LAM RESEARCH CORPORATION

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology MATTERS Rank in Class
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 996 40
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 415 3
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 251 2
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 215 23
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 206 3
 
 
H05H PLASMA TECHNIQUE 101 3
 
 
B44C PRODUCING DECORATIVE EFFECTS 71 5
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 69 348
 
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 55 100
 
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 48 43
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Top Patents (by citation)

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2016/0273,117 CHEMISTRY ADDITIVES AND PROCESS FOR COBALT FILM ELECTRODEPOSITION Mar 19, 15 Sep 22, 16 [C25D]
2016/0273,119 CONTROL OF ELECTROLYTE FLOW DYNAMICS FOR UNIFORM ELECTROPLATING Mar 19, 15 Sep 22, 16 [C25D]
2016/0273,124 CONTROL OF CURRENT DENSITY IN AN ELECTROPLATING APPARATUS Mar 20, 15 Sep 22, 16 [C25D]
2016/0276,148 ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL Mar 20, 15 Sep 22, 16 [C23C, H01J, H01L]
2016/0265,132 DYNAMIC MODULATION OF CROSS FLOW MANIFOLD DURING ELECTROPLATING May 20, 16 Sep 15, 16 [H01L, C25D]
2016/0268,141 TECHNIQUE TO DEPOSIT SIDEWALL PASSIVATION FOR HIGH ASPECT RATIO CYLINDER ETCH May 24, 16 Sep 15, 16 [C23C, H01J, H01L]
2016/0270,237 Copper Interconnect Device Including Surface Functionalized Graphene Capping Layer and Fabrication Method Thereof Mar 07, 16 Sep 15, 16 [H05K]
2016/0258,057 CLEAN RESISTANT WINDOWS FOR ULTRAVIOLET THERMAL PROCESSING Mar 06, 15 Sep 08, 16 [C23C, H01L]
2016/0258,078 PRETREATMENT OF NICKEL AND COBALT LINERS FOR ELECTRODEPOSITION OF COPPER INTO THROUGH SILICON VIAS Mar 04, 15 Sep 08, 16 [H01L, C25D]
2016/0259,872 SYSTEMS AND METHODS FOR TUNING AN IMPEDANCE MATCHING NETWORK IN A STEP-WISE FASHION Mar 04, 16 Sep 08, 16 [G06F]
2016/0260,584 IMPEDANCE MATCHING CIRCUIT FOR OPERATION WITH A KILOHERTZ RF GENERATOR AND A MEGAHERTZ RF GENERATOR TO CONTROL PLASMA PROCESSES Mar 02, 15 Sep 08, 16 [H03H, H01F, H01J]
2016/0260,603 METHOD AND APPARATUS TO MINIMIZE SEAM EFFECT DURING TEOS OXIDE FILM DEPOSITION Mar 06, 15 Sep 08, 16 [C23C, H01L]
2016/0252,892 SYSTEMS AND METHODS FOR SYNCHRONIZING EXECUTION OF RECIPE SETS May 06, 16 Sep 01, 16 [G05B]
2016/0254,125 METHOD FOR COATING SURFACES Feb 27, 15 Sep 01, 16 [C23C, H01J]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9,449,793 Systems, methods and apparatus for choked flow element extraction Aug 06, 10 Sep 20, 16 [H01J, H01L]
9,449,797 Component of a plasma processing apparatus having a protective in situ formed layer on a plasma exposed surface May 07, 13 Sep 20, 16 [C23F, C23C, H01J, H01L]
9,443,722 Cyclical, non-isobaric, pore sealing method to prevent precursor penetration into the substrate Mar 31, 15 Sep 13, 16 [H01L]
9,434,071 Wafer handling traction control system Sep 24, 15 Sep 06, 16 [G06F, H01L, B25J]
9,435,049 Alkaline pretreatment for electroplating Nov 20, 13 Sep 06, 16 [C23C, H01L, C25D]
9,435,692 Calculating power input to an array of thermal control elements to achieve a two-dimensional temperature output Feb 05, 14 Sep 06, 16 [G01J, G01K, H01L]
9,437,400 Insulated dielectric window assembly of an inductively coupled plasma processing apparatus May 02, 12 Sep 06, 16 [C23C, H01J, H01L]
9,428,833 Method and apparatus for backside deposition reduction by control of wafer support to achieve edge seal May 29, 15 Aug 30, 16 [C23C, H01L]
9,428,836 metal ions as reducing agents Apr 29, 14 Aug 30, 16 [C23C, H01L]
9,431,268 Isotropic atomic layer etch for silicon and germanium oxides Jan 05, 15 Aug 30, 16 [C23C, H01J, H01L]
9,431,269 Dual chamber plasma etcher with ion accelerator Aug 21, 15 Aug 30, 16 [C23F, H01J, H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0079,100 VACUUM CARRIER INTERFACE HAVING A SWITCHABLE REDUCED CAPACITY AIRLOCK CHAMBER ABAN Sep 17, 14 Mar 17, 16 [C23C, H01L, B25J]
2015/0376,792 ATMOSPHERIC PLASMA APPARATUS FOR SEMICONDUCTOR PROCESSING ABAN Jun 30, 14 Dec 31, 15 [C23C, H01L, C25D]
2015/0155,176 SIDEWALL HEIGHT NONUNIFORMITY REDUCTION FOR SIDEWALL IMAGE TRANSFER PROCESSES ABAN Dec 03, 13 Jun 04, 15 [H01L]
2015/0079,786 METHOD AND SOLUTION FOR CLEANING METAL RESIDUE ABAN Sep 17, 13 Mar 19, 15 [C09K, H01L]
2015/0040,947 Method and Systems for Cleaning A Substrate ABAN Aug 07, 13 Feb 12, 15 [H01L]
2015/0037,979 CONFORMAL SIDEWALL PASSIVATION ABAN Aug 02, 13 Feb 05, 15 [H01L]
2014/0332,037 Controls of Ambient Environment During Wafer Drying Using Proximity Head ABAN May 28, 14 Nov 13, 14 [H01L]
2014/0261,535 Standing Wave Generation in Holes to Enhance Cleaning in the Holes in Liquid Sonification Cleaning Systems ABAN Mar 13, 13 Sep 18, 14 [B08B]
2014/0263,179 TUNING SYSTEM AND METHOD FOR PLASMA-BASED SUBSTRATE PROCESSING SYSTEMS ABAN Mar 15, 13 Sep 18, 14 [H01J, H01P]
2014/0179,097 DEPOSITION APPARATUS AND METHOD ABAN Dec 21, 12 Jun 26, 14 [H01L]
2014/0170,780 Method of Low-K Dielectric Film Repair ABAN Feb 24, 14 Jun 19, 14 [H01L]
2014/0154,406 WET ACTIVATION OF RUTHENIUM CONTAINING LINER/BARRIER ABAN Nov 30, 12 Jun 05, 14 [H01L]
2014/0127,911 PALLADIUM PLATED ALUMINUM COMPONENT OF A PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF ABAN Nov 07, 12 May 08, 14 [H01L, C25D]
2014/0116,476 Systems for Surface Treatment of Semiconductor Substrates using Sequential Chemical Applications ABAN Dec 31, 13 May 01, 14 [H01L]
2014/0113,453 TUNGSTEN CARBIDE COATED METAL COMPONENT OF A PLASMA REACTOR CHAMBER AND METHOD OF COATING ABAN Oct 24, 12 Apr 24, 14 [C23C, B32B, H01L]
2014/0083,463 SYSTEM AND METHOD FOR MONITORING WAFER STRESS ABAN Sep 21, 12 Mar 27, 14 [B08B]
2014/0059,789 Apparatus for Cleaning a Semiconductor Substrate ABAN Oct 16, 13 Mar 06, 14 [H01L]
2014/0053,984 SYMMETRIC RETURN LINER FOR MODULATING AZIMUTHAL NON-UNIFORMITY IN A PLASMA PROCESSING SYSTEM ABAN Nov 29, 12 Feb 27, 14 [B05C, H05H]
2014/0051,255 COPPER DISCOLORATION PREVENTION FOLLOWING BEVEL ETCH PROCESS ABAN Oct 28, 13 Feb 20, 14 [H01L]
2014/0041,581 Single Substrate Processing Head For Particle Removal Using Low Viscosity Fluid ABAN Oct 11, 13 Feb 13, 14 [H01L]

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