RODEL HOLDINGS, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 165
 
  
 
B24D TOOLS FOR GRINDING, BUFFING, OR SHARPENING 129

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
6783436 Polishing pad with optimized grooves and method of forming sameApr 29, 03Aug 31, 04[B24B, B24D]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2003/0194,960 Multiple polymer belt used as a carrier in a linear belt polishing systemAbandonedApr 10, 02Oct 16, 03[B24B]
2003/0139,047 Metal polishing slurry having a static etch inhibitor and method of formulationAbandonedJan 24, 02Jul 24, 03[H01L]
2003/0139,122 Polishing pad for a chemical mechanical planarization or polishing (CMP) systemAbandonedJan 24, 02Jul 24, 03[B24B]
2003/0119,692 Copper polishing cleaning solutionAbandonedJan 16, 02Jun 26, 03[C11D]
2003/0037,697 Second step polishing by CMPAbandonedAug 21, 01Feb 27, 03[C09G]
2003/0013,386 Chemical mechanical polishing compositions and methods relating theretoAbandonedMay 17, 02Jan 16, 03[B24B]
2003/0013,397 Polishing pad of polymer coatingAbandonedJun 27, 01Jan 16, 03[B24D]
2003/0006,396 Polishing composition for CMP having abrasive particlesAbandonedMay 31, 02Jan 09, 03[C09K, C09C]
2002/0193,058 Polishing apparatus that provides a windowAbandonedMay 16, 02Dec 19, 02[B24D]
2002/0182,401 Pad conditioner with uniform particle heightAbandonedJun 01, 01Dec 05, 02[B32B]
2002/0173,243 Polishing composition having organic polymer particlesAbandonedJan 23, 02Nov 21, 02[B24B]
2002/0132,560 Polishing method for selective chemical mechanical polishing of semiconductor substratesAbandonedJan 12, 01Sep 19, 02[B24B]
2002/0111,027 Polishing compositions for noble metalsAbandonedDec 11, 00Aug 15, 02[H01L]
2002/0104,764 Electropolishing and chemical mechanical planarizationAbandonedNov 20, 01Aug 08, 02[C25F]
2002/0062,600 Polishing compositionAbandonedAug 09, 01May 30, 02[C09K, C09G]
2002/0058,462 Chemical mechanical polishing of dielectric materialsAbandonedSep 26, 01May 16, 02[B24B]
2002/0058,468 Semiconductor polishing padAbandonedMay 03, 01May 16, 02[B24D]
2002/0045,349 Method for chemical-mechanical-polishing a substrateAbandonedMar 22, 01Apr 18, 02[H01L]
2002/0042,199 Polishing by CMP for optimized planarizationAbandonedSep 20, 01Apr 11, 02[C09K, H01L]
2002/0042,200 Method for conditioning polishing padsAbandonedSep 28, 01Apr 11, 02[H01L]

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