NANOMETRICS INCORPORATED

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS5446
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 41165
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 2949
 
  
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 9150
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 9353
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 797
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 7440
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 5200
 
  
 
G06K RECOGNITION OF DATA; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS 4194
 
  
 
G01P MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT 354

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9903806 Focusing system with filter for open or closed loop controlDec 17, 13Feb 27, 18[G01J, G01N, G02B]
9846122 Optical metrology system for spectral imaging of a sampleJun 09, 16Dec 19, 17[G01J, H04N, G01N, G01B]
9824176 Optical critical dimension target designJul 24, 15Nov 21, 17[H01L, G01N, G06F, G03F]
9547244 Simultaneous measurement of multiple overlay errors using diffraction based overlayApr 13, 15Jan 17, 17[G01B, G03F]
9243999 Ellipsometer focusing systemOct 04, 13Jan 26, 16[G01J, G01N, G02B]
9239523 Diffraction based overlay linearity testingMar 22, 11Jan 19, 16[G03F]
9182351 Optical metrology system for spectral imaging of a sampleNov 26, 13Nov 10, 15[H04N, G01N, G01B]
9115987 Optical metrology with multiple angles of incidence and/or azimuth anglesDec 04, 13Aug 25, 15[G01J, G01N, G01B]
9110127 Apparatus and method for electrical characterization by selecting and adjusting the light for a target depth of a semiconductorJul 03, 12Aug 18, 15[G01R]
9007584 Simultaneous measurement of multiple overlay errors using diffraction based overlayDec 27, 10Apr 14, 15[H01L, G01B, G03F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2013/0257,270 PLASMA LAMP IGNITION SOURCEAbandonedMar 15, 13Oct 03, 13[H01J]
2013/0242,303 DUAL ANGLES OF INCIDENCE AND AZIMUTH ANGLES OPTICAL METROLOGYAbandonedMar 13, 12Sep 19, 13[G01J, G01N]
8339605 Multilayer alignment and overlay target and measurement methodExpiredNov 30, 10Dec 25, 12[H01L, G01B]
2012/0224,176 Parallel Acquisition Of Spectra For Diffraction Based OverlayAbandonedJun 13, 11Sep 06, 12[G01B]
8107079 Multi layer alignment and overlay target and measurement methodExpiredNov 09, 10Jan 31, 12[H01L, G03C, G01B, G03F]
2009/0296,075 Imaging Diffraction Based OverlayAbandonedMay 29, 08Dec 03, 09[G01N]
7556725 Sealing ring assembly and mounting methodExpiredJan 18, 05Jul 07, 09[F16L, G01N]
2009/0148,256 Support Pin with Dome Shaped Upper SurfaceAbandonedDec 10, 07Jun 11, 09[B65H]
2009/0040,614 Dispersive FilterAbandonedAug 07, 07Feb 12, 09[G02B]
2008/0228,415 Semiconductor testing instrument to determine safe operating areaAbandonedMar 08, 06Sep 18, 08[G01R]
2008/0075,229 Generation of Monochromatic and Collimated X-Ray BeamsAbandonedSep 27, 07Mar 27, 08[H01J]
2008/0018,897 Methods and apparatuses for assessing overlay error on workpiecesAbandonedJan 05, 07Jan 24, 08[G01B]
2007/0222,088 Overlay Metrology MarkAbandonedApr 08, 04Sep 27, 07[H01L]
2007/0176,119 Apparatuses and methods for analyzing semiconductor workpiecesAbandonedJan 30, 06Aug 02, 07[G01J]
2007/0069,398 Overlay metrology markAbandonedApr 08, 04Mar 29, 07[H01L]
2007/0008,526 Apparatus and method for non-contact assessment of a constituent in semiconductor workpiecesAbandonedJul 08, 05Jan 11, 07[G01J]
2007/0000,434 Apparatuses and methods for detecting defects in semiconductor workpiecesAbandonedJun 26, 06Jan 04, 07[C30B]
2006/0289,790 Apparatus and method for enhanced critical dimension scatterometryAbandonedFeb 24, 06Dec 28, 06[G01T]
2006/0285,110 Apparatus and method for enhanced critical dimension scatterometryAbandonedFeb 24, 06Dec 21, 06[G01J]
2006/0285,111 Apparatuses and methods for enhanced critical dimension scatterometryAbandonedJun 14, 06Dec 21, 06[G01J]

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