NIKON RESEARCH CORPORATION OF AMERICA

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 3101
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 264
 
  
 
H03F AMPLIFIERS 281
 
  
 
C12M APPARATUS FOR ENZYMOLOGY OR MICROBIOLOGY 148
 
  
 
C12Q MEASURING OR TESTING PROCESSES INVOLVING ENZYMES OR MICRO-ORGANISMS 1124
 
  
 
G01D MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED BY A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR 159
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 1205
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 1204
 
  
 
G02F DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS 1132
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 196

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9690198 Increasing and controlling sensitivity of non-linear metallic thin-film resistsMar 09, 15Jun 27, 17[G03F]
9341942 Vacuum chamber assembly for supporting a workpieceAug 23, 11May 17, 16[H01L, G03B, G03F]
8852858 Methods and devices for hybridization and binding assays using thermophoresisJun 07, 07Oct 07, 14[C12Q, G01N, B01L]
8441615 System for isolating an exposure apparatusAug 27, 09May 14, 13[F16M, G03B]
7830046 Damper for a stage assemblyMar 16, 07Nov 09, 10[H02K]
7244611 Methods and devices for hybridization and binding assays using thermophoresisOct 23, 01Jul 17, 07[C12M]
6733370 In-situ pad conditioning apparatus for CMP polisherJun 27, 01May 11, 04[B24B]
6261152 Heterdoyne Thickness Monitoring SystemJul 16, 98Jul 17, 01[B24B]
6204729 H-bridge power amplifier for a motorDec 19, 97Mar 20, 01[H03F]
6175272 Pulse--width modulation systemDec 19, 97Jan 16, 01[H03F]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0025,480 INTERFEROMETRIC LEVEL SENSORAbandonedJul 24, 15Jan 28, 16[G01B]
2006/0134,683 Methods and devices for hybridization and binding assays using thermophoresisAbandonedJan 25, 06Jun 22, 06[C12Q, C12M]
2005/0162,802 Offset gap control for electromagnetic devicesAbandonedJan 22, 04Jul 28, 05[H01H]
6302770 In-situ pad conditioning for CMP polisherExpiredJul 28, 98Oct 16, 01[B24B]
6248000 Polishing pad thinning to optically access a semiconductor wafer surfaceExpiredMar 24, 98Jun 19, 01[B24B]
5936254 Thin film detection method and apparatusExpiredMar 11, 97Aug 10, 99[G01B]
5859698 Method and apparatus for macro defect detection using scattered lightExpiredMay 07, 97Jan 12, 99[G01N, C06K]

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