CLEAN SURFACE TECHNOLOGY CO.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1103

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9280045 Mask blank and photomaskOct 15, 13Mar 08, 16[G03F]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
4646418 Carrier for photomask substrateExpiredDec 06, 85Mar 03, 87[B23Q, B25B]

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