LAM RESEARCH CORPORATION

Patent Owner

Follow Compare Add to Portfolio

Stats

Details

Patent Activity in the Last 10 Years

Technologies

Intl Class Technology MATTERS Rank in Class
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 1028 40
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 433 3
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 251 2
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 238 19
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 205 3
 
 
H05H PLASMA TECHNIQUE 102 3
 
 
B44C PRODUCING DECORATIVE EFFECTS 72 4
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 69 353
 
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 57 101
 
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 49 41
  • No Technologies to Display

Top Patents (by citation)

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2016/0375,515 USE OF ATOMIC LAYER DEPOSITION COATINGS TO PROTECT BRAZING LINE AGAINST CORROSION, EROSION, AND ARCING Jun 29, 15 Dec 29, 16 [C23C, B23K, H01J, B32B, C25D]
2016/0379,803 SELECTIVE REMOVAL OF BORON DOPED CARBON HARD MASK LAYERS Jun 09, 16 Dec 29, 16 [C23C, H01J, H01L]
2016/0379,806 USE OF PLASMA-RESISTANT ATOMIC LAYER DEPOSITION COATINGS TO EXTEND THE LIFETIME OF POLYMER COMPONENTS IN ETCH CHAMBERS Jun 25, 15 Dec 29, 16 [C23C, B32B, H01J, H02N, H01L]
2016/0379,824 LOW ROUGHNESS EUV LITHOGRAPHY Jun 22, 16 Dec 29, 16 [H01L]
2016/0379,826 CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TRANSISTORS Feb 28, 14 Dec 29, 16 [C23C, H01L]
2016/0370,788 FLEXIBLE TEMPERATURE COMPENSATION SYSTEMS AND METHODS FOR SUBSTRATE PROCESSING SYSTEMS Sep 23, 15 Dec 22, 16 [G05B]
2016/0370,795 SYSTEMS AND METHODS FOR CALIBRATING SCALAR FIELD CONTRIBUTION VALUES FOR A LIMITED NUMBER OF SENSORS INCLUDING A TEMPERATURE VALUE OF AN ELECTROSTATIC CHUCK AND ESTIMATING TEMPERATURE DISTRIBUTION PROFILES BASED ON CALIBRATED VALUES Sep 21, 15 Dec 22, 16 [G05B, G01K]
2016/0370,796 SYSTEM AND METHOD FOR DETERMINING FIELD NON-UNIFORMITIES OF A WAFER PROCESSING CHAMBER USING A WAFER PROCESSING PARAMETER Sep 21, 15 Dec 22, 16 [G05B]
2016/0372,352 AUTO-CORRECTION OF ELECTROSTATIC CHUCK TEMPERATURE NON-UNIFORMITY Sep 21, 15 Dec 22, 16 [G05B, H01L, G05D]
2016/0372,355 SYSTEM AND METHOD FOR REDUCING TEMPERATURE TRANSITION IN AN ELECTROSTATIC CHUCK Sep 21, 15 Dec 22, 16 [G01K, H01L]

View all publication…

  • No Publications to Display

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9,536,711 Method and apparatus for DC voltage control on RF-powered electrode Mar 13, 08 Jan 03, 17 [H01J]
9,536,748 Use of ion beam etching to generate gate-all-around structure Oct 21, 14 Jan 03, 17 [H01J, H01L]
9,536,749 Ion energy control by RF pulse shape Dec 15, 14 Jan 03, 17 [H01J, H01L]
9,536,764 End effector for wafer transfer system and method of transferring wafers Jan 27, 15 Jan 03, 17 [H01L, B25J]
9,530,620 Dual control modes Feb 19, 14 Dec 27, 16 [H01J]
9,530,656 Temperature control in RF chamber with heater and air amplifier Mar 27, 13 Dec 27, 16 [C23C, H01J, H01L]
9,530,658 Continuous plasma etch process Aug 12, 15 Dec 27, 16 [H01J, H01L]
9,530,679 Method and apparatus for chuck thermal calibration Apr 22, 13 Dec 27, 16 [H01L, G01N]
9,520,295 Metal doping of amorphous carbon and silicon films used as hardmasks in substrate processing systems Feb 03, 15 Dec 13, 16 [C23C, H01J, H01L]
9,514,954 Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films Jun 10, 14 Dec 06, 16 [H01L]

View all Patent…

  • No Patents to Display

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0079,100 VACUUM CARRIER INTERFACE HAVING A SWITCHABLE REDUCED CAPACITY AIRLOCK CHAMBER ABAN Sep 17, 14 Mar 17, 16 [C23C, H01L, B25J]
2015/0376,792 ATMOSPHERIC PLASMA APPARATUS FOR SEMICONDUCTOR PROCESSING ABAN Jun 30, 14 Dec 31, 15 [C23C, H01L, C25D]
2015/0299,882 NICKEL ELECTROPLATING SYSTEMS HAVING A GRAIN REFINER RELEASING DEVICE ABAN Apr 18, 14 Oct 22, 15 [H01L, C25D]
2015/0225,679 PROCESSES AND SOLUTIONS FOR SUBSTRATE CLEANING AND ELECTROLESS DEPOSITION ABAN Apr 17, 15 Aug 13, 15 [C23C, C11D, H01L]
2015/0155,176 SIDEWALL HEIGHT NONUNIFORMITY REDUCTION FOR SIDEWALL IMAGE TRANSFER PROCESSES ABAN Dec 03, 13 Jun 04, 15 [H01L]
2015/0136,171 LIQUID OR VAPOR INJECTION PLASMA ASHING SYSTEMS AND METHODS ABAN Nov 18, 13 May 21, 15 [H01J, H01L]
2015/0079,786 METHOD AND SOLUTION FOR CLEANING METAL RESIDUE ABAN Sep 17, 13 Mar 19, 15 [C09K, H01L]
2015/0040,941 Method and Apparatus for Cleaning A Semiconductor Substrate ABAN Aug 07, 13 Feb 12, 15 [H01L]
2015/0040,947 Method and Systems for Cleaning A Substrate ABAN Aug 07, 13 Feb 12, 15 [H01L]
2015/0037,979 CONFORMAL SIDEWALL PASSIVATION ABAN Aug 02, 13 Feb 05, 15 [H01L]
2014/0332,037 Controls of Ambient Environment During Wafer Drying Using Proximity Head ABAN May 28, 14 Nov 13, 14 [H01L]
2014/0261,535 Standing Wave Generation in Holes to Enhance Cleaning in the Holes in Liquid Sonification Cleaning Systems ABAN Mar 13, 13 Sep 18, 14 [B08B]
2014/0263,179 TUNING SYSTEM AND METHOD FOR PLASMA-BASED SUBSTRATE PROCESSING SYSTEMS ABAN Mar 15, 13 Sep 18, 14 [H01J, H01P]
2014/0202,503 METHOD AND SYSTEM FOR UNIFORMLY APPLYING A MULTI-PHASE CLEANING SOLUTION TO A SUBSTRATE ABAN Mar 25, 14 Jul 24, 14 [H01L]
2014/0179,097 DEPOSITION APPARATUS AND METHOD ABAN Dec 21, 12 Jun 26, 14 [H01L]
2014/0179,106 IN-SITU METAL RESIDUE CLEAN ABAN Dec 21, 12 Jun 26, 14 [H01L]
2014/0170,780 Method of Low-K Dielectric Film Repair ABAN Feb 24, 14 Jun 19, 14 [H01L]
2014/0158,167 METHOD AND APPARATUS FOR CLEANING A SUBSTRATE USING NON-NEWTONIAN FLUIDS ABAN Feb 11, 14 Jun 12, 14 [H01L]
2014/0154,406 WET ACTIVATION OF RUTHENIUM CONTAINING LINER/BARRIER ABAN Nov 30, 12 Jun 05, 14 [H01L]
2014/0127,911 PALLADIUM PLATED ALUMINUM COMPONENT OF A PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF ABAN Nov 07, 12 May 08, 14 [H01L, C25D]

View all Patent…

  • No Patents to Display

Top Inventors for This Owner

We are sorry but your current selection exceeds the maximum number of follows () for this membership level. Upgrade to our Level for up to follows!

Owner Follow
LAM RESEARCH CORPORATION
CANCEL
UPGRADE MEMBERSHIP CANCEL

We are sorry but your current selection exceeds the maximum number of comparisons () for this membership level. Upgrade to our Level for up to comparisons!

UPGRADE MEMBERSHIP CANCEL

We are sorry but your current selection exceeds the maximum number of portfolios () for this membership level. Upgrade to our Level for up to portfolios!

UPGRADE MEMBERSHIP CANCEL

We are sorry but your current selection exceeds the maximum number of patents allowed in portfolios () for this membership level. Upgrade to our Level for up to patents!

UPGRADE MEMBERSHIP CANCEL