MICRON SEMICONDUCTOR, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 13349
 
  
 
G11C STATIC STORES 9142
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 3444
 
  
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 2157
 
  
 
H03K PULSE TECHNIQUE 2129
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 157
 
  
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 192
 
  
 
B23P OTHER WORKING OF METAL; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS 155
 
  
 
C03C CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS159
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1100

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
6560669 Double data rate synchronous memory with block-writeMay 18, 99May 06, 03[G06F]
6535413 Method of selectively forming local interconnects using design rulesAug 31, 00Mar 18, 03[H01L]
6312557 Method and apparatus for using photoemission to determine the endpoint of an etch processOct 05, 00Nov 06, 01[C23F]
6143667 Method and apparatus for using photoemission to determine the endpoint of an etch processJun 28, 99Nov 07, 00[H01L]
5896551 Initializing and reprogramming circuitry for state independent memory array burst operations controlApr 15, 94Apr 20, 99[G06F]
5514246 Plasma reactors and method of cleaning a plasma reactorJun 02, 94May 07, 96[H05H]
5506814 Video random access memory device and method implementing independent two WE nibble controlMay 28, 93Apr 09, 96[G11C]
5498570 Method of reducing overetch during the formation of a semiconductor deviceSep 15, 94Mar 12, 96[H01L]
5479694 Method for mounting integrated circuits onto printed circuit boards and testingApr 13, 93Jan 02, 96[B23P, B23K, G01R, H05K]
5478399 Unitary wafer plasma enhanced chemical vapor deposition holding deviceDec 03, 93Dec 26, 95[C23C]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
6244498 Ultrasonic vibration mode for wire bondingExpiredApr 16, 99Jun 12, 01[B23K]
6164993 Zero insertion force sockets using negative thermal expansion materialsExpiredFeb 12, 99Dec 26, 00[H01R]
5422447 Keyboard with full-travel, self-leveling keyswitches and return mechanism keyswitchExpiredApr 14, 94Jun 06, 95[B41J, H01H]
5201993 Anisotropic etch methodExpiredAug 27, 90Apr 13, 93[H01L]
5069747 Creation and removal of temporary silicon dioxide structures on an in-process integrated circuit with minimal effect on exposed, permanent silicon dioxide structuresExpiredDec 21, 90Dec 03, 91[C03C, B44C]
5066999 Resistor under wirebond padExpiredOct 23, 89Nov 19, 91[H01L]
5039877 Low current substrate bias generatorExpiredAug 30, 90Aug 13, 91[H03L, H03K]
5038325 High efficiency charge pump circuitExpiredMar 26, 90Aug 06, 91[G11C]
5032545 Process for preventing a native oxide from forming on the surface of a semiconductor material and integrated circuit capacitors produced therebyExpiredOct 30, 90Jul 16, 91[H01L]
5023465 High efficiency charge pump circuitExpiredMar 26, 90Jun 11, 91[G11C]
5013398 Anisotropic etch method for a sandwich structureExpiredMay 29, 90May 07, 91[H01L, C03C, C23F, B44C]
4992137 Dry etching method and method for prevention of low temperature post etch depositExpiredJul 18, 90Feb 12, 91[C03C, B44C]
4962326 Reduced latchup in precharging I/O lines to sense amp signal levelsExpiredJul 22, 88Oct 09, 90[H03K]
4859304 Temperature controlled anode for plasma dry etchers for etching semiconductorExpiredJul 18, 88Aug 22, 89[C23C, B01J]
4714837 High speed flip-flopExpiredJul 18, 86Dec 22, 87[H03K]
4666553 Method for planarizing multilayer semiconductor devicesExpiredAug 28, 85May 19, 87[B44C]
4660282 Method and apparatus for unloading electronic circuit packages from zero insertion force socketsExpiredDec 16, 85Apr 28, 87[B23P, H05K]
4389255 Method of forming buried collector for bipolar transistor in a semiconductor by selective implantation of poly-si followed by oxidation and etch-offExpiredNov 13, 80Jun 21, 83[H01L]
4233537 Multicusp plasma containment apparatusExpiredSep 18, 72Nov 11, 80[H01J]

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