JSR CORPORATION

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 36411
 
 
 
C08F MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 18521
 
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 125240
 
 
 
C08L COMPOSITIONS OF MACROMOLECULAR COMPOUNDS 9540
 
 
 
C08G MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 6462
 
 
 
C08K USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS 6048
 
 
 
C09K MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR4551
 
 
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 4412
 
 
 
B32B LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM43114
 
 
 
C07C ACYCLIC OR CARBOCYCLIC COMPOUNDS 4395

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0068,863 TREATMENT AGENT FOR INHIBITING SUBSTRATE PATTERN COLLAPSE AND TREATMENT METHOD OF SUBSTRATENov 14, 17Mar 08, 18[H01L]
2018/0009,938 POLYMER, RESIN COMPOSITION AND RESIN MOLDED PRODUCTSep 20, 17Jan 11, 18[C08G]
2017/0362,412 COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHODAug 29, 17Dec 21, 17[G03F, C08K]
2017/0330,762 SEMICONDUCTOR TREATMENT COMPOSITION AND TREATMENT METHODMay 02, 17Nov 16, 17[H01L]
2017/0322,492 RESIST PATTERN-FORMING METHODFeb 23, 17Nov 09, 17[G03F]
2017/0317,131 SOLID-STATE IMAGING DEVICE AND INFRARED-ABSORBING COMPOSITIONJul 20, 17Nov 02, 17[H04N, G02B, H01L]
2017/0317,132 SOLID-STATE IMAGING DEVICE, INFRARED-ABSORBING COMPOSITION, AND FLATTENED-FILM-FORMING CURABLE COMPOSITIONJul 20, 17Nov 02, 17[H04N, G02B, H01L]
2017/0299,962 RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHODJul 06, 17Oct 19, 17[G03F]
2017/0292,947 SOLID PHASE CARRIER, LIGAND-BOUND SOLID PHASE CARRIER, METHOD FOR DETECTING OR SEPARATING TARGET SUBSTANCE, AND METHOD FOR PRODUCING SOLID PHASE CARRIERSep 07, 15Oct 12, 17[C08F, G01N, C08L]
2017/0269,476 PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITION, AND RESIST PATTERN-FORMING METHODJun 01, 17Sep 21, 17[C08F, G03F]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9920287 Cleaning composition and cleaning methodMay 18, 15Mar 20, 18[C11D]
9921474 Pattern-forming method and compositionMar 09, 15Mar 20, 18[C09D, G03F, C08K]
9916985 Indium phosphide smoothing and chemical mechanical planarization processesMay 20, 16Mar 13, 18[C09G, H01L]
9890300 Germanium smoothing and chemical mechanical planarization processesApr 18, 17Feb 13, 18[C09K, C09G, H01L]
9891526 Pattern forming methodJan 19, 16Feb 13, 18[C09K, G03F, H01L]
9874816 Radiation-sensitive resin composition and resist pattern-forming methodMar 24, 16Jan 23, 18[C08F, G03F, H01L]
9862992 Surface of substrate onto which non-specific adsorption is restrainedAug 14, 14Jan 09, 18[C12Q, G01N]
9847232 Pattern-forming methodMar 24, 17Dec 19, 17[G03F, H01L]
9817311 Resist pattern-forming method, substrate-processing method, and photoresist compositionMay 25, 16Nov 14, 17[G03F]
9818598 Substrate cleaning method and recording mediumJul 27, 15Nov 14, 17[B08B, H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2017/0160,637 UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHODAbandonedDec 22, 15Jun 08, 17[G03F]
2017/0137,663 COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM, AND PRODUCTION METHOD OF PATTERNED SUBSTRATEAbandonedMar 03, 16May 18, 17[G03F, C09D]
2017/0059,992 RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITIONAbandonedAug 17, 16Mar 02, 17[G03F]
2016/0363,859 RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHODAbandonedMay 16, 16Dec 15, 16[G03F]
2016/0320,705 RESIST PATTERN-FORMING METHODAbandonedJul 14, 16Nov 03, 16[G03F]
2016/0185,999 RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMERAbandonedMar 10, 16Jun 30, 16[C08F, G03F, C09D]
2016/0149,250 ELECTROLYTE MEMBRANE, MEMBRANE-ELECTRODE ASSEMBLY, AND SOLID POLYMER FUEL CELLAbandonedJul 09, 14May 26, 16[H01M]
2016/0097,978 RESIST PATTERN-FORMING METHODAbandonedOct 07, 15Apr 07, 16[G03F]
9298090 Pattern-forming method, and radiation-sensitive compositionWithdrawnMar 06, 15Mar 29, 16[C08F, G03F, C07C]
2016/0054,616 ARRAY SUBSTRATE, LIQUID CRYSTAL DISPLAY ELEMENT, AND RADIATION-SENSITIVE RESIN COMPOSITIONAbandonedApr 02, 14Feb 25, 16[G03F, G02F]
2016/0057,866 METAL FILM FORMING METHOD AND CONDUCTIVE INK USED IN SAID METHODAbandonedAug 19, 14Feb 25, 16[H01B, C09D, H01L, C08K, H05K]
2016/0032,227 CLEANING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE AND CLEANING METHODAbandonedJul 28, 15Feb 04, 16[C11D]
2015/0368,387 METHOD FOR PRODUCING HYDROGENATED CONJUGATED DIENE POLYMERAbandonedFeb 14, 14Dec 24, 15[C08F, C08K, C08L]
2015/0344,739 AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, AND CHEMICAL MECHANICAL POLISHING METHODAbandonedDec 11, 13Dec 03, 15[C09G]
2015/0322,578 METHOD FOR MANUFACTURING MEMBRANE-ELECTRODE ASSEMBLY, MEMBRANE-ELECTRODE ASSEMBLY, LAMINATE FOR FORMING MEMBRANE-ELECTRODE ASSEMBLY, POLYMER ELECTROLYTE FUEL CELL AND WATER-ELECTROLYSIS DEVICEAbandonedDec 02, 13Nov 12, 15[H01M, C25B]
2015/0323,837 LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR FABTICATING THE SAMEAbandonedApr 23, 15Nov 12, 15[G02F]
2015/0291,441 CONTAINER CONTAINING A COBALT CARBONYL COMPLEX AND COBALT CARBONYL COMPLEX COMPOSITIONAbandonedJun 25, 15Oct 15, 15[C01G, B65D]
2015/0284,539 COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHODAbandonedMar 27, 15Oct 08, 15[G03F, C08K]
9152044 Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compoundWithdrawnSep 26, 12Oct 06, 15[C07D, G03F, C07C]
9140985 Silicon-containing film-forming composition, silicon-containing film, and pattern forming methodWithdrawnMar 12, 10Sep 22, 15[C08G, G03F]

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