NIKON PRECISION INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 7440
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 493
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 4100
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS297
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 165
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 177
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 1205
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 1204
 
  
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 145
 
  
 
G06K RECOGNITION OF DATA; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS 1197

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9753363 Scanner based optical proximity correction system and method of useFeb 11, 16Sep 05, 17[G06F, G03F]
9529253 Predicting pattern critical dimensions in a lithographic exposure processAug 16, 13Dec 27, 16[G03F]
9286416 Scanner based optical proximity correction system and method of useDec 20, 12Mar 15, 16[G06F, G03F]
8572518 Predicting pattern critical dimensions in a lithographic exposure processDec 07, 11Oct 29, 13[G06F]
8438507 Systems and methods for adjusting a lithographic scannerSep 30, 09May 07, 13[G06F]
8365107 Scanner based optical proximity correction system and method of useJan 16, 08Jan 29, 13[G06F]
8322616 Automated signature detection system and method of useFeb 26, 07Dec 04, 12[G06K]
8300214 System and method for an adjusting optical proximity effect for an exposure apparatusDec 23, 08Oct 30, 12[G03B]
8149498 Package structure of a flexible display deviceAug 29, 10Apr 03, 12[H01L, G02B]
8027813 Method and system for reconstructing aberrated image profiles through simulationFeb 20, 04Sep 27, 11[G06F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2013/0044,308 SYSTEM AND METHOD FOR AN ADJUSTING OPTICAL PROXIMITY EFFECT FOR AN EXPOSURE APPARATUSAbandonedOct 22, 12Feb 21, 13[G03B]
2007/0270,080 NON-CONTACT CHEMICAL MECHANICAL POLISHING WAFER EDGE CONTROL APPARATUS AND METHODAbandonedMay 18, 06Nov 22, 07[B24B]
2007/0139,630 Changeable Slit to Control Uniformity of IlluminationAbandonedSep 15, 06Jun 21, 07[G03B]
2006/0087,634 Dynamic illumination uniformity and shape control for lithographyAbandonedOct 25, 04Apr 27, 06[G03B]
6974653 Methods for critical dimension and focus mapping using critical dimension test marksExpiredDec 04, 02Dec 13, 05[G03F]
6956659 Measurement of critical dimensions of etched featuresExpiredJun 07, 02Oct 18, 05[G01B]
6943882 Method to diagnose imperfections in illuminator of a lithographic toolExpiredDec 19, 02Sep 13, 05[G01B]
6750952 Apparatus for preforming measurement of a dimension of a test mark for semiconductor processingExpiredJul 17, 02Jun 15, 04[G03B]
6664121 Method and apparatus for position measurement of a pattern formed by a lithographic exposure toolExpiredMay 20, 02Dec 16, 03[H01L, G01B]
6538753 Method and apparatus for dimension measurement of a pattern formed by lithographic exposure toolsExpiredMay 22, 01Mar 25, 03[G01B]
6490105 Stage mirror retention systemExpiredMar 27, 01Dec 03, 02[G02B]
6436589 Reticle having an interleave kerfExpiredDec 08, 00Aug 20, 02[G03F]
6323938 Method of characterizing photolithographic tool performance and photolithographic tool thereofExpiredApr 27, 98Nov 27, 01[G03B]
5838450 Direct reticle to wafer alignment using fluorescence for integrated circuit lithographyExpiredJun 02, 95Nov 17, 98[G01B]
5825043 Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatusExpiredOct 07, 96Oct 20, 98[G01J, G01N]
5648848 Beam delivery apparatus and method for interferometry using rotatable polarization chucksExpiredFeb 01, 95Jul 15, 97[B01B]
5631731 Method and apparatus for aerial image analyzerExpiredMar 09, 94May 20, 97[G01J, G03B]
5623853 Precision motion stage with single guide beam and follower stageExpiredOct 19, 94Apr 29, 97[G05G]

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