FUJIMI INCORPORATED

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
C09G POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES851
 
 
 
C09K MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR6442
 
 
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 6321
 
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 58304
 
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 2081
 
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 729
 
 
 
C04B LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS 662
 
 
 
C09D COATING COMPOSITIONS, e.g. PAINTS, VARNISHES, LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR 686
 
 
 
B22F WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER 547
 
 
 
B24D TOOLS FOR GRINDING, BUFFING, OR SHARPENING 525

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0066,161 POLISHING COMPOSITION FOR SILICON WAFER AND POLISHING METHODJan 22, 16Mar 08, 18[C09K, C09G, H01L]
2018/0057,710 POLISHING COMPOSITION AND POLISHING METHODFeb 08, 16Mar 01, 18[C09G, H01L]
2018/0057,711 POLISHING COMPOSITIONMar 11, 16Mar 01, 18[B24B, C09G, H01L]
2018/0030,313 METHOD FOR POLISHING SILICON WAFER AND SURFACE TREATMENT COMPOSITIONJan 22, 16Feb 01, 18[B24B, C09K, C09G, H01L]
2018/0022,959 POLISHING COMPOSITIONFeb 04, 16Jan 25, 18[B24B, C09K, C09G, H01L]
2018/0022,960 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING HARD BRITTLE MATERIAL SUBSTRATEFeb 12, 16Jan 25, 18[B24B, C09K, C09G]
2017/0362,465 MODIFIED COLLOIDAL SILICA AND METHOD FOR PRODUCING THE SAME, AND POLISHING AGENT USING THE SAMEJan 19, 16Dec 21, 17[B24B, C09K, C07F, C09G, H01L, C01B]
2017/0355,881 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING CERAMIC COMPONENTNov 26, 15Dec 14, 17[C09K, C09G]
2017/0355,882 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING CERAMIC COMPONENTNov 26, 15Dec 14, 17[C09K, C04B, C09G]
2017/0342,304 POLISHING COMPOSITIONJan 19, 16Nov 30, 17[B24B, C09K, C09G, H01L]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9914993 Thermal spray powderFeb 23, 16Mar 13, 18[C04B, C23C, H01J]
9879156 Polishing compositionFeb 07, 14Jan 30, 18[B24B, B44C, C09K, C23F, C25F, C09G, C03C, H01L, C30B]
9834703 Polishing compositionNov 21, 12Dec 05, 17[B24B, C09K, C09G, H01L]
9837283 Polishing compositionOct 25, 13Dec 05, 17[C09K, C09G, H01L]
9816010 Polishing compositionJun 11, 15Nov 14, 17[B24B, C09K, C09G, H01L]
9796881 Polishing composition and method using said polishing composition to manufacture compound semiconductor substrateMar 04, 13Oct 24, 17[B24B, C09G, H01L]
9688884 Polishing compositionNov 21, 12Jun 27, 17[B24B, C09K, C09G, H01L]
9682892 Powder for thermal spraying, thermal sprayed coating, and method for forming thermal sprayed coatingMar 07, 14Jun 20, 17[C04B, C23C]
9685341 Abrasive composition and method for producing semiconductor substrateMar 12, 13Jun 20, 17[B24B, C09K, C09G, H01L]
9685343 Method for producing polished object and polishing composition kitJun 12, 14Jun 20, 17[B24B, C09K, C09G, H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0167,192 POLISHING TOOL AND PROCESSING METHOD FOR MEMBERABANAug 06, 14Jun 16, 16[B24B]
2016/0136,784 Polishing Composition and Polishing MethodABANJan 22, 16May 19, 16[B24C, C23F, C09G, H01L]
2016/0122,591 SILICON WAFER POLISHING COMPOSITIONABANMay 02, 14May 05, 16[C09G]
2015/0322,294 POLISHING COMPOSITIONABANOct 25, 13Nov 12, 15[B24B, C09K, C09G]
2015/0306,727 POLISHING METHOD AND HOLDERABANMar 27, 15Oct 29, 15[B24B]
2015/0290,760 POLISHING COMPOSITIONABANApr 14, 15Oct 15, 15[B24B, C09G]
2015/0291,850 POLISHING COMPOSITIONABANJun 25, 13Oct 15, 15[C09G]
2015/0251,293 POLISHING METHOD AND METHOD FOR PRODUCING ALLOY MATERIALABANOct 01, 13Sep 10, 15[B24B]
2015/0232,705 POLISHING COMPOSITIONABANAug 23, 13Aug 20, 15[C23F, C09G]
2015/0218,709 POLISHING COMPOSITIONABANAug 22, 13Aug 06, 15[C23F, C09G]
2015/0166,838 POLISHING COMPOSITION, MANUFACTURING PROCESS THEREFOR, UNDILUTED LIQUID, PROCESS FOR PRODUCING SILICON SUBSTRATE, AND SILICON SUBSTRATEABANJan 16, 13Jun 18, 15[B24B, C09G, C01B]
2015/0166,839 POLISHING COMPOSITION AND SUBSTRATE FABRICATION METHOD USING SAMEABANJun 17, 13Jun 18, 15[C09G]
2015/0166,862 COMPOSITION FOR POLISHING ALLOY MATERIAL AND METHOD FOR PRODUCING ALLOY MATERIAL USING SAMEABANJul 16, 13Jun 18, 15[C09K]
2015/0060,400 POLISHING COMPOSITIONABANApr 09, 13Mar 05, 15[B24B, C09G]
2015/0014,579 POLISHING COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATEABANFeb 05, 13Jan 15, 15[B24B, C09G, H01L]
2014/0360,407 YTTRIUM OXIDE COATING FILMABANDec 26, 12Dec 11, 14[H01B, C23C]
2014/0342,560 POLISHING COMPOSITIONABANNov 21, 12Nov 20, 14[C09G, H01L]
2014/0308,155 METHOD FOR POLISHING ALLOY MATERIAL AND METHOD FOR PRODUCING ALLOY MATERIALABANNov 19, 12Oct 16, 14[C09G]
2014/0302,753 POLISHING COMPOSITIONABANNov 06, 12Oct 09, 14[B24B, C09G]
2014/0263,167 POLISHING COMPOSITION AND POLISHING METHOD USING SAME, AND SUBSTRATE MANUFACTURING METHODABANNov 08, 12Sep 18, 14[C09G, H05K]

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