CFMT, Inc.

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
6517636 Method for reducing particle contamination during the wet processing of semiconductor substratesExpiredJan 05, 00Feb 11, 03[C23G]
6495099 Wet processing methods for the manufacture of electronic componentsExpiredDec 10, 98Dec 17, 02[B08B, C23G, A61L]
2002/0104,552 Systems and methods for forming processing streamsAbandonedAug 15, 01Aug 08, 02[B08B]
2002/0066,717 Apparatus for providing ozonated process fluid and methods for using sameAbandonedDec 01, 00Jun 06, 02[C23C, H01B]
6378544 Pressure relief device and method of using the sameExpiredApr 19, 00Apr 30, 02[F16K]
6348101 Methods for treating objectsExpiredSep 26, 00Feb 19, 02[B08B]
6261845 Methods and systems for determining chemical concentrations and controlling the processing of semiconductor substratesExpiredFeb 25, 99Jul 17, 01[G01N]
6245158 Wet processing methods for the manufacture of electronic components using liquids of varying temperatureExpiredJun 02, 99Jun 12, 01[B08B]
6165912 Electroless metal deposition of electronic components in an enclosable vesselExpiredSep 14, 99Dec 26, 00[H01L, B05D]
6143087 Methods for treating objectsExpiredFeb 19, 99Nov 07, 00[B08B]
6132522 Wet processing methods for the manufacture of electronic components using sequential chemical processingExpiredJul 19, 96Oct 17, 00[B08B]
6032682 Method for sulfuric acid resist strippingExpiredJun 24, 97Mar 07, 00[H01L, B08B, B44C]
5972123 Methods for treating semiconductor wafersExpiredJun 12, 98Oct 26, 99[B08B]
5383484 Static megasonic cleaning system for cleaning objectsExpiredJul 16, 93Jan 24, 95[B08B]
4984597 Apparatus for rinsing and drying surfacesExpiredNov 03, 89Jan 15, 91[B08B]
4917123 Apparatus for treating wafers with process fluidsExpiredOct 03, 88Apr 17, 90[B08B]
4911761 Process and apparatus for drying surfacesExpiredApr 20, 88Mar 27, 90[B08B]
4899767 Method and system for fluid treatment of semiconductor wafersExpiredDec 12, 88Feb 13, 90[B08B]
4856544 Vessel and system for treating wafers with fluidsExpiredNov 25, 87Aug 15, 89[B08B]
4795497 Method and system for fluid treatment of semiconductor wafersExpiredDec 04, 85Jan 03, 89[B08B]

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