AVIZA TECHNOLOGY LIMITED

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 10345
 
 
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 681
 
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 693
 
 
 
B05C APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 240
 
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 232
 
 
 
C25B ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON- METALS; APPARATUS THEREFOR 230
 
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 2127
 
 
 
B06B GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL 123
 
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 159
 
 
 
G01K MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR 142

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8585873 Methods and apparatus for sputteringOct 12, 05Nov 19, 13[C23C, C25B]
8486198 Method of processing substratesJul 12, 06Jul 16, 13[B08B]
8425741 Ion deposition apparatus having rotatable carousel for supporting a plurality of targetsJul 06, 07Apr 23, 13[B05B, C25B]
8400063 Plasma sourcesJul 06, 07Mar 19, 13[H05B, H01J]
8354652 Ion source including separate support systems for accelerator gridsJul 12, 07Jan 15, 13[F03H, G21K, H01J]
7732307 Method of forming amorphous TiN by thermal chemical vapor deposition (CVD)Jun 03, 05Jun 08, 10[H01L]
7403089 Magnet assembliesDec 08, 04Jul 22, 08[H01F]
7351669 Method of forming a substantially closed voidAug 23, 04Apr 01, 08[H01L]
7327073 Acoustic resonatorsAug 04, 05Feb 05, 08[H01L]
7282158 Method of processing a workpieceMar 24, 05Oct 16, 07[C23F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2009/0170,343 METHOD AND APPARATUS FOR TREATING A SEMI-CONDUCTOR SUBSTRATEABANMar 12, 09Jul 02, 09[H01L]
2008/0245,770 Positive Displacement Pumping ChamberABANOct 11, 06Oct 09, 08[B44C, C23C, H01L]
2006/0260,645 Methods and apparatus for processing wafersABANFeb 21, 06Nov 23, 06[C23G, B08B, H01L]
2006/0182,618 Methods and apparatus for processing the backsides of wafersABANOct 05, 05Aug 17, 06[B65B]
2006/0065,764 Substrate processing showerheadsABANSep 22, 05Mar 30, 06[B05B]
2005/0269,200 Film depositionABANMay 26, 05Dec 08, 05[C23C]
2005/0236,267 Methods and apparatus for controlling rotating magnetic fieldsABANApr 21, 05Oct 27, 05[C23C]
2005/0178,741 Method of etching porous dielectricABANMay 03, 04Aug 18, 05[C23F]
2005/0118,830 Method of processing a workpieceABANNov 29, 04Jun 02, 05[H01L]
2004/0248,375 Trench filling methodsABANJun 03, 04Dec 09, 04[H01L]
2004/0214,417 Methods of forming tungsten or tungsten containing filmsABANMar 10, 04Oct 28, 04[H01L]
2004/0123,800 ShowerheadsABANJul 24, 03Jul 01, 04[C23C]
2003/0166,390 PedestalABANFeb 27, 03Sep 04, 03[F16M, B01L, E04B]
6287989 Method of treating a semiconductor wafer in a chamber using hydrogen peroxide and silicon containing gas or vaporExpiredOct 19, 98Sep 11, 01[H01L]

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