OHMI, TADAHIRO

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Technologies

Intl Class Technology # of Patents Rank
 
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 35222
 
 
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 2043
 
 
 
G05D SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES 1429
 
 
 
F16K VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING1338
 
 
 
H05H PLASMA TECHNIQUE 1213
 
 
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 821
 
 
 
H01S DEVICES USING STIMULATED EMISSION878
 
 
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 742
 
 
 
B23K SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM 763
 
 
 
B01J CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS 666

Top Patents (by citation)

Patent # Title Filing Date Issue Date Intl Class Cited #
6,230,722 Liquid feed nozzle, wet treatment, apparatus and wet treatment methodMay 22, 98May 15, 01[B08B]55
6,051,851 Semiconductor devices utilizing silicide reactionAug 26, 97Apr 18, 00[H01L]50
6,255,731 SOI bonding structureJul 28, 98Jul 03, 01[H01L]48
5,816,285 Pressure type flow rate control apparatusAug 11, 97Oct 06, 98[F16K]38
5,923,693 Discharge electrode, shape-restoration thereof, excimer laser oscillator, and stepperFeb 28, 97Jul 13, 99[H01S]32
5,983,933 Shutoff-opening deviceNov 19, 97Nov 16, 99[F16K]30
6,830,652 Microwave plasma processing apparatusOct 04, 00Dec 14, 04[H01L]26
7,012,311 Semiconductor device formed on (111) surface of a Si crystal and fabrication process thereofMay 29, 01Mar 14, 06[H01L]25
6,629,540 Wet treatment apparatusAug 30, 01Oct 07, 03[B08B]24
6,152,168 Pressure-type flow rate control apparatusMay 24, 99Nov 28, 00[G05D]23

Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2013/0017,686 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHODSep 14, 12Jan 17, 13[C23C, H01L]
2013/0000,737 METHOD FOR WATER HAMMERLESS OPENING OF FLUID PASSAGE, AND METHOD FOR SUPPLYING CHEMICAL SOLUTIONS AND DEVICE FOR WATER HAMMERLESS OPENING FOR WHICH THE METHOD IS USEDSep 22, 11Jan 03, 13[F16K]
2012/0234,491 PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUSMay 11, 12Sep 20, 12[C23C, B05B]
2012/0237,684 METHOD OF MANUFACTURING A TRANSPARENT MEMBER AND PLASTIC MEMBERMay 07, 12Sep 20, 12[B05D]
2011/0139,334 BONDING METHOD AND RESIN MEMBER BONDED THEREBYFeb 24, 11Jun 16, 11[B32B]
2010/0247,395 Gas purifying process and deviceMay 19, 10Sep 30, 10[B01D]
2010/0221,495 Method of Manufacturing a Transparent Member and Plastic MemberSep 12, 05Sep 02, 10[C23C, B32B]
2010/0173,477 Method of Manufacturing Semiconductor Device and Semiconductor Manufacturing ApparatusSep 13, 05Jul 08, 10[B08B, B05C, H01L]
2010/0166,956 VAPOR DEPOSITION APPARATUSMar 01, 10Jul 01, 10[C23C]
2010/0072,519 P-CHANNEL POWER MIS FIELD EFFECT TRANSISTOR AND SWITCHING CIRCUITSep 28, 09Mar 25, 10[H01L]

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
8,420,974 Long life welding electrode and its fixing structure, welding head, and welding methodOct 08, 02Apr 16, 13[B23K]
8,308,897 Plasma processing apparatus and plasma processing methodMay 25, 01Nov 13, 12[B44C, C23F, C23C, H05H, C03C, H01L]
8,198,195 Plasma processing method and plasma processing apparatusSep 26, 05Jun 12, 12[H01L]
8,137,787 Metal material having formed thereon chromium oxide passive film and method for producing the same, and parts contacting with fluid and system for supplying fluid and exhausting gasJan 13, 00Mar 20, 12[B32B]
8,114,245 Plasma etching deviceNov 26, 02Feb 14, 12[C23F, C23C, H01L]
8,047,225 Method for water hammerless opening of fluid passage, and method for supplying chemical solutions and device for water hammerless opening for which the method is usedApr 10, 09Nov 01, 11[F16K]
8,030,182 Semiconductor device manufacturing method and semiconductor manufacturing apparatusSep 20, 05Oct 04, 11[B08B, H01L]
8,020,574 Method for closing fluid passage, and water hammerless valve device and water hammerless closing device used in the methodJun 14, 07Sep 20, 11[F17D]
7,995,001 Antenna for portable terminal and portable terminal using sameFeb 17, 04Aug 09, 11[H01Q]
7,988,130 Valve for vacuum exhaustion systemSep 11, 08Aug 02, 11[F16K]

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Top Inventors for This Owner

Inventor Name Address # of Patent/Pub
OHMI TADAHIRO
SENDAI-SHI, JP
300
IKEDA NOBUKAZU
OSAKA-SHI, JP
74
Ohmi Tadahiro
Not Provided
62
Hirayama Masaki
Sendai-Shi, JP
55
Morimoto Akihiro
Osaka-shi, JP
44
YAMAJI MICHIO
OSAKA-SHI, JP
38
Sugawa Shigetoshi
Sendai-shi, JP
35
Nishino Kouji
Osaka, JP
32
Dohi Ryousuke
Osaka, JP
26
Minami Yukio
Osaka-shi, JP
25