EUV LLC

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 25180
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS1485
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 1483
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 1432
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1292
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 6356
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 596
 
  
 
F21V FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR 5105
 
  
 
G21G CONVERSION OF CHEMICAL ELEMENTS; RADIOACTIVE SOURCES 512
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 5123

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
7994278 Biologically active polypeptides derived from a novel early stage pregnancy factor designated maternin (MA)Aug 04, 00Aug 09, 11[A61K]
7740916 Method for the protection of extreme ultraviolet lithography opticsApr 05, 04Jun 22, 10[C23C, H05H]
7662263 Figure correction of multilayer coated opticsSep 27, 02Feb 16, 10[C23C, G03F]
7473301 Adhesive particle shieldingSep 17, 02Jan 06, 09[B01D]
7273289 Vacuum compatible, high-speed, 2-D mirror tilt stageMay 19, 05Sep 25, 07[G02B]
7239443 Condenser optic with sacrificial reflective surfaceJun 30, 06Jul 03, 07[F21V]
7196771 Reticle stage based linear dosimeterMar 23, 05Mar 27, 07[G03B]
7147722 Method for in-situ cleaning of carbon contaminated surfacesMay 24, 04Dec 12, 06[B08B]
7081992 Condenser optic with sacrificial reflective surfaceJan 16, 04Jul 25, 06[F21V]
7062348 Dynamic mask for producing uniform or graded-thickness thin filmsJul 13, 00Jun 13, 06[G06F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
7016030 Extended surface parallel coating inspection methodExpiredOct 20, 03Mar 21, 06[G01N]
6989629 Method and apparatus for debris mitigation for an electrical discharge sourceExpiredJan 21, 05Jan 24, 06[H01J]
6963395 Method and apparatus for inspecting an EUV mask blankExpiredJul 09, 01Nov 08, 05[G01N]
6906781 Reticle stage based linear dosimeterExpiredOct 02, 02Jun 14, 05[G03B]
2004/0100,638 Correcting surface contour of a non-rigid object through control of surface residual stressAbandonedNov 27, 02May 27, 04[G01B]
2004/0011,381 Method for removing carbon contamination from optic surfacesAbandonedJul 17, 02Jan 22, 04[C23G]
2003/0164,998 Ion-assisted deposition techniques for the planarization of topological defectsAbandonedMar 01, 02Sep 04, 03[C23C, B05D]
2003/0064,161 Method for reducing carbon contamination of multilayer mirrorsAbandonedJul 17, 02Apr 03, 03[B05D]
2003/0052,180 Method and apparatus for establishing addresses for plural actuators connected to a busAbandonedSep 19, 01Mar 20, 03[F24F]
6356618 Extreme-UV electrical discharge sourceExpiredJun 13, 00Mar 12, 02[H01J]
6353271 Extreme-UV scanning wafer and reticle stagesExpiredOct 29, 99Mar 05, 02[H02K]
6341183 Graphical user interface for image acquisition and processingExpiredOct 27, 98Jan 22, 02[G06K]
6328282 Motorized support jackExpiredMay 10, 00Dec 11, 01[B66F]
6325351 Highly damped kinematic coupling for precision instrumentsExpiredJan 05, 00Dec 04, 01[F16M]
6327102 Miniature self-contained vacuum compatible electronic imaging microscopeExpiredMar 07, 00Dec 04, 01[G02B]
6309705 Process for fabricating high reflectance-low stress Mo--Si multilayer reflective coatingsExpiredJan 13, 00Oct 30, 01[B05D]
6307635 Phase-shifting point diffraction interferometer mask designsExpiredOct 21, 98Oct 23, 01[G01B]
6285497 Diffractive element in extreme-UV lithography condenserExpiredJul 13, 00Sep 04, 01[G21K, G02B, G03B]
6285737 Condenser for extreme-UV lithography with discharge sourceExpiredJan 21, 00Sep 04, 01[G02B]
6279601 Liquid zone sealExpiredMay 02, 00Aug 28, 01[F16K]

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