IMS NANOFABRICATION GMBH

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Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 8120
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 442
 
  
 
A61N ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY 1106
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1100
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 177
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 1205

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
7436120 Compensation of magnetic fieldsMar 02, 05Oct 14, 08[H01J]
7388217 Particle-optical projection systemJan 31, 07Jun 17, 08[H01J]
7276714 Advanced pattern definition for particle-beam processingApr 29, 05Oct 02, 07[G21K]
7214951 Charged-particle multi-beam exposure apparatusOct 20, 04May 08, 07[H01J]
7199373 Particle-optic electrostatic lensSep 27, 04Apr 03, 07[G21K]
7084411 Pattern-definition device for maskless particle-beam exposure apparatusOct 27, 04Aug 01, 06[H01J]
6989546 Particle multibeam lithographyAug 17, 99Jan 24, 06[H01J]
6909103 Ion irradiation of a target at very high and very low kinetic ion energiesJul 07, 04Jun 21, 05[H01J]
6858118 Apparatus for enhancing the lifetime of stencil masksMar 24, 03Feb 22, 05[C23C]
6768125 Maskless particle-beam system for exposing a pattern on a substrateJan 08, 03Jul 27, 04[H01J, G21K]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
7041992 Charged-particle multi-beam exposure apparatusWithdrawnOct 20, 04May 09, 06[H01J]
2005/0201,246 Particle-optical projection systemAbandonedMar 15, 05Sep 15, 05[G11B]
2003/0236,169 Method for producing a superconducting circuitAbandonedJan 15, 03Dec 25, 03[H01B]

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