MITSUBISHI KASEI POLYTEC COMPANY

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
4983650 Fine polishing composition for wafersExpiredDec 29, 88Jan 08, 91[C08G, C08K]
4753842 Heat-shrinkable biaxially drawn polyamide film and process for preparation thereofExpiredApr 11, 86Jun 28, 88[B29D, B32B]
4378259 Method for producing mixed crystal wafer using special temperature control for preliminary gradient and constant layer deposition suitable for fabricating light-emitting diodeExpiredDec 24, 80Mar 29, 83[H01L]

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