR PROVIDING THE SAMEAbandonedJun 13, 08Dec 17, 09[C23C]
2009/0291,209 APPARATUS AND METHOD FOR HIGH-THROUGHPUT ATOMIC LAYER DEPOSITIONAbandonedMay 20, 08Nov 26, 09[C23C]
2009/0269,939 CYCLICAL OXIDATION PROCESSAbandonedFeb 27, 09Oct 29, 09[H01L]
2009/0035,946 IN SITU DEPOSITION OF DIFFERENT METAL-CONTAINING FILMS USING CYCLOPENTADIENYL METAL PRECURSORSAbandonedJul 15, 08Feb 05, 09[C23C, H01L]
2008/0295,421 System and method for installing a semiconductor manufacturing apparatusAbandonedMay 30, 07Dec 04, 08[H01L]
2008/0241,387 ATOMIC LAYER DEPOSITION REACTORAbandonedMar 29, 07Oct 02, 08[C23C]
7426939 Rotatable valveExpiredSep 29, 06Sep 23, 08[F16K]
2008/0227,267 Stop mechanism for trench reshaping processAbandonedMar 14, 07Sep 18, 08[H01L]
7410355 Method for the heat treatment of substratesExpiredFeb 17, 06Aug 12, 08[H01L]

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