RUDOLPH TECHNOLOGIES, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G06K RECOGNITION OF DATA; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS 51147
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 45161
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS3168
 
  
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 23136
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 16346
 
  
 
H04N PICTORIAL COMMUNICATION, e.g. TELEVISION 9233
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 790
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 7440
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 6199
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 573

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0254,757 SYSTEM AND METHOD OF CHARACTERIZING MICRO-FABRICATION PROCESSESMay 22, 17Sep 07, 17[G01N]
2017/0045,463 VOLUMETRIC SUBSTRATE SCANNERApr 21, 15Feb 16, 17[G01N, G01B]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9772183 Flying sensor headJun 27, 13Sep 26, 17[G01B]
9714825 Wafer shape thickness and trench measurementApr 08, 11Jul 25, 17[G01B]
9684052 Method of measuring and assessing a probe card with an inspection deviceJun 06, 14Jun 20, 17[G01R]
9664625 Inspection of substrates using calibration and imagingSep 27, 13May 30, 17[G01N, G01B]
9658169 System and method of characterizing micro-fabrication processesMar 14, 14May 23, 17[G01N]
9638782 Probe card analysis system and methodJun 18, 13May 02, 17[G01R]
9625832 Planar motor system with increased efficiencySep 27, 13Apr 18, 17[H02K, G03F]
9594230 On-axis focus sensor and methodDec 20, 12Mar 14, 17[H04N, G01N, G02B, G01B]
9587932 System for directly measuring the depth of a high aspect ratio etched feature on a waferApr 29, 16Mar 07, 17[G01N, G01B]
9576862 Optical acoustic substrate assessment system and methodFeb 05, 14Feb 21, 17[H01L, G01N]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2017/0276,758 METHOD OF MEASURING AND ASSESSING A PROBE CARD WITH AN INSPECTION DEVICEAbandonedJun 14, 17Sep 28, 17[G01R]
2016/0042,987 FLEXIBLE HANDLING SYSTEM FOR SEMICONDUCTOR SUBSTRATESAbandonedMar 17, 14Feb 11, 16[H01L]
2015/0277,239 Multiple-Blade Device for Substrate Edge Protection during PhotolithographyAbandonedOct 02, 13Oct 01, 15[G03F]
2015/0234,281 Blade for Substrate Edge Protection During PhotolithographyAbandonedOct 02, 13Aug 20, 15[G03F]
2014/0375,983 MULTIPLE MEASUREMENT TECHNIQUES INCLUDING FOCUSED BEAM SCATTEROMETRY FOR CHARACTERIZATION OF SAMPLESAbandonedApr 14, 14Dec 25, 14[G01N]
2014/0110,582 SYSTEM FOR DIRECTLY MEASURING THE DEPTH OF A HIGH ASPECT RATIO ETCHED FEATURE ON A WAFERAbandonedDec 31, 13Apr 24, 14[G01B]
2012/0287,263 INFRARED INSPECTION OF BONDED SUBSTRATESAbandonedNov 16, 10Nov 15, 12[H01L, H04N]
2012/0189,189 OPTICAL INSPECTION OPTIMIZATIONAbandonedApr 22, 10Jul 26, 12[G06K]
2012/0150,475 APPARATUS FOR OBTAINING PLANARITY MEASUREMENTS WITH RESPECT TO A PROBE CARD ANALYSIS SYSTEMAbandonedJun 14, 11Jun 14, 12[G06F, G01R]
2012/0087,569 AUTOMATED WAFER DEFECT INSPECTION SYSTEM AND A PROCESS OF PERFORMING SUCH INSPECTIONAbandonedOct 14, 11Apr 12, 12[G06K]
8089292 System and method of measuring probe floatExpiredDec 15, 09Jan 03, 12[G01R]
2011/0141,594 REFLECTIVE OBJECTIVEAbandonedFeb 22, 11Jun 16, 11[G02B]
2011/0037,492 WAFER PROBE TEST AND INSPECTION SYSTEMAbandonedMay 15, 08Feb 17, 11[G01R]
2010/0321,671 System for directly measuring the depth of a high aspect ratio etched feature on a waferAbandonedJun 23, 09Dec 23, 10[G01J, G06F, G01B]
2010/0277,717 METHOD AND SYSTEM FOR PROVIDING A HIGH DEFINITION TRIANGULATION SYSTEMAbandonedOct 30, 09Nov 04, 10[G01J, G01B]
2010/0194,406 HIGH-SPEED CAPACITOR LEAKAGE MEASUREMENT SYSTEMS AND METHODSAbandonedDec 01, 09Aug 05, 10[G01R]
7703823 Wafer holding mechanismExpiredJul 11, 05Apr 27, 10[B65G]
2010/0012,855 Wafer ScanningAbandonedJun 02, 06Jan 21, 10[G01N]
2009/0324,056 POLARIZATION IMAGINGAbandonedSep 01, 09Dec 31, 09[G06K]
2009/0306,941 Structure Model description and use for scatterometry-based semiconductor manufacturing process metrologyAbandonedMay 14, 07Dec 10, 09[G06F]

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