ATTOFEMTO, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS1287
 
  
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 6153
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 4202
 
  
 
G01L MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE 353
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 2360
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 177

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2016/0291,088 ADVANCED 4-DIMENSIONAL SIGNAL AND DEVICE TESTING USING CIRCUIT-STATE RECOGNITIONJun 09, 16Oct 06, 16[G01R]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9366719 Optical to optical methods enhancing the sensitivity and resolution of ultraviolet, electron beam and ion beam devicesDec 17, 13Jun 14, 16[G01B, G01R]
9250064 Multiple beam transmission interferometric testing methods for the development and evaluation of subwavelength sized features within semiconductor and anisotropic devicesOct 23, 14Feb 02, 16[H01L, G01N, G01B]
8879071 Multiple optical wavelength interferometric testing methods for the development and evaluation of subwavelength sized features within semiconductor devices and materials, wafers, and monitoring all phases of development and manufactureMay 28, 13Nov 04, 14[H01L, G01N, G01B]
8736823 Methods and processes for optical interferometric or holographic test in the development, evaluation, and manufacture of semiconductor and free-metal devices utilizing anisotropic and isotropic materialsMar 05, 13May 27, 14[G01L, G01B]
8462350 Optically enhanced holographic interferometric testing methods for the development and evaluation of semiconductor devices, materials, wafers, and for monitoring all phases of development and manufactureFeb 03, 12Jun 11, 13[G01J, G01B]
8405823 Optical to optical infrared imaging detection systemOct 07, 11Mar 26, 13[G01J, G01L, G01B]
8139228 Methods for optically enhanced holographic interferometric testing for test and evaluation of semiconductor devices and materialsMay 13, 10Mar 20, 12[G01B]
8040521 Holographic condition assessment system for a structure including a semiconductor materialApr 10, 09Oct 18, 11[G01B]
7773230 Interferometric condition assessment system for a microelectronic structure including a semiconductor or free-metal materialJul 14, 08Aug 10, 10[G01B]
7733499 Method for optically testing semiconductor devicesMay 15, 08Jun 08, 10[G01B]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2007/0018,662 CONDITION ASSESSMENT METHOD FOR A STRUCTURE INCLUDING A SEMICONDUCTOR MATERIALAbandonedSep 28, 06Jan 25, 07[G01R]
2003/0067,312 Voltage testing and measurementAbandonedJun 12, 01Apr 10, 03[G01R]
6266078 Image forming apparatusExpiredDec 23, 98Jul 24, 01[B41J]

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