S.C. FLUIDS, INC.

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2007/0012,341 SUPERCRITICAL FLUID DELIVERY SYSTEM FOR SEMICONDUCTOR WAFER PROCESSINGAbandonedAug 31, 06Jan 18, 07[B08B]
7108001 Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefromExpiredApr 05, 04Sep 19, 06[B08B]
2006/0029,310 Loadbearing platform with fluid support, isolation and rotationAbandonedApr 05, 05Feb 09, 06[F16C]
6935352 Adding energy to a cleaning process fluid for removing photo resist, residues and particles from semiconductor substrates, photo masks, reticles, disks and flat-panel displaysExpiredJan 12, 04Aug 30, 05[B08B]
2004/0139,987 Method for releasing and drying moveable elements of micro-electronic mechanical structures with organic thin film sacrificial layersAbandonedJan 13, 04Jul 22, 04[B08B]
2004/0025,908 Supercritical fluid delivery system for semiconductor wafer processingAbandonedAug 05, 03Feb 12, 04[B08B]
6612317 Supercritical fluid delivery and recovery system for semiconductor wafer processingExpiredApr 18, 01Sep 02, 03[B08B]
6602349 Supercritical fluid cleaning process for precision surfacesExpiredMay 18, 01Aug 05, 03[B08B]
2003/0116,176 Supercritical fluid processes with megasonicsAbandonedJan 24, 03Jun 26, 03[C25F]
6508259 Inverted pressure vessel with horizontal through loadingExpiredAug 04, 00Jan 21, 03[B08B]
6497239 Inverted pressure vessel with shielded closure mechanismExpiredFeb 05, 01Dec 24, 02[B01J]
2002/0017,521 Pressure vessel with internal self sealing doorAbandonedAug 10, 01Feb 14, 02[B65D]
6334266 Supercritical fluid drying system and method of useExpiredSep 20, 00Jan 01, 02[F26B]
6067728 Supercritical phase wafer drying/cleaning systemExpiredFeb 13, 98May 30, 00[F26B]

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