GENERAL PLASMA, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 13115
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 992
 
  
 
H05H PLASMA TECHNIQUE 327
 
  
 
B25B TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING, OR HOLDING143
 
  
 
C25B ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON- METALS; APPARATUS THEREFOR 134
 
  
 
F03H PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR 110
 
  
 
F16B DEVICES FOR FASTENING OR SECURING CONSTRUCTIONAL ELEMENTS OR MACHINE PARTS TOGETHER, e.g. NAILS, BOLTS, CIRCLIPS, CLAMPS, CLIPS OR WEDGES; JOINTS OR JOINTING 148
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 145
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 1361
 
  
 
H05B ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR 1110

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0345,628 MAGNETIC ANODE FOR SPUTTER MAGNETRON CATHODEOct 26, 15Nov 30, 17[H01J]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9388490 Rotary magnetron magnet bar and apparatus containing the same for high target utilizationOct 26, 10Jul 12, 16[H01J, C23C]
9136086 Closed drift magnetic field ion source apparatus containing self-cleaning anode and a process for substrate modification therewithDec 08, 09Sep 15, 15[C23C, H01J]
9103018 Sputtering target temperature control utilizing layers having predetermined emissivity coefficientsMay 10, 10Aug 11, 15[H01J, C23C]
8304744 Closed drift ion sourceOct 19, 07Nov 06, 12[G21K]
7993496 Cylindrical target with oscillating magnet for magnetron sputteringJun 30, 05Aug 09, 11[C23C]
7932678 Magnetic mirror plasma source and method using sameSep 13, 04Apr 26, 11[C23C, H01J, C25B, H05B]
7411352 Dual plasma beam sources and methodApr 19, 06Aug 12, 08[H01J]
7327089 Beam plasma sourceSep 19, 03Feb 05, 08[H01J]
7294283 Penning discharge plasma sourceApr 10, 02Nov 13, 07[C23C]
7259378 Closed drift ion sourceJul 08, 05Aug 21, 07[H01J]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0133,426 LINEAR DUOPLASMATRONAbandonedJun 12, 14May 12, 16[H01J]
2015/0299,470 SCRATCH AND FINGERPRINT RESISTANT ANTI-REFLECTIVE FILMS FOR USE ON DISPLAY WINDOWS OF ELECTRONIC DEVICES AND OTHER RELATED TECHNOLOGYAbandonedApr 29, 15Oct 22, 15[C09D, G06F]
2015/0235,821 UNIFORM FORCE FLANGE CLAMPAbandonedSep 19, 13Aug 20, 15[H01J, B25B, F16B]
2014/0057,453 DEPOSITION OF THIN FILMS ON ENERGY SENSITIVE SURFACESAbandonedFeb 10, 12Feb 27, 14[C23C]
8535490 Rotatable magnetron sputtering with axially movable target electrode tubeExpiredJun 06, 08Sep 17, 13[C23C]
2013/0220,797 HIGH TARGET UTILIZATION MOVING MAGNET PLANAR MAGNETRON SCANNING METHODAbandonedMay 19, 11Aug 29, 13[C23C]
2012/0164,353 PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUSAbandonedSep 07, 10Jun 28, 12[C23C]
2011/0236,591 BIPOLAR RECTIFIER POWER SUPPLYAbandonedNov 30, 09Sep 29, 11[C23C, H02M, H05H]
2009/0032,393 Mirror Magnetron Plasma SourceAbandonedMar 16, 07Feb 05, 09[C23C]
2008/0073,557 Methods and apparatuses for directing an ion beam sourceAbandonedJul 26, 06Mar 27, 08[H01J]
6919672 Closed drift ion sourceExpiredApr 10, 03Jul 19, 05[H01J, H05H, F03H]
6818257 Method of providing a material processing ion beamExpiredSep 17, 02Nov 16, 04[C23C]

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