NITTA HAAS INCORPORATED

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C09G POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES109
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 9353
 
  
 
C09K MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR788
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 363
 
  
 
B24D TOOLS FOR GRINDING, BUFFING, OR SHARPENING 228
 
  
 
C08G MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS 1119
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 135

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0361,421 HIGH REMOVAL RATE CHEMICAL MECHANICAL POLISHING PADS AND METHODS OF MAKINGJun 17, 16Dec 21, 17[B24B, C08G, C09G]
2014/0030,897 POLISHING COMPOSITION AND POLISHING METHOD USING THE SAMEFeb 02, 12Jan 30, 14[H01L, C09G]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9633831 Chemical mechanical polishing composition for polishing a sapphire surface and methods of using sameAug 26, 13Apr 25, 17[C09K, H01L, C09G]
9593259 Polishing compositionNov 19, 13Mar 14, 17[C09K, H01L, C09G, C23F]
9303191 Polishing compositionMar 28, 13Apr 05, 16[C09K, H01L, C09G]
9254545 Polishing apparatus, polishing pad, and polishing information management systemMar 09, 11Feb 09, 16[B24B]
9150759 Chemical mechanical polishing composition for polishing silicon wafers and related methodsSep 27, 13Oct 06, 15[H01L, C09G]
8980749 Method for chemical mechanical polishing silicon wafersOct 24, 13Mar 17, 15[B24B, H01L]
8709278 Polishing compositionJul 13, 09Apr 29, 14[C09K]
8557005 Polyurethane foam and polishing padApr 21, 09Oct 15, 13[B24B, C08G, B24D]
8540894 Polishing compositionSep 29, 08Sep 24, 13[C09K]
8420539 Additive for polishing compositionApr 09, 12Apr 16, 13[C09K]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2015/0259,575 POLISHING COMPOSITIONAbandonedJun 01, 15Sep 17, 15[C09G, C23F]
2011/0198,531 COMPOSITION FOR POLISHING SILICON NITRIDE AND METHOD OF CONTROLLING SELECTIVITY USING SAMEAbandonedOct 19, 09Aug 18, 11[C09K]
2010/0207,057 POLISHING COMPOSITIONAbandonedAug 25, 08Aug 19, 10[C09K]
2010/0207,058 POLISHING COMPOSITIONAbandonedAug 25, 08Aug 19, 10[C09K]
2010/0163,787 POLISHING COMPOSITIONAbandonedJun 09, 08Jul 01, 10[C09K]
2010/0155,655 POLISHING COMPOSITIONAbandonedJul 24, 08Jun 24, 10[C09K]
2010/0090,159 Semiconductor polishing compositionAbandonedDec 08, 09Apr 15, 10[C09K]
7611552 Semiconductor polishing compositionExpiredMar 28, 05Nov 03, 09[C09K, C09G]
2008/0263,965 Semiconductor Polishing CompositionAbandonedMar 28, 05Oct 30, 08[C09K]
2007/0224,101 Semiconductor Polishing CompositionAbandonedMar 28, 05Sep 27, 07[C01B, H01L]
2007/0209,288 Semiconductor Polishing CompositionAbandonedMar 28, 05Sep 13, 07[C01B, B24D]
2006/0240,748 Method of manufacturing abrasive compositionAbandonedFeb 10, 04Oct 26, 06[B24B]

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