LAM RESEARCH CORPORATION

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology MATTERS Rank in Class
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 1099 39
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 467 3
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 307 13
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 226 2
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 207 3
 
 
H05H PLASMA TECHNIQUE 101 3
 
 
B44C PRODUCING DECORATIVE EFFECTS 75 3
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 69 368
 
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 59 99
 
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 50 43
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Top Patents (by citation)

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0232,988 UNIVERSAL SERVICE CART FOR SEMICONDUCTOR SYSTEM MAINTENANCE Aug 11, 16 Aug 17, 17 [H01L, B62B]
2017/0236,688 CHAMBER MEMEBER OF A PLASMA SOURCE AND PEDESTAL WITH RADIALLY OUTWARD POSITIONED LIFT PINS FOR TRANSLATION OF A SUBSTRATE C-RING Feb 09, 17 Aug 17, 17 [H01J]
2017/0236,694 SYSTEM AND METHOD FOR INCREASING ELECTRON DENSITY LEVELS IN A PLASMA OF A SUBSTRATE PROCESSING SYSTEM Feb 08, 17 Aug 17, 17 [H01J, H01L]
2017/0236,731 SYSTEMS AND METHODS FOR SELECTIVELY ETCHING FILM Feb 07, 17 Aug 17, 17 [H01J, H01L]
2017/0236,733 Common Terminal Heater for Ceramic Pedestals Used in Semiconductor Fabrication Feb 17, 16 Aug 17, 17 [G05B, C23C, H01J, H01L]
2017/0236,735 Line Charge Volume With Integrated Pressure Measurement Feb 17, 16 Aug 17, 17 [C23C, H01L, G05D]
2017/0236,741 VARIABLE DEPTH EDGE RING FOR ETCH UNIFORMITY CONTROL Feb 02, 17 Aug 17, 17 [H01J, H01L]
2017/0236,743 WAFER LIFT RING SYSTEM FOR WAFER TRANSFER Feb 08, 17 Aug 17, 17 [H01L]
2017/0228,482 METHODS AND APPARATUSES FOR ETCH PROFILE OPTIMIZATION BY REFLECTANCE SPECTRA MATCHING AND SURFACE KINETIC MODEL OPTIMIZATION Feb 08, 16 Aug 10, 17 [G01B, G06F, G01N]
2017/0229,311 ATOMIC LAYER ETCHING IN CONTINUOUS PLASMA Jan 31, 17 Aug 10, 17 [C23C, H01J, H01L]
2017/0229,314 ATOMIC LAYER ETCHING 3D STRUCTURES: SI AND SIGE AND GE SMOOTHNESS ON HORIZONTAL AND VERTICAL SURFACES Feb 02, 17 Aug 10, 17 [C23C, H01J, H01L]
2017/0229,317 CHAMBER FOR PATTERNING NON-VOLATILE METALS Feb 05, 16 Aug 10, 17 [H01L]
2017/0229,337 SYSTEMS AND METHODS FOR CREATING AIRGAP SEALS USING ATOMIC LAYER DEPOSITION AND HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION Feb 02, 17 Aug 10, 17 [H01L]
2017/0211,922 VERIFYING END EFFECTOR FLATNESS USING ELECTRICAL CONTINUITY Mar 31, 16 Jul 27, 17 [G01R, G01B]
2017/0213,723 HYBRID STAIR-STEP ETCH Jan 27, 16 Jul 27, 17 [H01L]
2017/0213,734 MULTIFREQUENCY CAPACITIVELY COUPLED PLASMA ETCH CHAMBER Jul 31, 09 Jul 27, 17 [C23C, H01L]
2017/0213,747 ION TO NEUTRAL CONTROL FOR WAFER PROCESSING WITH DUAL PLASMA SOURCE REACTOR Sep 20, 13 Jul 27, 17 [H01L]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9732434 Methods and apparatuses for electroplating nickel using sulfur-free nickel anodes Apr 18, 14 Aug 15, 17 [C25D]
9735020 System, method and apparatus for plasma etch having independent control of ion generation and dissociation of process gas Oct 27, 15 Aug 15, 17 [H05H, H01J, H01L]
9735035 Methods and apparatuses for estimating on-wafer oxide layer reduction effectiveness via color sensing Jan 29, 16 Aug 15, 17 [H01L]
9735069 Method and apparatus for determining process rate Sep 23, 15 Aug 15, 17 [B44C, C23F, C03C, H01L]
9736135 Method, apparatus, and system for establishing a virtual tether between a mobile device and a semiconductor processing tool Oct 17, 14 Aug 15, 17 [H04L, H04W]
9728429 Parasitic plasma prevention in plasma processing chambers Jul 27, 10 Aug 08, 17 [C23F, C23C, H01J, H01L]
9720022 Systems and methods for providing characteristics of an impedance matching model for use with matching networks May 19, 15 Aug 01, 17 [G01R, H01J]
9721763 Systems and methods for providing gases to a process chamber Jun 29, 15 Aug 01, 17 [F16K, C23C, H01J, H01L, G05D]
9721782 Method and apparatus for shaping a gas profile near bevel edge Jun 09, 11 Aug 01, 17 [C23C, B05C, H01L]
9716022 Method of determining thermal stability of a substrate support assembly Dec 17, 13 Jul 25, 17 [G05B, H01L, G05D]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0329,206 METHODS OF MODULATING RESIDUAL STRESS IN THIN FILMS ABAN May 08, 15 Nov 10, 16 [H01L]
2016/0270,237 Copper Interconnect Device Including Surface Functionalized Graphene Capping Layer and Fabrication Method Thereof ABAN Mar 07, 16 Sep 15, 16 [H05K]
2016/0148,813 GAS INJECTION METHOD FOR UNIFORMLY PROCESSING A SEMICONDUCTOR SUBSTRATE IN A SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS ABAN Nov 25, 14 May 26, 16 [H01L]
2016/0138,160 REACTIVE ULTRAVIOLET THERMAL PROCESSING OF LOW DIELECTRIC CONSTANT MATERIALS ABAN Nov 18, 14 May 19, 16 [C23C]
2016/0079,100 VACUUM CARRIER INTERFACE HAVING A SWITCHABLE REDUCED CAPACITY AIRLOCK CHAMBER ABAN Sep 17, 14 Mar 17, 16 [C23C, H01L, B25J]
2016/0042,945 COVERAGE OF HIGH ASPECT RATIO FEATURES USING SPIN-ON DIELECTRIC THROUGH A WETTED SURFACE WITHOUT A PRIOR DRYING STEP ABAN Aug 11, 14 Feb 11, 16 [H01L]
2015/0376,792 ATMOSPHERIC PLASMA APPARATUS FOR SEMICONDUCTOR PROCESSING ABAN Jun 30, 14 Dec 31, 15 [C23C, H01L, C25D]
2015/0380,296 CLEANING OF CARBON-BASED CONTAMINANTS IN METAL INTERCONNECTS FOR INTERCONNECT CAPPING APPLICATIONS ABAN Jun 25, 14 Dec 31, 15 [C23C, H01L]
2015/0307,994 ELECTROLESS DEPOSITION OF CONTINUOUS NICKEL LAYER USING COMPLEXED Ti3+ METAL IONS AS REDUCING AGENTS ABAN Apr 29, 14 Oct 29, 15 [C23C]
2015/0299,882 NICKEL ELECTROPLATING SYSTEMS HAVING A GRAIN REFINER RELEASING DEVICE ABAN Apr 18, 14 Oct 22, 15 [H01L, C25D]
2015/0299,886 METHOD AND APPARATUS FOR PREPARING A SUBSTRATE WITH A SEMI-NOBLE METAL LAYER ABAN Apr 18, 14 Oct 22, 15 [H01L, C25D]
2015/0247,238 RF CYCLE PURGING TO REDUCE SURFACE ROUGHNESS IN METAL OXIDE AND METAL NITRIDE FILMS ABAN Mar 03, 14 Sep 03, 15 [C23C, H01L]
2015/0225,679 PROCESSES AND SOLUTIONS FOR SUBSTRATE CLEANING AND ELECTROLESS DEPOSITION ABAN Apr 17, 15 Aug 13, 15 [C23C, C11D, H01L]
2015/0155,176 SIDEWALL HEIGHT NONUNIFORMITY REDUCTION FOR SIDEWALL IMAGE TRANSFER PROCESSES ABAN Dec 03, 13 Jun 04, 15 [H01L]
2015/0136,171 LIQUID OR VAPOR INJECTION PLASMA ASHING SYSTEMS AND METHODS ABAN Nov 18, 13 May 21, 15 [H01J, H01L]
2015/0079,786 METHOD AND SOLUTION FOR CLEANING METAL RESIDUE ABAN Sep 17, 13 Mar 19, 15 [C09K, H01L]
2015/0040,941 Method and Apparatus for Cleaning A Semiconductor Substrate ABAN Aug 07, 13 Feb 12, 15 [H01L]
2015/0040,947 Method and Systems for Cleaning A Substrate ABAN Aug 07, 13 Feb 12, 15 [H01L]
2015/0037,979 CONFORMAL SIDEWALL PASSIVATION ABAN Aug 02, 13 Feb 05, 15 [H01L]
2015/0020,848 Systems and Methods for In-Situ Wafer Edge and Backside Plasma Cleaning ABAN Sep 19, 13 Jan 22, 15 [H01L]

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