ASML HOLDING N.V.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 21117
 
 
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 8043
 
 
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 79128
 
 
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS4258
 
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 27335
 
 
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 25181
 
 
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 1473
 
 
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 1464
 
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 12435
 
 
 
B05C APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 1035

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0067,057 METHOD AND DEVICE FOR FOCUSING IN AN INSPECTION SYSTEMAug 22, 17Mar 08, 18[G01N, G03F]
2018/0045,657 VARIABLE CORRECTOR OF A WAVE FRONTJul 31, 17Feb 15, 18[G01N]
2017/0357,165 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHODAug 28, 17Dec 14, 17[G03F]
2017/0293,231 IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING MICROCHANNEL NOZZLESJun 19, 17Oct 12, 17[H01L, G03F]
2017/0277,046 METHOD AND APPARATUS FOR SPECTRALLY BROADENING RADIATIONAug 11, 15Sep 28, 17[G02B, G01B, G03F]
2017/0212,434 Alignment Sensor and Lithographic ApparatusJul 07, 15Jul 27, 17[G03F]
2017/0192,359 SUBSTRATE SUPPORT, METHOD FOR LOADING A SUBSTRATE ON A SUBSTRATE SUPPORT LOCATION, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHODApr 23, 15Jul 06, 17[H01L, G03F]
2017/0168,312 FLEXIBLE ILLUMINATORDec 06, 16Jun 15, 17[G02B, G03F]
2017/0068,171 Estimating Deformation of a Patterning Device and/or a Change in Its PositionMar 05, 15Mar 09, 17[G01B, G03F]
2017/0068,175 LITHOGRAPHIC APPARATUSNov 17, 16Mar 09, 17[G03F]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9910368 Patterning device manipulating system and lithographic apparatusesSep 20, 13Mar 06, 18[G03F]
9904173 Method and apparatuses for optical pupil symmetrizationDec 15, 15Feb 27, 18[G01N, G02B, G03B, G03F]
9904185 Lithographic apparatus and device manufacturing methodOct 24, 16Feb 27, 18[G03B, G03F]
9891540 Measuring method, measurement apparatus, lithographic apparatus and device manufacturing methodMay 29, 15Feb 13, 18[G03B, G01B, G03F]
9857694 Estimating deformation of a patterning device and/or a change in its positionMar 05, 15Jan 02, 18[G03B, G01B, G03F]
9857703 Alignment sensor and lithographic apparatusJul 07, 15Jan 02, 18[G03B, G03F]
9766557 Patterning device support, lithographic apparatus, and method of controlling patterning device temperatureFeb 21, 17Sep 19, 17[G03F]
9746788 Lithographic apparatus and device manufacturing methodOct 13, 16Aug 29, 17[G03B, G03F]
9740112 Patterning device support and lithographic apparatusSep 23, 13Aug 22, 17[G03F]
9715178 Immersion photolithography system and method using microchannel nozzlesApr 30, 14Jul 25, 17[G03B, G03F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2015/0256,058 Linear Motor and Lithography Arrangement Including Linear MotorAbandonedMay 21, 15Sep 10, 15[H02K, G03F]
2015/0241,797 Reticle Cleaning by Means of Sticky SurfaceAbandonedJul 30, 13Aug 27, 15[B08B, G03F]
2015/0085,291 Compact Self-Contained Holographic and Interferometric ApparatusAbandonedJan 31, 13Mar 26, 15[G01B, G03H]
8654305 Systems and methods for insitu lens cleaning in immersion lithographyExpiredFeb 15, 07Feb 18, 14[G03B]
8654311 Lithographic apparatus and device manufacturing methodExpiredApr 07, 09Feb 18, 14[G03B]
8629970 Immersion lithographic apparatus with immersion fluid re-circulating systemExpiredJan 16, 09Jan 14, 14[G03B]
8625096 Method and system for increasing alignment target contrastExpiredMar 24, 10Jan 07, 14[H01L, G03C, G03B, G01B, G03F]
RE44434 Optical position measuring system and method using a low coherence light sourceExpiredAug 31, 12Aug 13, 13[G01B]
2013/0017,378 Apparatus and Method for Providing Resist Alignment Marks in a Double Patterning Lithographic ProcessAbandonedSep 14, 12Jan 17, 13[G03B, G03F, B32B]
2013/0010,277 System and Method for Using a Two Part Cover and a Box for Protecting a ReticleAbandonedSep 14, 12Jan 10, 13[G03B]
2013/0011,547 Optical Component Fabrication Using Coated SubstratesAbandonedSep 14, 12Jan 10, 13[B05D]
8329366 Apparatus and method for providing resist alignment marks in a double patterning lithographic processExpiredApr 27, 10Dec 11, 12[G03F]
2012/0281,197 Holographic Mask Inspection System with Spatial FilterAbandonedNov 12, 10Nov 08, 12[G03B, G03H]
8168017 Bonding silicon silicon carbide to glass ceramicsExpiredFeb 04, 10May 01, 12[C09J, B05D, C03B, B29C]
2012/0081,684 Object Inspection Systems and MethodsAbandonedApr 13, 10Apr 05, 12[G03B, G01B]
2012/0026,474 Reticle Cooling in a Lithographic ApparatusAbandonedApr 29, 11Feb 02, 12[G03B]
8089609 Lithographic apparatus and device manufacturing methodExpiredSep 25, 08Jan 03, 12[G03B]
2011/0317,136 Inspection Apparatus Employing Wide Angle Objective Lens With Optical WindowAbandonedApr 08, 11Dec 29, 11[G01N, G03B]
8085383 System, method, and apparatus for scanning detector for fast and frequent illumination uniformity correction moduleExpiredOct 27, 05Dec 27, 11[G03B]
8054449 Enhancing the image contrast of a high resolution exposure toolExpiredNov 22, 06Nov 08, 11[G03B]

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