CARL ZEISS SMT AG

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 40165
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 1780
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 739
 
  
 
A61N ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY 4103
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS495
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 4100
 
  
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 291
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 2204
 
  
 
G06K RECOGNITION OF DATA; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS 2196
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 186

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8860922 Lithographic apparatus and device manufacturing methodJan 23, 12Oct 14, 14[G03F]
8810771 Lithographic apparatus and device manufacturing methodDec 12, 11Aug 19, 14[G03B]
8711330 Lithographic apparatus and device manufacturing methodMay 06, 11Apr 29, 14[G03B]
7765903 Method and device for processing optical workpiece surfacesAug 02, 05Aug 03, 10[B24B]
7714307 Method of designing a projection system, lithographic apparatus and device manufacturing methodSep 08, 06May 11, 10[H01J]
7289279 Lithographic objective having a first lens group including only lenses having a positive refractive powerFeb 10, 06Oct 30, 07[G02B]
7277186 Method for the interferometric measurement of non-rotationally symmetric wavefront errorsSep 01, 04Oct 02, 07[G01B]
7172788 Optical element and method for its manufacture as well as lithography apparatus and method for manufacturing a semiconductor deviceOct 02, 02Feb 06, 07[B05D]
7170585 Projection lens and microlithographic projection exposure apparatusApr 07, 05Jan 30, 07[G03B]
7148495 Illumination system, particularly for EUV lithographyJan 06, 04Dec 12, 06[H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2010/0128,367 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS AND METHODAbandonedMar 13, 09May 27, 10[G02B]
7604359 High positioning reproducible low torque mirror-actuator interfaceExpiredApr 27, 05Oct 20, 09[G02B]
2009/0195,876 METHOD FOR DESCRIBING A RETARDATION DISTRIBUTION IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUSAbandonedApr 10, 09Aug 06, 09[G02B]
2009/0141,258 Imaging Device in a Projection Exposure MachineAbandonedJan 30, 09Jun 04, 09[G02B, G03B]
2009/0128,896 CATADIOPTRIC PROJECTION OBJECTIVE WITH INTERMEDIATE IMAGEAbandonedJan 28, 06May 21, 09[G02B]
2009/0121,488 Electric power generation system driven by solar flux and geocoolingAbandonedNov 08, 07May 14, 09[F24J, H02P, F25B, F25D]
2009/0091,728 Compact High Aperture Folded Catadioptric Projection ObjectiveAbandonedSep 28, 07Apr 09, 09[G02B, G03B]
2009/0086,338 High Aperture Folded Catadioptric Projection ObjectiveAbandonedSep 28, 07Apr 02, 09[G02B]
7508580 8-mirror microlithography projection objectiveExpiredFeb 06, 08Mar 24, 09[G21K, G02B, G03B]
2009/0073,392 Illumination System Including Grazing Incidence Mirror For Microlithography Exposure SystemAbandonedSep 14, 07Mar 19, 09[G03B]
2009/0052,073 MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM AND METHOD FOR MANUFACTURING A DEVICEAbandonedSep 18, 08Feb 26, 09[G02B]
2009/0021,726 DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM BY USING AN IMMERSION FLUIDAbandonedJun 26, 08Jan 22, 09[G01B]
2009/0015,812 ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHYAbandonedSep 18, 08Jan 15, 09[G03B]
2009/0015,951 PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTUREAbandonedAug 22, 08Jan 15, 09[G02B, G03B]
2009/0002,670 Apparatus for the manipulation and/or adjustment of an optical elementAbandonedJul 30, 08Jan 01, 09[G03B]
2008/0310,014 CATADIOPTRIC PROJECTION OBJECTIVEAbandonedAug 22, 08Dec 18, 08[G02B]
7462842 Device, EUV lithographic device and method for preventing and cleaning contamination on optical elementsExpiredMar 14, 06Dec 09, 08[G03F]
2008/0297,745 PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHYAbandonedAug 06, 08Dec 04, 08[B05D, G02B, G03B]
2008/0285,121 CATADIOPTRIC PROJECTION OBJECTIVEAbandonedApr 09, 08Nov 20, 08[G02B]
2008/0288,108 PROJECTION OBJECTIVE WITH DECENTRALIZED CONTROLAbandonedJun 19, 08Nov 20, 08[B25J]

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