MEMC ELECTRONIC MATERIALS, INC.
Patent Owner
Stats
- 17 US PATENTS IN FORCE
- 0 US APPLICATIONS PENDING
- Feb 28, 2017 most recent publication
Details
- 17 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 2,803 Total Citation Count
- Jun 13, 1977 Earliest Filing
- 165 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
Matters
Rank in Class
Top Patents (by citation)
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Recent Publications
- No Recent Publications to Display
Recent Patents
Patent #
Title
Filing Date
Issue Date
Intl Class
9583363 Processes and apparatus for preparing heterostructures with reduced strain by radial distensionDec 27, 13Feb 28, 17[H01L, C30B]
9583364 Processes and apparatus for preparing heterostructures with reduced strain by radial compressionDec 27, 13Feb 28, 17[H01L, C30B]
7879198 Processes for the purification of trichlorosilane and silicon tetrachlorideNov 14, 05Feb 01, 11[C01B, B01D]
5418172 Method for detecting sources of contamination in silicon using a contamination monitor waferJun 29, 93May 23, 95[H01L]
Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
2012/0279,438 METHODS FOR PRODUCING SINGLE CRYSTAL SILICON INGOTS WITH REDUCED INCIDENCE OF DISLOCATIONSAbandonedApr 24, 12Nov 08, 12[C30B]
2012/0100,059 Production of Polycrystalline Silicon By The Thermal Decomposition of Trichlorosilane In A Fluidized Bed ReactorAbandonedOct 22, 10Apr 26, 12[C01B]
2012/0100,061 Production of Polycrystalline Silicon in Substantially Closed-loop ProcessesAbandonedOct 22, 10Apr 26, 12[C01B]
2011/0250,739 EPITAXIAL WAFER HAVING A HEAVILY DOPED SUBSTRATE AND PROCESS FOR THE PREPARATION THEREOFAbandonedJun 21, 11Oct 13, 11[H01L]
2011/0212,547 METHODS FOR MONITORING THE AMOUNT OF METAL CONTAMINATION IMPARTED INTO WAFERS DURING A SEMICONDUCTOR PROCESSAbandonedMay 11, 11Sep 01, 11[H01L]
2011/0212,550 METHODS FOR DETECTING METAL PRECIPITATES IN A SEMICONDUCTOR WAFERAbandonedMay 11, 11Sep 01, 11[H01L]
2011/0177,682 SUPPRESSION OF OXYGEN PRECIPITATION IN HEAVILY DOPED SINGLE CRYSTAL SILICON SUBSTRATESAbandonedFeb 04, 11Jul 21, 11[H01L, C30B]
2011/0158,888 METHODS FOR REDUCING THE DEPOSITION OF SILICON ON REACTOR WALLS USING PERIPHERAL SILICON TETRACHLORIDEAbandonedDec 23, 10Jun 30, 11[C01B]
2011/0146,717 Systems And Methods For Analysis of Water and Substrates Rinsed in WaterAbandonedDec 14, 10Jun 23, 11[B08B]
2010/0242,831 METHODS FOR WEIGHING A PULLED OBJECT HAVING A CHANGING WEIGHTAbandonedMar 18, 10Sep 30, 10[C30B]
2010/0178,225 METHOD FOR TREATMENT OF A GAS STREAM CONTAINING SILICON TETRAFLUORIDE AND HYDROGEN CHLORIDEAbandonedMar 25, 10Jul 15, 10[B01D]
2010/0150,789 SYSTEMS FOR PRODUCING SILICON TETRAFLUORIDE FROM FLUOROSILICATES IN A FLUIDIZED BED REACTORAbandonedDec 17, 09Jun 17, 10[B01J]
2010/0130,021 METHOD FOR PROCESSING A SILICON-ON-INSULATOR STRUCTUREAbandonedNov 23, 09May 27, 10[H01L]
2010/0098,519 SUPPORT FOR A SEMICONDUCTOR WAFER IN A HIGH TEMPERATURE ENVIRONMENTAbandonedOct 17, 08Apr 22, 10[H01L]
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