ELECTRON VISION CORPORATION

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 442
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 4358
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 2102
 
  
 
C08J WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER- TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C C08F, C08G or C08H 177
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 1127
 
  
 
H02N ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR130

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
6426127 Electron beam modification of perhydrosilazane spin-on glassDec 28, 99Jul 30, 02[C08J]
6407399 Uniformity correction for large area electron sourceSep 30, 99Jun 18, 02[H01J]
6358670 Enhancement of photoresist plasma etch resistance via electron beam surface cureDec 28, 99Mar 19, 02[G03C]
6340556 Tailoring of linewidth through electron beam post exposureJun 08, 00Jan 22, 02[G03C]
6319655 Modification of 193 nm sensitive photoresist materials by electron beam exposureJun 11, 99Nov 20, 01[G03F]
6271146 Electron beam treatment of fluorinated silicate glassSep 30, 99Aug 07, 01[H01L]
6255035 Method of creating optimal photoresist structures used in the manufacture of metal T-gates for high-speed semiconductor devicesMar 17, 99Jul 03, 01[H01L, G03C]
6218090 Method of creating controlled discontinuity between photoresist and substrate for improving metal lift offMar 17, 99Apr 17, 01[G03C]
6207555 Electron beam process during dual damascene processingMar 17, 99Mar 27, 01[H01L]
6204201 Method of processing films prior to chemical vapor deposition using electron beam processingJun 11, 99Mar 20, 01[H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
6900001 Method for modifying resist images by electron beam exposureExpiredJan 31, 03May 31, 05[G03F]
6753129 Method and apparatus for modification of chemically amplified photoresist by electron beam exposureExpiredMar 04, 02Jun 22, 04[G03G]
6607991 Method for curing spin-on dielectric films utilizing electron beam radiationExpiredDec 29, 99Aug 19, 03[H01L]
6582777 Electron beam modification of CVD deposited low dielectric constant materialsExpiredFeb 17, 00Jun 24, 03[C23C, B05D]
6551926 Electron beam annealing of metals, alloys, nitrides and silicidesExpiredJun 08, 00Apr 22, 03[H01L]
6548899 Method of processing films prior to chemical vapor deposition using electron beam processingExpiredDec 04, 00Apr 15, 03[H01L]
6489225 Method for controlling dopant profiles and dopant activation by electron beam processingExpiredJun 08, 00Dec 03, 02[H01L]
2002/0136,910 Deposition of organosilsesquioxane filmsAbandonedMay 16, 02Sep 26, 02[C23C, B05D, C07F, C08F, B32B]
6150070 Method of creating optimal profile in single layer photoresistExpiredMar 17, 99Nov 21, 00[G03C]
6132814 Method for curing spin-on-glass film utilizing electron beam radiationExpiredMay 14, 97Oct 17, 00[B29C]

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