LAM RESEARCH CORPORATION

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology MATTERS Rank in Class
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 823 45
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 296 3
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 257 2
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 212 3
 
 
H05H PLASMA TECHNIQUE 108 3
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 95 44
 
 
B44C PRODUCING DECORATIVE EFFECTS 74 3
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 66 327
 
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 48 32
 
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 47 97
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Top Patents (by citation)

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2015/0122,638 METHOD FOR UNIFORM FLOW BEHAVIOR IN AN ELECTROPLATING CELL Nov 06, 13 May 07, 15 [H01L, C25D]
2015/0122,658 MEMBRANE DESIGN FOR REDUCING DEFECTS IN ELECTROPLATING SYSTEMS Apr 18, 14 May 07, 15 [C25D]
2015/0118,012 WAFER ENTRY PORT WITH GAS CONCENTRATION ATTENUATORS Oct 31, 13 Apr 30, 15 [F27D, H01L, B25J]
2015/0118,394 GROUND STATE HYDROGEN RADICAL SOURCES FOR CHEMICAL VAPOR DEPOSITION OF SILICON-CARBON-CONTAINING FILMS Oct 24, 13 Apr 30, 15 [C23C]
2015/0118,862 TREATMENT FOR FLOWABLE DIELECTRIC DEPOSITION ON SUBSTRATE SURFACES Oct 21, 14 Apr 30, 15 [C23C, H01L]
2015/0118,863 METHODS AND APPARATUS FOR FORMING FLOWABLE DIELECTRIC FILMS HAVING LOW POROSITY Oct 21, 14 Apr 30, 15 [C23C, H01L]
2015/0110,968 TANDEM SOURCE ACTIVATION FOR CYCLICAL DEPOSITION OF FILMS Oct 22, 13 Apr 23, 15 [C23C]
2015/0099,365 TUNABLE UPPER PLASMA-EXCLUSION-ZONE RING FOR A BEVEL ETCHER Oct 04, 13 Apr 09, 15 [H01J, H01L]
2015/0091,440 Control of Impedance of RF Return Path Oct 01, 13 Apr 02, 15 [H01J]
2015/0091,441 Control of Impedance of RF Delivery Path Oct 01, 13 Apr 02, 15 [H01J]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9,028,646 Film adhesive for semiconductor vacuum processing apparatus Apr 24, 13 May 12, 15 [B32B, H01L]
9,028,765 Exhaust flow spreading baffle-riser to optimize remote plasma window clean Aug 23, 13 May 12, 15 [H01L, B01J]
9,029,258 Through silicon via metallization Feb 05, 13 May 12, 15 [H01L]
9,029,267 Controlling temperature of a faraday shield May 16, 13 May 12, 15 [H01L, G05D]
9,030,101 Frequency enhanced impedance dependent power control for multi-frequency RF pulsing Sep 17, 12 May 12, 15 [H01J]
9,023,177 Anchoring inserts, electrode assemblies, and plasma processing chambers Apr 10, 12 May 05, 15 [C23F, F16B, C23C, H01J, H01L]
9,017,513 Plasma monitoring probe assembly and processing chamber incorporating the same Nov 07, 12 Apr 28, 15 [H01J]
9,017,526 Ion beam etching system Jul 08, 13 Apr 28, 15 [H01J, H01L, B01J, C25D, C25C, C25B]
9,018,022 Showerhead electrode assembly in a capacitively coupled plasma processing apparatus Sep 24, 12 Apr 28, 15 [H01J, H01L]
9,018,098 Silicon etch with passivation using chemical vapor deposition Oct 23, 08 Apr 28, 15 [H01J, H01L]
9,018,103 High aspect ratio etch with combination mask Sep 26, 13 Apr 28, 15 [H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2014/0113,453 TUNGSTEN CARBIDE COATED METAL COMPONENT OF A PLASMA REACTOR CHAMBER AND METHOD OF COATING ABAN Oct 24, 12 Apr 24, 14 [C23C, B32B, H01L]
2014/0059,789 Apparatus for Cleaning a Semiconductor Substrate ABAN Oct 16, 13 Mar 06, 14 [H01L]
2013/0267,097 METHOD AND APPARATUS FOR FORMING FEATURES WITH PLASMA PRE-ETCH TREATMENT ON PHOTORESIST ABAN Apr 05, 12 Oct 10, 13 [C23F, H01L]
2013/0171,820 METHODS FOR THREE-DIMENSIONAL INTEGRATED CIRCUIT THROUGH HOLE VIA GAPFILL AND OVERBURDEN REMOVAL ABAN Nov 30, 12 Jul 04, 13 [H01L]
2013/0062,735 METHOD FOR FORMING STAIR-STEP STRUCTURES ABAN Nov 05, 12 Mar 14, 13 [H01L]
2012/0260,517 Apparatus and Method for Reducing Substrate Pattern Collapse During Drying Operations ABAN Apr 18, 11 Oct 18, 12 [F26B]
2012/0263,869 Methods for Forming a Barrier Layer with Periodic Concentrations of Elements and Structures Resulting Therefrom ABAN Jun 26, 12 Oct 18, 12 [B05D]
2012/0145,202 Cleaning Compound and Method and System for Using the Cleaning Compound ABAN Feb 14, 12 Jun 14, 12 [B08B]
2012/0118,320 Methods for Isolated Bevel Edge Clean ABAN Jan 24, 12 May 17, 12 [B08B]
2012/0115,332 Method of Post Etch Polymer Residue Removal ABAN Jan 19, 12 May 10, 12 [H01L]
2012/0101,917 BUSINESS MOBILE COMMUNICATION SYSTEM ABAN Oct 03, 11 Apr 26, 12 [G06Q]
2012/0088,370 Substrate Processing System with Multiple Processing Devices Deployed in Shared Ambient Environment and Associated Methods ABAN Oct 06, 10 Apr 12, 12 [C23C, H01L, B05B]
2012/0056,325 METHODS OF FABRICATING ELECTRONIC DEVICES USING DIRECT COPPER PLATING ABAN Nov 10, 11 Mar 08, 12 [H01L]
2012/0024,314 PLASMA MEDIATED ASHING PROCESSES ABAN Jul 27, 10 Feb 02, 12 [B08B]
2011/0306,203 INTERCONNECT STRUCTURE AND METHOD OF MANUFACTURING A DAMASCENE STRUCTURE ABAN Aug 25, 11 Dec 15, 11 [H01L]
2011/0271,905 Methods and System for Processing a Microelectronic Topography ABAN Jul 19, 11 Nov 10, 11 [B05C]
2011/0244,600 METHOD FOR TUNABLY REPAIRING LOW-K DIELECTRIC DAMAGE ABAN Jun 10, 11 Oct 06, 11 [H01L]
2011/0226,280 PLASMA MEDIATED ASHING PROCESSES ABAN May 27, 11 Sep 22, 11 [C23F, B08B]
2011/0223,770 NITRIDE PLASMA ETCH WITH HIGHLY TUNABLE SELECTIVITY TO OXIDE ABAN Mar 15, 10 Sep 15, 11 [C23F, H01L]
2011/0206,833 EXTENSION ELECTRODE OF PLASMA BEVEL ETCHING APPARATUS AND METHOD OF MANUFACTURE THEREOF ABAN Feb 11, 11 Aug 25, 11 [B08B, B05D, H01L]

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