DONGJIN SEMICHEM CO., LTD.
Patent Owner
Stats
- 51 US PATENTS IN FORCE
- 4 US APPLICATIONS PENDING
- Dec 07, 2017 most recent publication
Details
- 51 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 1,101 Total Citation Count
- Aug 04, 1998 Earliest Filing
- 68 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
Rank in Class
Top Patents (by citation)
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Recent Publications
Publication #
Title
Filing Date
Pub Date
Intl Class
2017/0199,459 METHODS OF FORMING PATTERNS USING COMPOSITIONS FOR AN UNDERLAYER OF PHOTORESISTJan 13, 17Jul 13, 17[H01L, C08G, C09D, G03F]
2016/0307,660 Carbon-Metal Composite and Method for Preparing the SameJun 24, 16Oct 20, 16[C09D, H01B]
Recent Patents
Patent #
Title
Filing Date
Issue Date
Intl Class
9783735 Liquid crystal display device and liquid crystal composition used thereforMar 03, 16Oct 10, 17[C09K, C07D, C07C]
9651867 Compound and composition for forming lower film of resist pattern, and method for forming lower film using sameSep 12, 13May 16, 17[H01L, G03F]
9469763 Photo-curable organic-inorganic hybrid resin compositionJan 23, 14Oct 18, 16[C09J, C08G, C08L, C08K]
9460826 Conductive composition for forming a ground electrode of a liquid crystal display, and a method of forming a ground electrode using the sameDec 03, 12Oct 04, 16[B05D, C09D, H01B, G02F]
9423692 Composition for forming resist protection film for lithography and method for forming pattern of semiconductor device using the sameSep 11, 15Aug 23, 16[C09D, G03F]
9416296 Resist underlayer composition and method for forming pattern using sameMar 24, 14Aug 16, 16[C03C, C09D, C23F, G03F, B44C]
9170495 Phenol monomer, polymer for forming a resist underlayer film including same, and composition for a resist underlayer film including sameNov 01, 12Oct 27, 15[C08G, C07D, C09D, G03F]
9068941 Apparatus for monitoring a dye solution to be adsorbed to a dye-sensitized solar cell, and apparatus for adjusting the dye solutionMar 08, 10Jun 30, 15[H01L, G01N, B65B, H01G]
9063424 Isocyanurate compound for forming organic anti-reflective layer and composition including sameSep 14, 10Jun 23, 15[H01L, C08G, B05D, C08F, C07D, G03F, C08L, C08K]
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
2014/0287,587 Method for Forming Fine Patterns of Semiconductor Device Using Directed Self-Assembly ProcessAbandonedSep 27, 12Sep 25, 14[H01L]
2014/0242,520 I-LINE PHOTORESIST COMPOSITION AND METHOD FOR FORMING FINE PATTERN USING SAMEAbandonedSep 21, 12Aug 28, 14[G03F]
2014/0227,887 PHENOL-BASED SELF-CROSSLINKING POLYMER AND RESIST UNDERLAYER FILM COMPOSITION INCLUDING SAMEAbandonedSep 05, 12Aug 14, 14[H01L]
2013/0233,370 DYE-SENSITIZED SOLAR CELL AND METHOD OF PREPARING THE SAMEAbandonedApr 26, 13Sep 12, 13[H01G]
8512598 Liquid crystal compounds and method for preparing the sameExpiredDec 14, 09Aug 20, 13[C09K, C07C]
2013/0115,733 ETCHANT COMPOSITION AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR USING THE SAMEAbandonedJul 12, 12May 09, 13[C09K, H01L]
2012/0180,864 PASTE FOR FORMING OF AN ELECTRODE OF A SOLAR CELLAbandonedJul 16, 10Jul 19, 12[H01L, H01B]
2012/0132,276 DYE SENSITIZED SOLAR CELL AND DYE SENSITIZED SOLAR CELL MODULE USING THE SAMEAbandonedJul 30, 10May 31, 12[H01L]
8178639 Polymer for forming organic anti-reflective coating layerExpiredJun 16, 09May 15, 12[B05D, C08F, G03F, C08L]
2012/0111,404 THERMOSETTING ELECTRODE PASTE FIREABLE AT A LOW TEMPERATUREAbandonedJul 16, 10May 10, 12[H01L, H01B, H05K]
2012/0061,626 PASTE COMPOSITION USED FOR FORMING AN ELECTRODE OR WIRING WHICH IS CURABLE AT A LOW TEMPERATUREAbandonedMar 30, 10Mar 15, 12[B05D, H01B, H05K]
8124311 Photosensitive molecular compound and photoresist composition including the sameExpiredJan 29, 09Feb 28, 12[G03F]
8043789 Photosensitive compound and photoresist composition including the sameExpiredDec 17, 08Oct 25, 11[G03F]
8026042 Polymer for organic anti-reflective coating layer and composition including the sameExpiredJul 14, 10Sep 27, 11[C08J, H01L, C08G, G03F, C08L, C08K]
7947423 Photosensitive compound and photoresist composition including the sameExpiredSep 11, 08May 24, 11[C07C, G03F]
7935474 Acid-amplifier having acetal group and photoresist composition including the sameExpiredJul 17, 08May 03, 11[G03F]
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