GCA CORPORATION, A CORP. OF DE

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
4850299 Semiconductor wafer coating apparatus with angular oscillation meansExpiredMay 24, 88Jul 25, 89[B05C]
4790642 Integrated metrology for microlithographic objective reducing lensExpiredDec 01, 86Dec 13, 88[G02B, G01B, G01R]
4667415 Microlithographic reticle positioning systemExpiredNov 29, 85May 26, 87[G01B]
4647172 Resist development methodExpiredMay 17, 85Mar 03, 87[H01L, G03D]
4640619 Microlithographic calibration schemeExpiredMar 13, 85Feb 03, 87[C01B]
4616908 Microlithographic systemExpiredJul 19, 84Oct 14, 86[G02B]
4603466 Wafer chuckExpiredFeb 17, 84Aug 05, 86[F28F]
4583856 Resolution system for interferometerExpiredJun 27, 83Apr 22, 86[G01B]
4567361 Reticle bar code and method and apparatus for reading sameExpiredMay 23, 83Jan 28, 86[G06K]
4556785 Apparatus for vapor sheathed baking of semiconductor wafersExpiredMay 23, 83Dec 03, 85[H05B]
4518848 Apparatus for baking resist on semiconductor wafersExpiredMay 15, 81May 21, 85[F27B, F27D]
4509858 Compact, linear measurement interferometer with zero abbe errorExpiredJan 17, 83Apr 09, 85[G01B]
4506005 Method of catalytic etchingExpiredMay 10, 83Mar 19, 85[G03C]
4502871 Apparatus and method for separating wax from an entrainer gasExpiredFeb 01, 83Mar 05, 85[B01D]
4496423 Gas feed for reactive ion etch systemExpiredNov 14, 83Jan 29, 85[H01L, C23F]
4444531 Air track apparatusExpiredDec 01, 81Apr 24, 84[B65G]
4436424 Interferometer using transverse deviation of test beamExpiredJul 27, 81Mar 13, 84[G01B]
4436985 Apparatus for heat treating semiconductor wafersExpiredMay 03, 82Mar 13, 84[H05B, F26B]
4434217 Chalcogenide productExpiredJan 05, 81Feb 28, 84[G03C]
4425508 Electron beam lithographic apparatusExpiredMay 07, 82Jan 10, 84[G21K]

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