H.C. STARCK INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
B22F WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER 3023
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 2873
 
  
 
C22C ALLOYS 2349
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 1473
 
  
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 1380
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 12116
 
  
 
C22B PRODUCTION OR REFINING OF METALS 820
 
  
 
B21B ROLLING OF METAL 626
 
  
 
C22F CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS OR NON-FERROUS ALLOYS 631
 
  
 
B32B LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM4153

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0252,846 FABRICATION OF METALLIC PARTS BY ADDITIVE MANUFACTURINGMar 01, 17Sep 07, 17[B23K, B33Y, B22F]
2016/0203,960 SPUTTERING TARGETS AND DEVICES INCLUDING Mo, Nb, and Ta, AND METHODSJan 11, 16Jul 14, 16[H01J, C23C, G06F]
2016/0196,961 MULTI-BLOCK SPUTTERING TARGET AND ASSOCIATED METHODS AND ARTICLESMar 11, 16Jul 07, 16[H01J, C23C, B22F, C22C]
2016/0196,962 MULTI-BLOCK SPUTTERING TARGET WITH INTERFACE PORTIONS AND ASSOCIATED METHODS AND ARTICLESMar 11, 16Jul 07, 16[H01J, B22F, C22C]
2015/0292,081 HIGH PURITY REFRACTORY METAL POWDERS AND THEIR USE IN SPUTTERING TARGETS WHICH MAY HAVE RANDOM TEXTUREApr 08, 15Oct 15, 15[C23C, B22F]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9922808 Multi-block sputtering target and associated methods and articlesMar 11, 16Mar 20, 18[C23C, H01J, B22F, C22C]
9834829 Niobium-based alloy that is resistant to aqueous corrosionFeb 10, 17Dec 05, 17[B23K, B33Y, F28F, C22F, C22C]
9837253 Molybdenum containing targets for touch screen deviceJul 30, 15Dec 05, 17[H01J, C23C, C03C, G06F, B22F, C23G, C22C]
9783882 Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefromSep 10, 14Oct 10, 17[C23C, H01J, B22F, C22C]
9767999 Refractory metal platesJun 26, 15Sep 19, 17[H01J, C23C, B22F, C22F, B21B]
9725793 Tantalum based alloy that is resistant to aqueous corrosionApr 25, 08Aug 08, 17[C22B, C22C]
9580773 Niobium based alloy that is resistant to aqueous corrosionAug 25, 15Feb 28, 17[C22B, C22C]
9564299 Methods of manufacturing large-area sputtering targets using interlocking jointsFeb 12, 16Feb 07, 17[H01J, C23C, B05D, B23K]
9521706 Liquid cooled glass melt electrodeApr 23, 14Dec 13, 16[C03B, H05B]
9457405 Metallic crucibles and methods of forming the sameMar 13, 13Oct 04, 16[B22F, C30B]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2014/0356,216 SLIP AND PRESSURE CASTING OF REFRACTORY METAL BODIESAbandonedMay 28, 14Dec 04, 14[B22F]
2014/0299,466 HIGH-DENSITY METALLIC SPUTTERING TARGETSAbandonedMay 05, 14Oct 09, 14[C23C]
2013/0156,967 SPRAY REJUVENATION OF SPUTTERING TARGETSAbandonedDec 13, 12Jun 20, 13[C23C]
2011/0303,535 SPUTTERING TARGETS AND METHODS OF FORMING THE SAMEAbandonedJun 30, 11Dec 15, 11[C23C, B05D, B32B]
2011/0067,524 TANTALUM BASED ALLOY THAT IS RESISTANT TO AQUEOUS CORROSIONAbandonedOct 29, 10Mar 24, 11[C22C]
2011/0008,201 NIOBIUM BASED ALLOY THAT IS RESISTANT TO AQUEOUS CORROSIONAbandonedJul 07, 09Jan 13, 11[C22B, C22C]
2010/0196,734 WEAR PROTECTION SHEETS, PROCESSES FOR PRODUCING THE SAME, AND USES THEREOFAbandonedOct 08, 09Aug 05, 10[B05D, B29C, B22F, B32B]
7645494 Pre-plating surface treatments for enhanced galvanic-corrosion resistanceExpiredMar 27, 08Jan 12, 10[C23C, B05D, C23F]
2009/0186,230 REFRACTORY METAL-DOPED SPUTTERING TARGETS, THIN FILMS PREPARED THEREWITH AND ELECTRONIC DEVICE ELEMENTS CONTAINING SUCH FILMSAbandonedOct 23, 08Jul 23, 09[C23C, B22F]
2008/0314,737 Methods of Making Molybdenium Titanium Sputtering Plates and TargetsAbandonedOct 16, 06Dec 25, 08[C23C]
2008/0145,688 Method of joining tantalum clade steel structuresAbandonedDec 13, 06Jun 19, 08[B23K, B32B]
2008/0118,031 Metallic alloy for X-ray targetAbandonedNov 17, 06May 22, 08[H01J, C22C]
2008/0105,082 Magnesium Removal From Magnesium Reduced Metal PowdersAbandonedSep 19, 05May 08, 08[B22F]
2008/0102,304 Refractory Metal Substrate with Improved Thermal ConductivityAbandonedOct 27, 05May 01, 08[H01L, B32B]
2008/0087,866 Titanium oxide-based sputtering target for transparent conductive film, method for producing such film and composition for use thereinAbandonedOct 13, 06Apr 17, 08[H01B]
7354472 Metalothermic reduction of refractory metal oxidesExpiredJun 21, 04Apr 08, 08[B22F]
2008/0078,268 Process for preparing metal powders having low oxygen content, powders so-produced and uses thereofAbandonedOct 03, 06Apr 03, 08[B22F]
2008/0081,122 Process for producing a rotary anode and the anode produced by such processAbandonedOct 03, 06Apr 03, 08[C23C]
2007/0280,848 Methods Of Forming Alpha And Beta Tantalum Films With Controlled And New MicrostructuresAbandonedMar 24, 05Dec 06, 07[B05D, C22C]
2007/0071,985 Sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use thereinAbandonedSep 29, 05Mar 29, 07[C04B]

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