LAM RESEARCH CORPORATION

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology MATTERS Rank in Class
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 962 39
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 400 3
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 248 2
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 207 3
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 200 26
 
 
H05H PLASMA TECHNIQUE 104 3
 
 
B44C PRODUCING DECORATIVE EFFECTS 72 4
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 68 358
 
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 54 98
 
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 48 41
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Top Patents (by citation)

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2016/0163,539 METHODS FOR DEPOSITING SILICON OXIDE Jul 18, 14 Jun 09, 16 [H01J, H01L]
2016/0163,556 TECHNIQUE TO DEPOSIT SIDEWALL PASSIVATION FOR HIGH ASPECT RATIO CYLINDER ETCH Dec 04, 14 Jun 09, 16 [C23C, H01J, H01L]
2016/0163,557 TECHNIQUE TO DEPOSIT SIDEWALL PASSIVATION FOR HIGH ASPECT RATIO CYLINDER ETCH Apr 27, 15 Jun 09, 16 [H01L]
2016/0163,558 TECHNIQUE TO DEPOSIT METAL-CONTAINING SIDEWALL PASSIVATION FOR HIGH ASPECT RATIO CYLINDER ETCH Jul 20, 15 Jun 09, 16 [H01L]
2016/0163,561 TECHNIQUE TO DEPOSIT SIDEWALL PASSIVATION FOR HIGH ASPECT RATIO CYLINDER ETCH May 28, 15 Jun 09, 16 [C23C, H01J, H01L]
2016/0155,615 METHODS AND APPARATUS FOR A HYBRID CAPACITIVELY-COUPLED AND AN INDUCTIVELY-COUPLED PLASMA PROCESSING SYSTEM Feb 03, 16 Jun 02, 16 [H01J]
2016/0147,234 VALVE MANIFOLD DEADLEG ELIMINATION VIA REENTRANT FLOW PATH Jul 22, 15 May 26, 16 [F16K, G05D]
2016/0148,800 SELECTIVE INHIBITION IN ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS Nov 24, 14 May 26, 16 [C23C, H01L]
2016/0148,806 METHOD OF DEPOSITING AMMONIA FREE AND CHLORINE FREE CONFORMAL SILICON NITRIDE FILM Nov 24, 14 May 26, 16 [H01L]
2016/0148,813 GAS INJECTION METHOD FOR UNIFORMLY PROCESSING A SEMICONDUCTOR SUBSTRATE IN A SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS Nov 25, 14 May 26, 16 [H01L]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9,364,870 Ultrasonic cleaning method and apparatus therefore Oct 29, 15 Jun 14, 16 [G02B, B08B, H01J]
9,368,329 Methods and apparatus for synchronizing RF pulses in a plasma processing system Jul 17, 12 Jun 14, 16 [H01J]
9,368,340 Metallization of the wafer edge for optimized electroplating performance on resistive substrates Jun 02, 14 Jun 14, 16 [C23C, H01L, C25D]
9,359,673 Apparatus and method for atomic layer deposition Jun 05, 12 Jun 07, 16 [C23C, H01L]
9,362,133 Method for forming a mask by etching conformal film on patterned ashable hardmask Dec 10, 13 Jun 07, 16 [H01L]
9,362,163 Methods and apparatuses for atomic layer cleaning of contacts and vias Jul 29, 14 Jun 07, 16 [C23G, H01L]
9,353,439 Cascade design showerhead for transient uniformity Apr 05, 13 May 31, 16 [C23C, H01J]
9,353,444 Two-step deposition with improved selectivity Mar 25, 14 May 31, 16 [C23C, H01L]
9,355,839 Sub-saturated atomic layer deposition and conformal film deposition Oct 23, 13 May 31, 16 [C23C, H01L]
9,355,884 Installation fixture for elastomer bands and methods of using the same Aug 27, 14 May 31, 16 [H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2015/0155,176 SIDEWALL HEIGHT NONUNIFORMITY REDUCTION FOR SIDEWALL IMAGE TRANSFER PROCESSES ABAN Dec 03, 13 Jun 04, 15 [H01L]
2015/0079,786 METHOD AND SOLUTION FOR CLEANING METAL RESIDUE ABAN Sep 17, 13 Mar 19, 15 [C09K, H01L]
2015/0037,979 CONFORMAL SIDEWALL PASSIVATION ABAN Aug 02, 13 Feb 05, 15 [H01L]
2014/0332,037 Controls of Ambient Environment During Wafer Drying Using Proximity Head ABAN May 28, 14 Nov 13, 14 [H01L]
2014/0261,535 Standing Wave Generation in Holes to Enhance Cleaning in the Holes in Liquid Sonification Cleaning Systems ABAN Mar 13, 13 Sep 18, 14 [B08B]
2014/0263,179 TUNING SYSTEM AND METHOD FOR PLASMA-BASED SUBSTRATE PROCESSING SYSTEMS ABAN Mar 15, 13 Sep 18, 14 [H01J, H01P]
2014/0179,097 DEPOSITION APPARATUS AND METHOD ABAN Dec 21, 12 Jun 26, 14 [H01L]
2014/0170,780 Method of Low-K Dielectric Film Repair ABAN Feb 24, 14 Jun 19, 14 [H01L]
2014/0127,911 PALLADIUM PLATED ALUMINUM COMPONENT OF A PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF ABAN Nov 07, 12 May 08, 14 [H01L, C25D]
2014/0113,453 TUNGSTEN CARBIDE COATED METAL COMPONENT OF A PLASMA REACTOR CHAMBER AND METHOD OF COATING ABAN Oct 24, 12 Apr 24, 14 [C23C, B32B, H01L]
2014/0083,463 SYSTEM AND METHOD FOR MONITORING WAFER STRESS ABAN Sep 21, 12 Mar 27, 14 [B08B]
2014/0076,713 Edge Ramping ABAN Oct 24, 12 Mar 20, 14 [H05H]
2014/0059,789 Apparatus for Cleaning a Semiconductor Substrate ABAN Oct 16, 13 Mar 06, 14 [H01L]
2014/0051,255 COPPER DISCOLORATION PREVENTION FOLLOWING BEVEL ETCH PROCESS ABAN Oct 28, 13 Feb 20, 14 [H01L]
2014/0041,581 Single Substrate Processing Head For Particle Removal Using Low Viscosity Fluid ABAN Oct 11, 13 Feb 13, 14 [H01L]
2014/0034,096 Acoustic Assisted Single Wafer Wet Clean For Semiconductor Wafer Process ABAN Oct 09, 13 Feb 06, 14 [H01L]
2014/0030,893 METHOD FOR SHRINK AND TUNE TRENCH/VIA CD ABAN Jul 24, 12 Jan 30, 14 [H01L]
2013/0312,913 ARRANGEMENT FOR DEPOSITING BEVEL PROTECTIVE FILM ABAN Aug 05, 13 Nov 28, 13 [H01L]
2013/0267,097 METHOD AND APPARATUS FOR FORMING FEATURES WITH PLASMA PRE-ETCH TREATMENT ON PHOTORESIST ABAN Apr 05, 12 Oct 10, 13 [C23F, H01L]
2013/0264,309 ACOUSTIC ENERGY UTILIZATION IN PLASMA PROCESSING ABAN Apr 05, 12 Oct 10, 13 [B44C, H05H]

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