LAM RESEARCH CORPORATION

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology MATTERS Rank in Class
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 897 42
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 359 3
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 252 2
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 208 3
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 151 35
 
 
H05H PLASMA TECHNIQUE 104 3
 
 
B44C PRODUCING DECORATIVE EFFECTS 74 4
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 65 343
 
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 51 97
 
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 48 37
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Top Patents (by citation)

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2016/0028,362 HIGH POWER FILTER WITH SINGLE ADJUST FOR MULTIPLE CHANNELS Jul 23, 14 Jan 28, 16 [H03H, H04B]
2016/0017,493 SYSTEMS AND METHODS FOR IMPROVING DEPOSITION RATE UNIFORMITY AND REDUCING DEFECTS IN SUBSTRATE PEOCESSING SYSTEMS Jul 15, 14 Jan 21, 16 [C23C]
2016/0020,075 MULTI-RANGE VOLTAGE SENSOR AND METHOD FOR A VOLTAGE CONTROLLED INTERFACE OF A PLASMA PROCESSING SYSTEM Jul 21, 14 Jan 21, 16 [G01R, H01J]
2016/0020,092 METHODS FOR DEPOSITING SILICON OXIDE Jul 18, 14 Jan 21, 16 [H01J, H01L]
2016/0013,020 SYSTEMS AND METHODS FOR PRODUCING ENERGETIC NEUTRALS Jun 16, 15 Jan 14, 16 [C23C, H01J]
2015/0376,792 ATMOSPHERIC PLASMA APPARATUS FOR SEMICONDUCTOR PROCESSING Jun 30, 14 Dec 31, 15 [C23C, H01L, C25D]
2015/0377,481 CONFIGURABLE LIQUID PRECURSOR VAPORIZER Jun 30, 14 Dec 31, 15 [F22B]
2015/0380,272 LINER AND BARRIER APPLICATIONS FOR SUBTRACTIVE METAL INTEGRATION Jun 30, 14 Dec 31, 15 [C23C, H01J, H01L]
2015/0380,278 HARDWARE FOR THE SEPARATION AND DEGASSING OF DISSOLVED GASES IN SEMICONDUCTOR PRECURSOR CHEMICALS Jun 30, 14 Dec 31, 15 [H01L, B01D]
2015/0380,281 CERAMIC SHOWERHEAD INCLUDING CENTRAL GAS INJECTOR FOR TUNABLE CONVECTIVE-DIFFUSIVE GAS FLOW IN SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS Jun 27, 14 Dec 31, 15 [H01L]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9,251,999 Capacitively-coupled plasma processing system having a plasma processing chamber for processing a substrate Jun 18, 12 Feb 02, 16 [G03F, H01J, H01L]
9,252,238 Semiconductor structures with coplanar recessed gate layers and fabrication methods Aug 18, 14 Feb 02, 16 [H01L]
9,245,739 Low-K oxide deposition by hydrolysis and condensation Aug 20, 14 Jan 26, 16 [H01L]
9,234,775 Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber Oct 03, 13 Jan 12, 16 [G01F, G05D, G01L]
9,236,228 Frequency enhanced impedance dependent power control for multi-frequency RF pulsing Apr 03, 15 Jan 12, 16 [H01J]
9,236,244 Sequential precursor dosing in an ALD multi-station/batch reactor Dec 15, 14 Jan 12, 16 [C23C, H01L]
9,236,279 Method of dielectric film treatment Mar 13, 08 Jan 12, 16 [B08B, H01L]
9,230,779 Methods and apparatus for correcting for non-uniformity in a plasma processing system Mar 19, 12 Jan 05, 16 [C23C, A23G, H01J, H01L, B05B]
9,230,819 Internal plasma grid applications for semiconductor fabrication in context of ion-ion plasma processing Feb 19, 14 Jan 05, 16 [H01J, H01L]
9,230,825 Method of tungsten etching May 07, 13 Jan 05, 16 [C23F, H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2015/0155,176 SIDEWALL HEIGHT NONUNIFORMITY REDUCTION FOR SIDEWALL IMAGE TRANSFER PROCESSES ABAN Dec 03, 13 Jun 04, 15 [H01L]
2015/0037,979 CONFORMAL SIDEWALL PASSIVATION ABAN Aug 02, 13 Feb 05, 15 [H01L]
2014/0332,037 Controls of Ambient Environment During Wafer Drying Using Proximity Head ABAN May 28, 14 Nov 13, 14 [H01L]
2014/0261,535 Standing Wave Generation in Holes to Enhance Cleaning in the Holes in Liquid Sonification Cleaning Systems ABAN Mar 13, 13 Sep 18, 14 [B08B]
2014/0263,179 TUNING SYSTEM AND METHOD FOR PLASMA-BASED SUBSTRATE PROCESSING SYSTEMS ABAN Mar 15, 13 Sep 18, 14 [H01J, H01P]
2014/0179,097 DEPOSITION APPARATUS AND METHOD ABAN Dec 21, 12 Jun 26, 14 [H01L]
2014/0127,911 PALLADIUM PLATED ALUMINUM COMPONENT OF A PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF ABAN Nov 07, 12 May 08, 14 [H01L, C25D]
2014/0113,453 TUNGSTEN CARBIDE COATED METAL COMPONENT OF A PLASMA REACTOR CHAMBER AND METHOD OF COATING ABAN Oct 24, 12 Apr 24, 14 [C23C, B32B, H01L]
2014/0083,463 SYSTEM AND METHOD FOR MONITORING WAFER STRESS ABAN Sep 21, 12 Mar 27, 14 [B08B]
2014/0076,713 Edge Ramping ABAN Oct 24, 12 Mar 20, 14 [H05H]
2014/0059,789 Apparatus for Cleaning a Semiconductor Substrate ABAN Oct 16, 13 Mar 06, 14 [H01L]
2014/0051,255 COPPER DISCOLORATION PREVENTION FOLLOWING BEVEL ETCH PROCESS ABAN Oct 28, 13 Feb 20, 14 [H01L]
2014/0041,581 Single Substrate Processing Head For Particle Removal Using Low Viscosity Fluid ABAN Oct 11, 13 Feb 13, 14 [H01L]
2014/0034,096 Acoustic Assisted Single Wafer Wet Clean For Semiconductor Wafer Process ABAN Oct 09, 13 Feb 06, 14 [H01L]
2013/0267,097 METHOD AND APPARATUS FOR FORMING FEATURES WITH PLASMA PRE-ETCH TREATMENT ON PHOTORESIST ABAN Apr 05, 12 Oct 10, 13 [C23F, H01L]
2013/0264,309 ACOUSTIC ENERGY UTILIZATION IN PLASMA PROCESSING ABAN Apr 05, 12 Oct 10, 13 [B44C, H05H]
2013/0240,484 ELECTROLESS COPPER ALLOY CAPPING ABAN Mar 19, 12 Sep 19, 13 [C23C, B05D]
2013/0203,259 PRESSURE CONTROL VALVE ASSEMBLY OF PLASMA PROCESSING CHAMBER AND RAPID ALTERNATING PROCESS ABAN Feb 07, 12 Aug 08, 13 [E21B, H01L]
2013/0171,820 METHODS FOR THREE-DIMENSIONAL INTEGRATED CIRCUIT THROUGH HOLE VIA GAPFILL AND OVERBURDEN REMOVAL ABAN Nov 30, 12 Jul 04, 13 [H01L]
2013/0074,769 APPARATUS FOR THE DEPOSITION OF A CONFORMAL FILM ON A SUBSTRATE AND METHODS THEREFOR ABAN Sep 28, 12 Mar 28, 13 [H01L]

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