Hirama Laboratories Co., Ltd.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
G03D APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS 214
 
 
 
B01F MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING 141

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
6752545 Alkali-based treating liquid, treating liquid adjusting method and equipment, treating liquid supplying method and equipmentAug 09, 02Jun 22, 04[G03D]
6623183 Developer producing equipment and methodFeb 06, 02Sep 23, 03[G03D]
6588927 Purified developer producing equipment and methodFeb 06, 02Jul 08, 03[B01F]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
7109037 Water-based resist stripping liquid management apparatus and water-based resist stripping liquid management methodExpiredJun 25, 02Sep 19, 06[G01N]
7101517 Processing solution preparation and supply method and apparatusExpiredJan 15, 03Sep 05, 06[B01J]
2004/0011,463 Resist stripping equipmentAbandonedJul 07, 03Jan 22, 04[H01L]
2002/0197,079 Non-water-based resist stripping liquid management apparatus and non-water-based resist stripping liquid management methodAbandonedJun 21, 02Dec 26, 02[G03D]

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