EKC TECHNOLOGY, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C11D DETERGENT COMPOSITIONS 2244
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 7355
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 652
 
  
 
C23G CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS 49
 
  
 
C09K MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR392
 
  
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 244
 
  
 
B01D SEPARATION 1133
 
  
 
C07C ACYCLIC OR CARBOCYCLIC COMPOUNDS 1137
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 135
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1103

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2016/0240,368 METHOD AND COMPOSITION FOR SELECTIVELY REMOVING METAL HARDMASK AND OTHER RESIDUES FROM SEMICONDUCTOR DEVICE SUBSTRATES COMPRISING LOW-K DIELECTRIC MATERIAL AND COPPERNov 14, 14Aug 18, 16[H01L, B08B, C11D]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9481855 Cleaning composition and method for cleaning a semiconductor device substrate after chemical mechanical polishingSep 13, 13Nov 01, 16[H01L, C11D]
9257270 Method and composition for removing resist, etch residue, and copper oxide from substrates having copper, metal hardmask and low-k dielectric materialFeb 12, 13Feb 09, 16[C09K, H01L, C11D]
8951950 Aluminum post-etch residue removal with simultaneous surface passivationMar 11, 13Feb 10, 15[H01L, C11D]
8802609 Nitrile and amidoxime compounds and methods of preparation for semiconductor processingJan 19, 12Aug 12, 14[H01L, C11D]
8658583 Method for making a photoresist stripping solution comprising an organic sulfonic acid and an organic hydrocarbon solventSep 22, 09Feb 25, 14[C11D]
8062429 Methods of cleaning semiconductor devices at the back end of line using amidoxime compositionsOct 29, 08Nov 22, 11[B08B]
8003587 Semiconductor process residue removal composition and processMar 13, 09Aug 23, 11[C11D]
7838483 Process of purification of amidoxime containing cleaning solutions and their useOct 29, 08Nov 23, 10[B01D]
7825079 Cleaning composition comprising a chelant and quaternary ammonium hydroxide mixtureMay 11, 09Nov 02, 10[C11D]
7718590 Method to remove resist, etch residue, and copper oxide from substrates having copper and low-k dielectric materialFeb 24, 06May 18, 10[C11D]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2015/0104,952 METHOD AND COMPOSITION FOR SELECTIVELY REMOVING METAL HARDMASK AND OTHER RESIDUES FROM SEMICONDUCTOR DEVICE SUBSTRATES COMPRISING LOW-K DIELECTRIC MATERIAL AND COPPERAbandonedDec 11, 13Apr 16, 15[H01L, G03F]
2013/0053,291 COMPOSITION FOR CLEANING SUBSTRATES POST-CHEMICAL MECHANICAL POLISHINGAbandonedAug 22, 11Feb 28, 13[C11D]
2013/0045,908 METHOD AND COMPOSITION FOR REMOVING RESIST, ETCH RESIDUE, AND COPPER OXIDE FROM SUBSTRATES HAVING COPPER, METAL HARDMASK AND LOW-K DIELECTRIC MATERIALAbandonedAug 15, 11Feb 21, 13[C11D]
2011/0065,622 NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION FOR SEMICONDUCTOR PROCESSINGAbandonedSep 13, 10Mar 17, 11[C07D, C07C, G03F]
2010/0105,595 COMPOSITION COMPRISING CHELATING AGENTS CONTAINING AMIDOXIME COMPOUNDSAbandonedOct 29, 08Apr 29, 10[C11D]
2009/0133,716 METHODS OF POST CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING USING AMIDOXIME COMPOSITIONSAbandonedOct 29, 08May 28, 09[C23G]
2009/0137,191 COPPER CMP POLISHING PAD CLEANING COMPOSITION COMPRISING OF AMIDOXIME COMPOUNDSAbandonedOct 29, 08May 28, 09[B24B]
2009/0137,439 Printer Head and Printer Disk Cleaning Compositions and Methods of UseAbandonedSep 29, 08May 28, 09[C11D]
2009/0130,849 CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USEAbandonedOct 29, 08May 21, 09[H01L]
2009/0131,295 Compositions for Removal of Metal Hard Mask Etching Residues from a Semiconductor SubstrateAbandonedSep 29, 08May 21, 09[G03F]
7528098 Semiconductor process residue removal composition and processExpiredNov 24, 04May 05, 09[H01L]
2009/0111,965 NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATIONAbandonedOct 29, 08Apr 30, 09[C08G, C07C]
2009/0112,024 STABILIZATION OF HYDROXYLAMINE CONTAINING SOLUTIONS AND METHOD FOR THEIR PREPARATIONAbandonedOct 29, 08Apr 30, 09[C07C]
2009/0107,520 AMIDOXIME COMPOUNDS AS CHELATING AGENTS IN SEMICONDUCTOR PROCESSESAbandonedOct 29, 08Apr 30, 09[C23G, C11D]
2009/0111,726 Compounds for Photoresist StrippingAbandonedSep 29, 08Apr 30, 09[G03F]
2009/0099,051 Aqueous fluoride compositions for cleaning semiconductor devicesAbandonedJul 15, 08Apr 16, 09[C11D]
2009/0068,846 COMPOSITIONS AND METHOD FOR TREATING A COPPER SURFACEAbandonedSep 08, 08Mar 12, 09[H01L, C09D]
7479474 Reducing oxide loss when using fluoride chemistries to remove post-etch residues in semiconductor processingExpiredMay 03, 04Jan 20, 09[C09K]
2009/0011,967 Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentialsAbandonedJun 17, 08Jan 08, 09[C11D]
7456140 Compositions for cleaning organic and plasma etched residues for semiconductor devicesExpiredAug 17, 04Nov 25, 08[C11D]

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