LAM RESEARCH CORPORATION

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Intl Class Technology # of Patents/ App Rank in Class
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 755 48
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 280 3
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 264 2
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 208 3
 
 
H05H PLASMA TECHNIQUE 116 3
 
 
B44C PRODUCING DECORATIVE EFFECTS 75 3
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 67 316
 
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 52 45
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 50 72
 
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 46 37
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Top Patents (by citation)

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2014/0227,866 METHOD OF MAKING A GAS DISTRIBUTION MEMBER FOR A PLASMA PROCESSING CHAMBER Feb 13, 13 Aug 14, 14 [B05D, H01L]
2014/0217,590 THROUGH SILICON VIA METALLIZATION Feb 05, 13 Aug 07, 14 [H01L]
2014/0220,709 CONTROLLING CD AND CD UNIFORMITY WITH TRIM TIME AND TEMPERATURE ON A WAFER BY WAFER BASIS Feb 04, 13 Aug 07, 14 [H01L]
2014/0210,508 Determining A Malfunctioning Device in A Plasma System Feb 19, 14 Jul 31, 14 [G01R]
2014/0213,061 DUCTILE MODE DRILLING METHODS FOR BRITTLE COMPONENTS OF PLASMA PROCESSING APPARATUSES Jan 30, 13 Jul 31, 14 [B23B, B28D, H01L]
2014/0214,350 Using Modeling to Determine Wafer Bias Associated With A Plasma System Jan 31, 13 Jul 31, 14 [G01R]
2014/0214,351 Using Modeling to Determine Ion Energy Associated with A Plasma System Feb 19, 14 Jul 31, 14 [G01N]
2014/0214,395 Segmenting A Model Within A Plasma System Apr 04, 14 Jul 31, 14 [G06F]
2014/0202,503 METHOD AND SYSTEM FOR UNIFORMLY APPLYING A MULTI-PHASE CLEANING SOLUTION TO A SUBSTRATE Mar 25, 14 Jul 24, 14 [H01L]
2014/0197,731 Tuning A Parameter Associated With Plasma Impedance Jan 11, 13 Jul 17, 14 [H05H]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8,801,892 Uniform etch system Mar 25, 08 Aug 12, 14 [C23C, H01L]
8,802,571 Method of hard mask CD control by Ar sputtering Jul 28, 11 Aug 12, 14 [H01L]
8,794,267 Gas transport delay resolution for short etch recipes Dec 17, 08 Aug 05, 14 [F16K]
8,796,153 Clamped monolithic showerhead electrode Mar 11, 13 Aug 05, 14 [H01L]
8,797,705 Methods and arrangement for plasma dechuck optimization based on coupling of plasma signaling to substrate position and potential Sep 10, 09 Aug 05, 14 [H01T, H02H, H01L]
8,789,493 Sealed elastomer bonded Si electrodes and the like for reduced particle contamination in dielectric etch Feb 13, 06 Jul 29, 14 [C23F, C23C, H01L]
8,790,465 Post-deposition cleaning methods for substrates with cap layers Mar 22, 13 Jul 29, 14 [B08B, C23G]
8,791,392 Methods of fault detection for multiplexed heater array Oct 22, 10 Jul 29, 14 [H05B]
8,784,676 Waferless auto conditioning Feb 03, 12 Jul 22, 14 [H01L]
8,784,948 Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber Sep 22, 11 Jul 22, 14 [C23C, H01J, H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Filing Date Issue/Pub Date Intl Class
2012/0101,917 BUSINESS MOBILE COMMUNICATION SYSTEM Oct 03, 11 Apr 26, 12 [G06Q]
2012/0024,314 PLASMA MEDIATED ASHING PROCESSES Jul 27, 10 Feb 02, 12 [B08B]
2011/0306,203 INTERCONNECT STRUCTURE AND METHOD OF MANUFACTURING A DAMASCENE STRUCTURE Aug 25, 11 Dec 15, 11 [H01L]
2011/0271,905 Methods and System for Processing a Microelectronic Topography Jul 19, 11 Nov 10, 11 [B05C]
2011/0226,280 PLASMA MEDIATED ASHING PROCESSES May 27, 11 Sep 22, 11 [C23F, B08B]
2011/0136,346 Substantially Non-Oxidizing Plasma Treatment Devices and Processes Dec 04, 09 Jun 09, 11 [B08B, G03F, H01L]
2011/0060,442 METHODS AND ARRANGEMENT FOR DETECTING A WAFER-RELEASED EVENT WITHIN A PLASMA PROCESSING CHAMBER Sep 10, 09 Mar 10, 11 [G06F]
2011/0036,500 WIDE AREA RADIO FREQUENCY PLASMA APPARATUS FOR PROCESSING MULTIPLE SUBSTRATES Oct 22, 10 Feb 17, 11 [H01Q, H01L]
2011/0014,489 Method for Strengthening Adhesion Between Dielectric Layers Formed Adjacent to Metal Layers Sep 24, 10 Jan 20, 11 [B05C, B05D, B32B]
2010/0184,301 Methods for Preventing Precipitation of Etch Byproducts During an Etch Process and/or Subsequent Rinse Process Jan 20, 09 Jul 22, 10 [H01L]
2010/0130,017 FRONT END OF LINE PLASMA MEDIATED ASHING PROCESSES AND APPARATUS Nov 21, 08 May 27, 10 [H01L]
2010/0108,491 METHODS FOR REMOVING A METAL OXIDE FROM A SUBSTRATE Jan 07, 10 May 06, 10 [H05F]
2010/0062,164 Methods and Solutions for Preventing the Formation of Metal Particulate Defect Matter Upon a Substrate After a Plating Process Sep 08, 08 Mar 11, 10 [C09K, B05D, C25D]
2010/0015,731 Method of low-k dielectric film repair Feb 20, 07 Jan 21, 10 [C23C, H01L]
2009/0288,688 NON-CORROSIVE CHEMICAL RINSE SYSTEM Mar 11, 06 Nov 26, 09 [C09K, B08B]
2009/0291,562 HELIUM DESCUMMING May 20, 08 Nov 26, 09 [B08B, H01L]
2009/0277,871 PLASMA MEDIATED ASHING PROCESSES THAT INCLUDE FORMATION OF A PROTECTIVE LAYER BEFORE AND/OR DURING THE PLASMA MEDIATED ASHING PROCESS Mar 05, 09 Nov 12, 09 [C23F]
2009/0211,596 Method of post etch polymer residue removal Jul 11, 07 Aug 27, 09 [B08B]
2009/0170,334 Copper Discoloration Prevention Following Bevel Etch Process Dec 22, 08 Jul 02, 09 [H01L]
2009/0120,583 METHODS OF MAKING GAS DISTRIBUTION MEMBERS FOR PLASMA PROCESSING APPARATUSES Jan 07, 09 May 14, 09 [C23F, C23C]

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