LAM RESEARCH CORPORATION

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology MATTERS Rank in Class
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 974 39
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 404 3
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 250 2
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 207 3
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 205 25
 
 
H05H PLASMA TECHNIQUE 102 3
 
 
B44C PRODUCING DECORATIVE EFFECTS 71 4
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 67 347
 
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 54 101
 
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 48 39
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Top Patents (by citation)

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2016/0211,165 MOVEABLE EDGE COUPLING RING FOR EDGE PROCESS CONTROL DURING SEMICONDUCTOR WAFER PROCESSING Jan 16, 15 Jul 21, 16 [H01L]
2016/0211,166 MOVEABLE EDGE COUPLING RING FOR EDGE PROCESS CONTROL DURING SEMICONDUCTOR WAFER PROCESSING May 06, 15 Jul 21, 16 [H01L]
2016/0201,212 MULTI-CONTACT LIPSEALS AND ASSOCIATED ELECTROPLATING METHODS Jan 07, 16 Jul 14, 16 [C25D]
2016/0203,952 CERAMIC GAS DISTRIBUTION PLATE WITH EMBEDDED ELECTRODE Jan 12, 15 Jul 14, 16 [H01J]
2016/0203,995 INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) AND ALE (ATOMIC LAYER ETCH) Apr 24, 15 Jul 14, 16 [H01L]
2016/0205,725 SYSTEM AND METHOD FOR MONITORING TEMPERATURES OF AND CONTROLLING MULTIPLEXED HEATER ARRAY Mar 22, 16 Jul 14, 16 [H05B]
2016/0198,524 MULTIPLEXED HEATER ARRAY USING AC DRIVE FOR SEMICONDUCTOR PROCESSING Mar 15, 16 Jul 07, 16 [H05B, H01L]
2016/0189,966 PRE-FILL WAFER CLEANING FORMULATION Mar 31, 15 Jun 30, 16 [C11D, H01L]
2016/0177,443 HARDWARE AND PROCESS FOR FILM UNIFORMITY IMPROVEMENT Dec 19, 14 Jun 23, 16 [C23C]
2016/0177,444 REDUCING BACKSIDE DEPOSITION AT WAFER EDGE Dec 19, 14 Jun 23, 16 [C23C]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9,393,666 Adapter plate for polishing and cleaning electrodes Dec 20, 13 Jul 19, 16 [B24B, H01J]
9,396,908 Systems and methods for controlling a plasma edge region Dec 02, 11 Jul 19, 16 [H05B, H01J]
9,396,910 Heat transfer plate for a showerhead electrode assembly of a capacitively coupled plasma processing apparatus Nov 20, 15 Jul 19, 16 [C23C, H01J, H01L]
9,396,912 Methods for mixed acid cleaning of showerhead electrodes May 30, 12 Jul 19, 16 [C23C, B08B, H01J]
9,396,961 Integrated etch/clean for dielectric etch applications Feb 02, 15 Jul 19, 16 [H01J, H01L]
9,397,011 Systems and methods for reducing copper contamination due to substrate processing chambers with components made of alloys including copper Apr 13, 15 Jul 19, 16 [C23C, H01J, H01L]
9,398,680 Immersible plasma coil assembly and method for operating the same Dec 03, 10 Jul 19, 16 [C23C, H01J, H05H, H01L]
9,387,521 Method of wet cleaning aluminum chamber parts Sep 30, 13 Jul 12, 16 [B24C, B08B, H01L]
9,390,893 Sub-pulsing during a state Aug 22, 14 Jul 12, 16 [H05H, H01J, H03L]
9,390,895 Gas injector particle removal process and apparatus Jun 28, 13 Jul 12, 16 [B08B, C11D, H01J]
9,391,267 Method to etch non-volatile metal materials Aug 04, 15 Jul 12, 16 [C23F, H01L]
9,392,643 Heating plate with planar heater zones for semiconductor processing Oct 24, 13 Jul 12, 16 [C23C, F27D, H05B, F27B, H01L]
9,382,627 Methods and materials for anchoring gapfill metals Oct 16, 14 Jul 05, 16 [C23C, B32B, H01L]
9,384,948 Hammerhead TCP coil support for high RF power conductor etch systems Jun 21, 13 Jul 05, 16 [C23C, H01J, H01L]
9,384,979 Apparatus for the deposition of a conformal film on a substrate and methods therefor Sep 28, 12 Jul 05, 16 [C23F, C23C, H01J, H01L]
9,384,998 Technique to deposit sidewall passivation for high aspect ratio cylinder etch May 28, 15 Jul 05, 16 [C23C, H01J, H01L]
9,385,003 Residue free systems and methods for isotropically etching silicon in tight spaces Feb 16, 15 Jul 05, 16 [H01J, H01L]
9,385,021 Electronic knob for tuning radial etch non-uniformity at VHF frequencies Dec 03, 14 Jul 05, 16 [H01J, H01L]
9,385,318 Method to integrate a halide-containing ALD film on sensitive materials Jul 28, 15 Jul 05, 16 [H01L]
9,378,971 Technique to deposit sidewall passivation for high aspect ratio cylinder etch Dec 04, 14 Jun 28, 16 [C23C, H01J, H01L]
9,379,210 Sacrificial pre-metal dielectric for self-aligned contact scheme Oct 14, 15 Jun 28, 16 [H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0079,100 VACUUM CARRIER INTERFACE HAVING A SWITCHABLE REDUCED CAPACITY AIRLOCK CHAMBER ABAN Sep 17, 14 Mar 17, 16 [C23C, H01L, B25J]
2015/0155,176 SIDEWALL HEIGHT NONUNIFORMITY REDUCTION FOR SIDEWALL IMAGE TRANSFER PROCESSES ABAN Dec 03, 13 Jun 04, 15 [H01L]
2015/0079,786 METHOD AND SOLUTION FOR CLEANING METAL RESIDUE ABAN Sep 17, 13 Mar 19, 15 [C09K, H01L]
2015/0040,947 Method and Systems for Cleaning A Substrate ABAN Aug 07, 13 Feb 12, 15 [H01L]
2015/0037,979 CONFORMAL SIDEWALL PASSIVATION ABAN Aug 02, 13 Feb 05, 15 [H01L]
2014/0332,037 Controls of Ambient Environment During Wafer Drying Using Proximity Head ABAN May 28, 14 Nov 13, 14 [H01L]
2014/0261,535 Standing Wave Generation in Holes to Enhance Cleaning in the Holes in Liquid Sonification Cleaning Systems ABAN Mar 13, 13 Sep 18, 14 [B08B]
2014/0263,179 TUNING SYSTEM AND METHOD FOR PLASMA-BASED SUBSTRATE PROCESSING SYSTEMS ABAN Mar 15, 13 Sep 18, 14 [H01J, H01P]
2014/0179,097 DEPOSITION APPARATUS AND METHOD ABAN Dec 21, 12 Jun 26, 14 [H01L]
2014/0170,780 Method of Low-K Dielectric Film Repair ABAN Feb 24, 14 Jun 19, 14 [H01L]
2014/0127,911 PALLADIUM PLATED ALUMINUM COMPONENT OF A PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF ABAN Nov 07, 12 May 08, 14 [H01L, C25D]
2014/0113,453 TUNGSTEN CARBIDE COATED METAL COMPONENT OF A PLASMA REACTOR CHAMBER AND METHOD OF COATING ABAN Oct 24, 12 Apr 24, 14 [C23C, B32B, H01L]
2014/0083,463 SYSTEM AND METHOD FOR MONITORING WAFER STRESS ABAN Sep 21, 12 Mar 27, 14 [B08B]
2014/0076,713 Edge Ramping ABAN Oct 24, 12 Mar 20, 14 [H05H]
2014/0059,789 Apparatus for Cleaning a Semiconductor Substrate ABAN Oct 16, 13 Mar 06, 14 [H01L]
2014/0053,984 SYMMETRIC RETURN LINER FOR MODULATING AZIMUTHAL NON-UNIFORMITY IN A PLASMA PROCESSING SYSTEM ABAN Nov 29, 12 Feb 27, 14 [B05C, H05H]
2014/0051,255 COPPER DISCOLORATION PREVENTION FOLLOWING BEVEL ETCH PROCESS ABAN Oct 28, 13 Feb 20, 14 [H01L]
2014/0041,581 Single Substrate Processing Head For Particle Removal Using Low Viscosity Fluid ABAN Oct 11, 13 Feb 13, 14 [H01L]
2014/0034,096 Acoustic Assisted Single Wafer Wet Clean For Semiconductor Wafer Process ABAN Oct 09, 13 Feb 06, 14 [H01L]
2014/0030,893 METHOD FOR SHRINK AND TUNE TRENCH/VIA CD ABAN Jul 24, 12 Jan 30, 14 [H01L]

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