NOVA MEASURING INSTRUMENTS LTD.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS7632
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 45161
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 17345
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 1662
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 1551
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 1186
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 1193
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 5200
 
  
 
G06T IMAGE DATA PROCESSING OR GENERATION, IN GENERAL 4131
 
  
 
B65G TRANSPORT OR STORAGE DEVICES, e.g. CONVEYERS FOR LOADING OR TIPPING; SHOP CONVEYER SYSTEMS; PNEUMATIC TUBE CONVEYERS 364

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0031,983 LATERAL SHIFT MEASUREMENT USING AN OPTICAL TECHNIQUEOct 10, 17Feb 01, 18[H01L, G01N, G01B, G03F]
2017/0146,465 TEST STRUCTURE DESIGN FOR METROLOGY MEASUREMENTS IN PATTERNED SAMPLESJun 18, 15May 25, 17[H01L, G01N]
2015/0316,468 METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLESApr 30, 14Nov 05, 15[G01N]
2013/0282,343 METHOD AND SYSTEM FOR USE IN MEASURING IN COMPLEX PATTERNED STRUCTURESJan 03, 12Oct 24, 13[G06F]
2013/0124,141 METHOD AND SYSTEM FOR MEASURING IN PATTERNED STRUCTURESFeb 24, 11May 16, 13[G06F]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9915624 Optical metrology for in-situ measurementsDec 20, 16Mar 13, 18[G01N, G01B]
9904993 Method and system for optimizing optical inspection of patterned structuresFeb 23, 16Feb 27, 18[G06T, G01B, G03F, G06K]
9897553 Optical phase measurement method and systemFeb 20, 14Feb 20, 18[G01N, G01B, G03F]
9785059 Lateral shift measurement using an optical techniqueApr 07, 16Oct 10, 17[H01L, G01N, G01B, G03F]
9651498 Optical method and system for detecting defects in three-dimensional structuresJul 02, 13May 16, 17[H01L, G01N]
9568872 Process control using non-zero order diffractionJan 12, 12Feb 14, 17[H01L, G01N, G03B, G01B, G03G, G03F]
9528946 Optical metrology for in-situ measurementsAug 15, 13Dec 27, 16[G01N, G01B]
9476837 Method and system for improving optical measurements on small targetsApr 22, 14Oct 25, 16[G01N]
9310192 Lateral shift measurement using an optical techniqueJan 12, 15Apr 12, 16[H01L, G01N, G01B, G03F]
9291911 Monitoring apparatus and method particularly useful in photolithographically processing substratesJul 10, 14Mar 22, 16[H01L, G01N, G03B, G01B, G03F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2015/0168,132 METHOD AND SYSTEM FOR USE IN OPTICAL MEASUREMENTS IN DEEP THREE-DIMENSIONAL STRUCTURESAbandonedFeb 12, 13Jun 18, 15[G01N, G01B]
2014/0079,312 METHOD AND SYSTEM FOR OPTIMIZING OPTICAL INSPECTION OF PATTERNED STRUCTURESAbandonedJun 16, 11Mar 20, 14[G06T]
2014/0009,760 METHOD AND SYSTEM FOR MEASURING PATTERNED STRUCTURESAbandonedSep 09, 13Jan 09, 14[G01N]
2010/0321,679 MEASUREMENT SYSTEM AND METHODAbandonedDec 16, 08Dec 23, 10[G01N]
2010/0280,807 METHOD AND SYSTEM FOR MEASURING PATTERNED STRUCTURESAbandonedJul 19, 10Nov 04, 10[G06F]
2010/0204,820 APPARATUS AND METHOD FOR SUBSTRATE HANDLINGAbandonedJun 05, 08Aug 12, 10[H01L]
2009/0213,377 REFLECTIVE OPTICAL SYSTEMAbandonedMay 11, 09Aug 27, 09[G01J]
2008/0297,794 APPARATUS FOR OPTICAL INSPECTION OF WAFERS DURING POLISHINGAbandonedAug 08, 08Dec 04, 08[G01J, G01N]
2008/0158,553 OPTICAL MEASUREMENTS OF PATTERNED ARTICLESAbandonedFeb 07, 08Jul 03, 08[G01N]
2008/0062,406 METHOD AND SYSTEM FOR MEASURING PATTERNED STRUCTURESAbandonedOct 31, 07Mar 13, 08[G01J, G01N]
2008/0018,991 Glan-Thompson Type Broadband Polarizer Device for Use in the Deep Ultraviolet Spectral Range and Method of Its ManufactureAbandonedAug 02, 04Jan 24, 08[G02B]
2007/0258,092 OPTICAL MEASUREMENT DEVICE AND METHODAbandonedJul 16, 07Nov 08, 07[G01J]
2007/0123,151 Apparatus for optical inspection of wafers during polishingAbandonedJan 29, 07May 31, 07[B24B]
2006/0232,777 Method and system for automatic target findingAbandonedJun 17, 04Oct 19, 06[G01B]
2005/0229,725 Buffer system for a wafer handling systemAbandonedFeb 28, 05Oct 20, 05[B65G]
6940609 Method and system for measuring the topography of a sampleExpiredAug 08, 02Sep 06, 05[0000]
6426502 Apparatus for integrated monitoring of wafers and for process control in the semiconductor manufacturing and a method for use thereofExpiredMay 22, 00Jul 30, 02[G01J]
2001/0015,811 Test structure for metal CMP process controlAbandonedFeb 20, 01Aug 23, 01[G01B]
5848122 Apparatus for rapid in-situ X-ray stress measurement during thermal cycling of semiconductor wafersExpiredMar 25, 97Dec 08, 98[G01N]
5828724 Photo-sensor fiber-optic stress analysis systemExpiredMar 25, 97Oct 27, 98[G01N]

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