LAM RESEARCH CORPORATION

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Intl Class Technology # of Patents/ App Rank in Class
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 791 46
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 290 3
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 263 2
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 215 3
 
 
H05H PLASMA TECHNIQUE 116 3
 
 
B44C PRODUCING DECORATIVE EFFECTS 76 3
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 67 323
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 65 55
 
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 51 44
 
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 48 34
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Top Patents (by citation)

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2014/0356,985 TEMPERATURE CONTROLLED SUBSTRATE SUPPORT ASSEMBLY Jun 03, 13 Dec 04, 14 [C23C, H01J, H01L]
2014/0357,092 CHAMBER WALL OF A PLASMA PROCESSING APPARATUS INCLUDING A FLOWING PROTECTIVE LIQUID LAYER Jun 04, 13 Dec 04, 14 [H01L]
2014/0349,417 System, Method and Apparatus for RF Power Compensation in Plasma Etch Chamber May 23, 13 Nov 27, 14 [H01L]
2014/0342,568 CONTROLLING TEMPERATURE OF A FARADAY SHIELD May 16, 13 Nov 20, 14 [H01L, G05D]
2014/0343,875 METROLOGY METHOD FOR TRANSIENT GAS FLOW May 16, 13 Nov 20, 14 [G01F]
2014/0332,037 Controls of Ambient Environment During Wafer Drying Using Proximity Head May 28, 14 Nov 13, 14 [H01L]
2014/0335,698 COMPONENT OF A PLASMA PROCESSING APPARATUS HAVING A PROTECTIVE IN SITU FORMED LAYER ON A PLASMA EXPOSED SURFACE May 07, 13 Nov 13, 14 [H01J, H01L]
2014/0326,608 ANISOTROPIC HIGH RESISTANCE IONIC CURRENT SOURCE (AHRICS) Apr 11, 14 Nov 06, 14 [C25D]
2014/0329,391 CONTINUOUS PLASMA ETCH PROCESS May 01, 13 Nov 06, 14 [H01L]
2014/0315,392 COLD SPRAY BARRIER COATED COMPONENT OF A PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF Apr 22, 13 Oct 23, 14 [H01L]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8,906,163 Methods and apparatus for integrating and controlling a plasma processing system Dec 07, 10 Dec 09, 14 [B08B]
8,906,164 Methods for stabilizing contact surfaces of electrostatic chucks Aug 05, 10 Dec 09, 14 [B08B, H01L]
8,906,194 Ultra-high aspect ratio dielectric etch Feb 02, 10 Dec 09, 14 [C23F, H01L]
8,906,195 Tuning hardware for plasma ashing apparatus and methods of use thereof Nov 18, 09 Dec 09, 14 [C23F, C23C, H01J, H01L]
8,906,197 Plasma processing chamber having electrodes for cleaning chamber Jul 03, 12 Dec 09, 14 [C23C, H01J, H01L]
8,906,248 Silicon on insulator etch Dec 13, 11 Dec 09, 14 [H01L]
8,906,446 Apparatus and method for electroless deposition of materials on semiconductor substrates Feb 29, 12 Dec 09, 14 [C23C, H01L]
8,906,810 Pulsed dielectric etch process for in-situ metal hard mask shape control to enable void-free metallization May 07, 13 Dec 09, 14 [H01L]
8,909,365 Methods and apparatus for controlling a plasma processing system Nov 19, 10 Dec 09, 14 [G06F, G01N]
RE45280 Segmented coil for generating plasma in plasma processing equipment Mar 22, 00 Dec 09, 14 [B23K, H05H]
8,898,889 Chuck assembly for plasma processing Mar 13, 12 Dec 02, 14 [B23P, H01J, H01L]
8,898,928 Delamination drying apparatus and method Oct 11, 12 Dec 02, 14 [F26B]
8,900,374 Method for substrate cleaning including movement of substrate below substrate cleaning module Nov 09, 10 Dec 02, 14 [B08B, H01L]
8,900,398 Local plasma confinement and pressure control arrangement and methods thereof Aug 31, 10 Dec 02, 14 [H01J, H01L]
8,900,400 Proximity head having a fluid resistor Oct 26, 12 Dec 02, 14 [B08B, H01L]
8,900,402 Semiconductor processing system having multiple decoupled plasma sources May 10, 11 Dec 02, 14 [C23F, H01J, H01L]
8,900,403 Semiconductor processing system having multiple decoupled plasma sources May 10, 11 Dec 02, 14 [C23F, H01J, H01L]
8,900,404 Plasma processing systems with mechanisms for controlling temperatures of components May 19, 09 Dec 02, 14 [C23F, C23C, H01J, H01L]
8,900,470 Differential measurements for endpoint signal enhancement Oct 17, 12 Dec 02, 14 [G01L]
8,901,004 Plasma etch method to reduce micro-loading Jul 20, 10 Dec 02, 14 [C23F, C03C, H01L]
8,901,935 Methods and apparatus for detecting the confinement state of plasma in a plasma processing system Oct 19, 10 Dec 02, 14 [G01N]
8,893,642 Airflow management for low particulate count in a process tool Mar 24, 10 Nov 25, 14 [C23C, H01L]
8,893,702 Ductile mode machining methods for hard and brittle components of plasma processing apparatuses Feb 20, 13 Nov 25, 14 [B23P, B23B, B28D, H01L]
8,894,804 Plasma unconfinement sensor and methods thereof Dec 12, 08 Nov 25, 14 [C23F, H01J]
8,895,323 Method of forming a magnetoresistive random-access memory device Dec 14, 12 Nov 25, 14 [H01L]
8,895,441 Methods and materials for anchoring gapfill metals Feb 24, 12 Nov 25, 14 [B32B]
8,895,452 Substrate support providing gap height and planarization adjustment in plasma processing chamber May 31, 12 Nov 25, 14 [H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Filing Date Issue/Pub Date Intl Class
2012/0145,202 Cleaning Compound and Method and System for Using the Cleaning Compound Feb 14, 12 Jun 14, 12 [B08B]
2012/0101,917 BUSINESS MOBILE COMMUNICATION SYSTEM Oct 03, 11 Apr 26, 12 [G06Q]
2012/0024,314 PLASMA MEDIATED ASHING PROCESSES Jul 27, 10 Feb 02, 12 [B08B]
2011/0306,203 INTERCONNECT STRUCTURE AND METHOD OF MANUFACTURING A DAMASCENE STRUCTURE Aug 25, 11 Dec 15, 11 [H01L]
2011/0271,905 Methods and System for Processing a Microelectronic Topography Jul 19, 11 Nov 10, 11 [B05C]
2011/0226,280 PLASMA MEDIATED ASHING PROCESSES May 27, 11 Sep 22, 11 [C23F, B08B]
2011/0136,346 Substantially Non-Oxidizing Plasma Treatment Devices and Processes Dec 04, 09 Jun 09, 11 [B08B, G03F, H01L]
2011/0061,687 Apparatus for Contained Chemical Surface Treatment Nov 18, 10 Mar 17, 11 [B08B]
2011/0060,442 METHODS AND ARRANGEMENT FOR DETECTING A WAFER-RELEASED EVENT WITHIN A PLASMA PROCESSING CHAMBER Sep 10, 09 Mar 10, 11 [G06F]
2011/0039,410 Apparatus and Method for Substrate Electroless Plating Oct 25, 10 Feb 17, 11 [H01L]
2011/0036,500 WIDE AREA RADIO FREQUENCY PLASMA APPARATUS FOR PROCESSING MULTIPLE SUBSTRATES Oct 22, 10 Feb 17, 11 [H01Q, H01L]
2011/0014,489 Method for Strengthening Adhesion Between Dielectric Layers Formed Adjacent to Metal Layers Sep 24, 10 Jan 20, 11 [B05C, B05D, B32B]
2010/0184,301 Methods for Preventing Precipitation of Etch Byproducts During an Etch Process and/or Subsequent Rinse Process Jan 20, 09 Jul 22, 10 [H01L]
2010/0130,017 FRONT END OF LINE PLASMA MEDIATED ASHING PROCESSES AND APPARATUS Nov 21, 08 May 27, 10 [H01L]
2010/0062,164 Methods and Solutions for Preventing the Formation of Metal Particulate Defect Matter Upon a Substrate After a Plating Process Sep 08, 08 Mar 11, 10 [C09K, B05D, C25D]
2010/0015,731 Method of low-k dielectric film repair Feb 20, 07 Jan 21, 10 [C23C, H01L]
2009/0288,688 NON-CORROSIVE CHEMICAL RINSE SYSTEM Mar 11, 06 Nov 26, 09 [C09K, B08B]
2009/0291,562 HELIUM DESCUMMING May 20, 08 Nov 26, 09 [B08B, H01L]
2009/0277,871 PLASMA MEDIATED ASHING PROCESSES THAT INCLUDE FORMATION OF A PROTECTIVE LAYER BEFORE AND/OR DURING THE PLASMA MEDIATED ASHING PROCESS Mar 05, 09 Nov 12, 09 [C23F]
2009/0211,596 Method of post etch polymer residue removal Jul 11, 07 Aug 27, 09 [B08B]

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