Pixelligent Technologies LLC

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 12350
 
  
 
C30B SINGLE-CRYSTAL GROWTH 947
 
  
 
B82Y SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE  OR TREATMENT OF NANO-STRUCTURES944
 
  
 
C08K USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS 795
 
  
 
H01B CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING, OR DIELECTRIC PROPERTIES 767
 
  
 
C09K MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR392
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 3101
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 285
 
  
 
C07F ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM, OR TELLURIUM 268
 
  
 
C09D COATING COMPOSITIONS, e.g. PAINTS, VARNISHES, LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR 290

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2018/0023,212 SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALSSep 12, 17Jan 25, 18[H01L, C07F, B82Y, H01B, C30B]
2017/0044,687 SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALSOct 27, 16Feb 16, 17[H01L, C01G, C30B]
2016/0203,981 SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALSMar 21, 16Jul 14, 16[H01L, C07F, H01B, C30B]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9856581 Synthesis, capping and dispersion of nanocrystalsMar 21, 16Jan 02, 18[H01L, C07F, B82Y, H01B, C30B, C08K]
9617657 Synthesis, capping and dispersion of nanocrystalsNov 24, 14Apr 11, 17[C09K, H01L, B82Y, H01B, C30B]
9359689 Synthesis, capping and dispersion of nanocrystalsOct 26, 12Jun 07, 16[H01B, C30B, C08K]
9328432 Synthesis, capping and dispersion of nanocrystalsJun 20, 14May 03, 16[H01L, B82Y, H01B, C30B, C08K]
9207538 Applications of semiconductor nano-sized particles for photolithographyJul 22, 11Dec 08, 15[B82Y, G03F]
9202688 Synthesis, capping and dispersion of nanocrystalsJun 20, 14Dec 01, 15[H01L, B82Y, C30B, C08K]
9048009 Highly conductive compositesNov 21, 12Jun 02, 15[C09K, B05D, B29C, H01B, B01J, B32B, H05K]
8993221 Block co-polymer photoresistFeb 11, 13Mar 31, 15[H01L, B82Y, B81C, G03F]
8920675 Synthesis, capping and dispersion of nanocrystalsOct 26, 11Dec 30, 14[C09K, B05D, B82Y, H01B, C30B]
8883903 Synthesis, capping and dispersion of nanocrystalsOct 16, 13Nov 11, 14[H01L, B82Y, C30B, C08K]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2013/0136,897 RESISTS FOR LITHOGRAPHYAbandonedJan 23, 13May 30, 13[G03F]
2011/0315,914 NANOCOMPOSITES WITH HIGH DIELECTRIC CONSTANTAbandonedJun 29, 11Dec 29, 11[C09K, C03C, C09D, H01F, C08L]
2011/0056,841 SYSTEM AND METHOD FOR DIRECT CONVERSION OF SOLAR ENERGY TO CHEMICAL ENERGYAbandonedSep 09, 10Mar 10, 11[C25B, C07F]
7649615 Advanced exposure techniques for programmable lithographyExpiredMay 02, 07Jan 19, 10[G03B]
7605390 Programmable photolithographic mask based on semiconductor nano-particle optical modulatorsExpiredDec 09, 03Oct 20, 09[H01L]
2009/0239,161 APPLICATIONS OF SEMICONDUCTOR NANO-SIZED PARTICLES FOR PHOTOLITHOGRAPHYAbandonedMar 31, 09Sep 24, 09[G03F]
2009/0220,756 REVERSIBLE PHOTO BLEACHABLE MATERIALS BASED ON NANO SIZED SEMICONDUCTOR PARTICLES AND THEIR OPTICAL APPLICATIONSAbandonedMar 16, 09Sep 03, 09[G01N, H01B, B32B]
7524616 Applications of semiconductor nano-sized particles for photolithographyExpiredMar 04, 04Apr 28, 09[G03F]
7510818 Reversible photobleachable materials based on nano-sized semiconductor particles and their optical applicationsExpiredDec 09, 03Mar 31, 09[G03C]
7050155 Advanced exposure techniques for programmable lithographyExpiredOct 30, 02May 23, 06[G03B]
2006/0098,181 Advanced exposure techniques for programmable lithographyAbandonedDec 23, 05May 11, 06[G03B]
6888616 Programmable photolithographic mask system and methodExpiredJun 25, 03May 03, 05[G03B]
6879376 Method and apparatus for exposing photoresists using programmable masksExpiredNov 18, 02Apr 12, 05[G03C, G03B]
6600551 Programmable photolithographic mask system and methodExpiredJun 12, 02Jul 29, 03[G03B]
6480261 Photolithographic system for exposing a wafer using a programmable maskExpiredJun 04, 01Nov 12, 02[H04N, G03B, A61N, G03F]
2002/0061,472 Three-dimensional lithography by multiple two-dimensional pattern projectionAbandonedNov 19, 01May 23, 02[G03F]
6291110 Methods for transferring a two-dimensional programmable exposure pattern for photolithographyExpiredApr 28, 98Sep 18, 01[G03F]

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