Micronix Corporation

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
4723086 Coarse and fine motion positioning mechanismExpiredOct 07, 86Feb 02, 88[H01L]
4708919 Process for manufacturing a mask for use in X-ray photolithography using a monolithic support and resulting structureExpiredAug 02, 85Nov 24, 87[G21K, G03C, G03F]
4704033 Multiple wavelength linear zone plate alignment apparatus and methodExpiredMar 06, 86Nov 03, 87[G01B]
4698834 X-ray mask membrane deflection compensator and methodExpiredFeb 12, 86Oct 06, 87[G21K]
4696878 Additive process for manufacturing a mask for use in X-ray photolithography and the resulting maskExpiredAug 02, 85Sep 29, 87[G03F]
4680243 Method for producing a mask for use in X-ray photolithography and resulting structureExpiredAug 02, 85Jul 14, 87[G21K, G03F, C23F, B44C]
4671850 Mask using polyimide to support a patterned x-ray opaque layerExpiredAug 16, 85Jun 09, 87[C03C, H01L, C23F, B44C]
4668336 Process for making a mask used in x-ray photolithographyExpiredMay 23, 86May 26, 87[C03C, H01L, C23F, B44C]
4648106 Gas control for X-ray lithographic systemExpiredNov 21, 84Mar 03, 87[G21K]
4608268 Process for making a mask used in x-ray photolithographyExpiredJul 23, 85Aug 26, 86[B05B]

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