FILMETRICS, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS891
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 672
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 2204
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 2203
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 165
 
  
 
F21L LIGHTING DEVICES OR SYSTEMS THEREOF, BEING PORTABLE OR SPECIALLY ADAPTED FOR TRANSPORTATION 117
 
  
 
F21V FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR 1109
 
  
 
H04N PICTORIAL COMMUNICATION, e.g. TELEVISION 1241

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0314,914 OPTICAL PROFILOMETERApr 28, 17Nov 02, 17[G01B]
2017/0108,377 DETERMINING FOCUS CONDITION IN SPECTRAL REFLECTANCE SYSTEMSep 23, 16Apr 20, 17[G01J]
2017/0108,688 OPTICAL SYSTEM FOR USE WITH MICROSCOPESep 23, 16Apr 20, 17[H04N, G02B]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9019484 Combining normal-incidence reflectance and transmittance with non-normal-incidence reflectance for model-free characterization of single-layer filmsOct 05, 11Apr 28, 15[G01N, G01B]
8908177 Correction of second-order diffraction effects in fiber-optic-based spectrometersJan 16, 13Dec 09, 14[G01J]
7502119 Thin-film metrology using spectral reflectance with an intermediate in-line referenceJan 29, 07Mar 10, 09[G01B]
7233401 Method and apparatus for measuring thickness of a materialJul 22, 03Jun 19, 07[G01B]
6204922 Rapid and accurate thin film measurement of individual layers in a multi-layered or patterned sampleDec 11, 98Mar 20, 01[G01B]
6184985 Spectrometer configured to provide simultaneous multiple intensity spectra from independent light sourcesDec 11, 98Feb 06, 01[G01J, G01B]
6172756 Rapid and accurate end point detection in a noisy environmentDec 11, 98Jan 09, 01[B24B, G01B]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2013/0265,795 HIGH-LIFETIME BROADBAND LIGHT SOURCE FOR LOW-POWER APPLICATIONSAbandonedJan 16, 13Oct 10, 13[F21V]
2011/0170,097 Fiber-Based Optical Probe With Decreased Sample-Positioning SensitivityAbandonedJan 11, 11Jul 14, 11[G01J, G01B]
7151609 Determining wafer orientation in spectral imagingExpiredJan 07, 06Dec 19, 06[G01B]
7095511 Method and apparatus for high-speed thickness mapping of patterned thin filmsExpiredJul 03, 01Aug 22, 06[G01B]
2006/0166,608 Spectral imaging of substratesAbandonedDec 21, 05Jul 27, 06[B24B]
2005/0174,583 Method and apparatus for high-speed thickness mapping of patterned thin filmsAbandonedFeb 10, 05Aug 11, 05[G01B]
2005/0174,584 Method and apparatus for high-speed thickness mapping of patterned thin filmsAbandonedFeb 23, 05Aug 11, 05[G01B]
2004/0259,472 Whole-substrate spectral imaging system for CMPAbandonedApr 01, 04Dec 23, 04[B24B]

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