PHOTRONICS, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 2876
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 12435
 
  
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 1135
 
  
 
G01F MEASURING VOLUME, VOLUME FLOW, MASS FLOW, OR LIQUID LEVEL; METERING BY VOLUME 356
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 3202
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 3359
 
  
 
G02F DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS 2131
 
  
 
E06B FIXED OR MOVABLE CLOSURES FOR OPENINGS IN BUILDINGS, VEHICLES, FENCES, OR LIKE ENCLOSURES, IN GENERAL, e.g. DOORS, WINDOWS, BLINDS, GATES 144
 
  
 
F24J PRODUCTION OR USE OF HEAT NOT OTHERWISE PROVIDED FOR 123
 
  
 
F28D HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT 144

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9304334 Microfluidic thermoptic energy processorJan 21, 14Apr 05, 16[H01L, F24J, G01N, E06B, F28D, G06F, G02F]
9005848 Photomask having a reduced field size and method of using the sameJun 17, 09Apr 14, 15[G03F]
9005849 Photomask having a reduced field size and method of using the sameJun 22, 10Apr 14, 15[G03F]
8102031 Security element for an integrated circuit, integrated circuit including the same, and method for securing an integrated circuitApr 18, 08Jan 24, 12[H01L]
7943273 Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the sameApr 18, 08May 17, 11[G03C, G03F]
7910269 Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the sameMar 19, 10Mar 22, 11[G06F, G03F]
7851110 Secure photomask with blocking apertureApr 18, 08Dec 14, 10[G03F]
7790340 Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the sameApr 20, 07Sep 07, 10[G03F]
7669167 Rule based system and method for automatically generating photomask orders by conditioning information from a customer's computer systemJun 25, 04Feb 23, 10[G06F]
7640529 User-friendly rule-based system and method for automatically generating photomask ordersNov 03, 04Dec 29, 09[G06F]

View all patents..

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2014/0272,688 GRAYSCALE LITHOGRAPHY OF PHOTO DEFINABLE GLASSAbandonedMar 15, 13Sep 18, 14[G03F]
2014/0146,636 MIXER CHIPAbandonedMar 14, 13May 29, 14[C03C, B01F]
2006/0271,443 System and method for automatically generating and/or processing a photomask order using a script profilerAbandonedMay 27, 05Nov 30, 06[G06Q]
7067220 Pattern compensation techniques for charged particle lithographic masksExpiredDec 04, 02Jun 27, 06[G03F]
2006/0122,724 System and method for automatically generating a tooling specification using a logical operations utility that can be used to generate a photomask orderAbandonedDec 07, 04Jun 08, 06[G06F]
2006/0051,681 Method of repairing a photomask having an internal etch stop layerAbandonedSep 08, 04Mar 09, 06[G03C, G03F]
2005/0060,680 Rule based system and method for automatically generating photomask orders in a specified order formatAbandonedOct 27, 04Mar 17, 05[G03C, G06F, G03F]
2005/0042,523 Endpoint detection of plasma-assisted etch processAbandonedAug 20, 03Feb 24, 05[C03C, G01L, G03C, G01R, G03F, C23F, B44C]
2005/0026,053 Photomask having an internal substantially transparent etch stop layerAbandonedSep 08, 04Feb 03, 05[G03F, B32B]
6806006 Integrated cooling substrate for extreme ultraviolet reticleExpiredJul 15, 02Oct 19, 04[G21K, G03F]
2004/0086,787 Alternating aperture phase shift photomask having plasma etched isotropic quartz featuresAbandonedNov 05, 02May 06, 04[G03F]
6528215 Substrate for diamond stencil mask and method for formingExpiredNov 07, 00Mar 04, 03[G03F, B32B]
6408798 Tangle resistance pet tie deviceExpiredFeb 02, 01Jun 25, 02[A01K]

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