Moore Epitaxial, Inc.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 398
 
  
 
F27D DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE 223
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 2360
 
  
 
B01J CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS 1108
 
  
 
F16K VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING172
 
  
 
F27B FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS123
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 177
 
  
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 1158
 
  
 
H02J CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY 1119

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
7794667 Gas ring and method of processing substratesOct 19, 05Sep 14, 10[H01L, B01J]
5801961 Power management system for a semiconductor processing facilityDec 03, 96Sep 01, 98[H02J, G01R]
5802099 Method for measuring substrate temperature in radiant heated reactorsAug 26, 96Sep 01, 98[G01J]
5710407 Rapid thermal processing apparatus for processing semiconductor wafersJun 07, 95Jan 20, 98[C23C]
5683518 Rapid thermal processing apparatus for processing semiconductor wafersJan 21, 94Nov 04, 97[C23C, F27D]
5601107 Automated process gas supply system for evacuating a process lineMay 18, 95Feb 11, 97[F16K]
5580388 Multi-layer susceptor for rapid thermal process reactorsMay 30, 95Dec 03, 96[C23C]
5444217 Rapid thermal processing apparatus for processing semiconductor wafersJan 21, 93Aug 22, 95[F27D]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
8610033 Rapid thermal process reactor utilizing a low profile domeExpiredMar 29, 07Dec 17, 13[H01L, F27B]
6799603 Gas flow controller systemExpiredSep 20, 99Oct 05, 04[C23C, F17D]
6773749 Method of controlling gas flow to a semiconductor processing reactorExpiredJan 18, 01Aug 10, 04[C23C]
6592675 Rotating susceptorExpiredAug 09, 01Jul 15, 03[C23C, H01L]
6491435 Linear robotExpiredJul 24, 00Dec 10, 02[F16C]
6475284 Gas dispersion headExpiredSep 20, 99Nov 05, 02[C23C]
6443618 Particulate free air bearing and sealExpiredJul 24, 00Sep 03, 02[F16C]
6428609 Exhaust particulate controller and methodExpiredSep 08, 00Aug 06, 02[F01N, B01D]
6347749 Semiconductor processing reactor controllable gas jet assemblyExpiredFeb 09, 00Feb 19, 02[B05B]
6328221 Method for controlling a gas injector in a semiconductor processing reactorExpiredFeb 09, 00Dec 11, 01[B05B]
6310327 Rapid thermal processing apparatus for processing semiconductor wafersExpiredAug 18, 00Oct 30, 01[F27D]
6213478 Holding mechanism for a susceptor in a substrate processing reactorExpiredMar 11, 99Apr 10, 01[C23C, B23B]
6169244 Thermocouple sheath coverExpiredMay 21, 99Jan 02, 01[H01L]
6163015 Substrate support elementExpiredJul 21, 99Dec 19, 00[A21B]
6110289 Rapid thermal processing barrel reactor for processing substratesExpiredFeb 25, 97Aug 29, 00[C23C, F27B]
5872632 Cluster tool layer thickness measurement apparatusExpiredFeb 02, 96Feb 16, 99[G01B]
5820686 Multi-layer susceptor for rapid thermal process reactorsExpiredFeb 02, 96Oct 13, 98[C23C]
5417236 Automated process gas supply system for evacuating a process lineExpiredAug 19, 93May 23, 95[F16K]
5240024 Automated process gas supply system for evacuating a process lineExpiredMar 31, 92Aug 31, 93[F16K]
5207835 High capacity epitaxial reactorExpiredFeb 09, 90May 04, 93[C23C]

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