Branson International Plasma Corporation

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
5099100 Plasma etching device and processExpiredSep 29, 89Mar 24, 92[B23K]
5016332 Plasma reactor and process with wafer temperature controlExpiredApr 13, 90May 21, 91[H01L]
4631105 Plasma etching apparatusExpiredApr 22, 85Dec 23, 86[C03C, H01L, C23F, B44C]
4380488 Process and gas mixture for etching aluminumExpiredNov 02, 81Apr 19, 83[C23F]
4368419 Power supply and method utilizing applied current for increased hysteresis swing in transformer coreExpiredMar 16, 81Jan 11, 83[G05F]
4324611 Process and gas mixture for etching silicon dioxide and silicon nitrideExpiredJun 26, 80Apr 13, 82[H01L, C03C, B44C]
4313783 Computer controlled system for processing semiconductor wafersExpiredMay 19, 80Feb 02, 82[C23C, H01L]
4303467 Process and gas for treatment of semiconductor devicesExpiredNov 11, 77Dec 01, 81[H01L, C03C, C23F]
4285800 Gas plasma reactor for circuit boards and the likeExpiredApr 18, 79Aug 25, 81[C23F]

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