RAYTECH INNOVATIVE SOLUTIONS, INC.
Patent Owner
Stats
- 1 US PATENTS IN FORCE
- 0 US APPLICATIONS PENDING
- Apr 11, 2006 most recent publication
Details
- 1 Issued Patents
- 0 Issued in last 3 years
- 0 Published in last 3 years
- 200 Total Citation Count
- Feb 28, 2002 Earliest Filing
- 8 Expired/Abandoned/Withdrawn Patents
Patent Activity in the Last 10 Years
Technologies
Intl Class
Technology
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Recent Patents
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Expired/Abandoned/Withdrawn Patents
Patent #
Title
Status
Filing Date
Issue/Pub Date
Intl Class
7025668 Gradient polishing pad made from paper-making fibers for use in chemical/mechanical planarization of wafersExpiredJun 18, 03Apr 11, 06[B24B]
6979256 Retaining ring with wear pad for use in chemical mechanical planarizationExpiredAug 24, 04Dec 27, 05[B24B]
6964601 Method for securing a polishing pad to a platen for use in chemical-mechanical polishing of wafersExpiredJul 09, 03Nov 15, 05[B24D]
6945846 Polishing pad for use in chemical/mechanical planarization of semiconductor wafers having a transparent window for end-point determination and method of makingExpiredMar 28, 05Sep 20, 05[B24B]
6899610 Retaining ring with wear pad for use in chemical mechanical planarizationExpiredMay 28, 02May 31, 05[B24B]
6875077 Polishing pad for use in chemical/mechanical planarization of semiconductor wafers having a transparent window for end-point determination and method of makingExpiredMar 17, 03Apr 05, 05[B24B]
6863774 Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making sameExpiredMar 01, 02Mar 08, 05[D21H]
6852020 Polishing pad for use in chemical--mechanical planarization of semiconductor wafers and method of making sameExpiredJan 22, 03Feb 08, 05[B24B]
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