Litel Instruments

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 1186
 
 
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS1089
 
 
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 4100
 
 
 
G01C MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY 3102
 
 
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 343
 
 
 
G06K RECOGNITION OF DATA; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS 3195
 
 
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 276
 
 
 
G01S RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES2107
 
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 2360
 
 
 
F41G WEAPON SIGHTS; AIMING 128

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9903719 System and method for advanced navigationSep 02, 14Feb 27, 18[G06T, G08G, G01C, G01S]
9483816 Method and system for high accuracy and reliability registration of multi modal imagerySep 02, 14Nov 01, 16[G06T, G06K]
9074848 Precision geographic location system and method utilizing an image productApr 10, 12Jul 07, 15[F41G, G01S, G01C]
8786827 Method and apparatus for measurement of exit pupil transmittanceFeb 09, 10Jul 22, 14[G03B]
7871002 Method and apparatus for self-referenced wafer stage positional error mappingApr 06, 06Jan 18, 11[G06K]
7871004 Method and apparatus for self-referenced wafer stage positional error mappingAug 15, 07Jan 18, 11[G06K]
7846624 Systems and methods for determination of focus and telecentricity, amelioration of metrology induced effects and application to determination of precision bossung curvesFeb 20, 07Dec 07, 10[G03C, G03F]
7697138 Method and apparatus for determination of source polarization matrixJan 19, 06Apr 13, 10[G01J]
7688426 Method and apparatus for measurement of exit pupil transmittanceApr 13, 05Mar 30, 10[G03B]
7295291 Apparatus and process for the determination of static lens field curvatureMay 12, 04Nov 13, 07[G01B]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
7671979 Apparatus and process for determination of dynamic lens field curvatureExpiredApr 28, 04Mar 02, 10[G01B]
7598006 Method and apparatus for embedded encoding of overlay data ordering in an in-situ interferometerExpiredDec 08, 05Oct 06, 09[G03F]
7544449 Method and apparatus for measurement of crossfield chromatic response of projection imaging systemsExpiredNov 14, 05Jun 09, 09[G03C, G03F]
7515250 In-situ interferometer arrangementExpiredSep 17, 07Apr 07, 09[G03B]
7442951 Reticle for use in rapid determination of average intrafield scanning distortion having transmissivity of a complementary alignment attribute being different than the transmissivity of at least one alignment attributeExpiredApr 04, 07Oct 28, 08[G01N]
7381503 Reference wafer calibration reticleExpiredApr 30, 07Jun 03, 08[G03F]
7337552 Method and apparatus for registration with integral alignment opticsExpiredAug 24, 04Mar 04, 08[G01D]
2006/0209,410 Method and apparatus for compensation or amelioration of lens field curvature and other imaging defects by utilizing a multi-wavelength setting illumination sourceAbandonedMar 17, 06Sep 21, 06[G02B]
2006/0190,915 Machine specific and machine group correction of masks based on machine subsystem performance parametersAbandonedJan 19, 06Aug 24, 06[G06F]
2006/0164,618 Method and apparatus for measurement of exit pupil telecentricity and source boresightingAbandonedJan 26, 06Jul 27, 06[G03B]
2005/0285,056 Process for manufacture of semiconductor chips utilizing a posteriori corrections to machine control system and settingsAbandonedJun 10, 05Dec 29, 05[G01N]
6975382 Method and apparatus for self-referenced dynamic step and scan intra-field lens distortionExpiredJun 15, 04Dec 13, 05[G03B]
6963390 In-situ interferometer arrangementExpiredJul 18, 03Nov 08, 05[G03B]
2005/0240,895 Method of emulation of lithographic projection toolsAbandonedApr 20, 05Oct 27, 05[G06F, G06G]
6906303 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortionExpiredSep 20, 02Jun 14, 05[H01L]
6906780 Method and apparatus for self-referenced dynamic step and scan intra-field lens distortionExpiredSep 20, 02Jun 14, 05[G03B]
6899982 Method and apparatus for proper ordering of registration dataExpiredMar 05, 04May 31, 05[G01B, G03F]
6833221 Method and apparatus for proper ordering of registration dataExpiredJan 04, 02Dec 21, 04[G03F]
6741338 In-situ source metrology instrument and method of useExpiredOct 09, 01May 25, 04[G01J]
6734971 Method and apparatus for self-referenced wafer stage positional error mappingExpiredJun 26, 01May 11, 04[G01B]

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