SEH AMERICA, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C30B SINGLE-CRYSTAL GROWTH 2432
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 15347
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS396
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 264
 
  
 
B65G TRANSPORT OR STORAGE DEVICES, e.g. CONVEYERS FOR LOADING OR TIPPING; SHOP CONVEYER SYSTEMS; PNEUMATIC TUBE CONVEYERS 265
 
  
 
C23G CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS 211
 
  
 
B01D SEPARATION 1133
 
  
 
B02B PREPARING GRAIN FOR MILLING; REFINING GRANULAR FRUIT TO COMMERCIAL PRODUCTS BY WORKING THE SURFACE 16
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 157
 
  
 
B28D WORKING STONE OR STONE-LIKE MATERIALS 121

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
7137405 Low pressure check valveMay 05, 04Nov 21, 06[F16K]
6808564 In-situ post epitaxial treatment processMar 12, 03Oct 26, 04[C30B]
6673147 High resistivity silicon wafer having electrically inactive dopant and method of producing sameDec 06, 01Jan 06, 04[C30B]
6669775 High resistivity silicon wafer produced by a controlled pull rate czochralski methodDec 06, 01Dec 30, 03[C20B]
6669777 Method of producing a high resistivity silicon wafer utilizing heat treatment that occurs during device fabricationDec 06, 01Dec 30, 03[C30B]
6649427 Method for evaluating impurity concentrations in epitaxial susceptorsNov 14, 01Nov 18, 03[H01L]
6632277 Optimized silicon wafer gettering for advanced semiconductor devicesJan 11, 01Oct 14, 03[C30B]
6632688 Method for evaluating impurity concentrations in epitaxial reagent gasesNov 14, 01Oct 14, 03[H01L]
6620632 Method for evaluating impurity concentrations in semiconductor substratesApr 06, 00Sep 16, 03[H01L]
6583024 High resistivity silicon wafer with thick epitaxial layer and method of producing sameDec 06, 01Jun 24, 03[H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
7229601 Ammonia reclamation systemExpiredFeb 06, 04Jun 12, 07[C01C]
7196009 Lapping carrier, apparatus for lapping a wafer and method of fabricating a lapping carrierExpiredMay 09, 03Mar 27, 07[H01L]
7112509 Method of producing a high resistivity SIMOX silicon substrateExpiredMay 09, 03Sep 26, 06[H01L]
2006/0211,349 Wafer polishing template for polishing semiconductor wafers in a wax free polishing processAbandonedMar 18, 05Sep 21, 06[B24B]
7059943 Method and apparatus for recycling slurryExpiredJun 28, 01Jun 13, 06[B24B]
2005/0229,857 Support fixture for semiconductor wafers and associated fabrication methodAbandonedApr 16, 04Oct 20, 05[C23C]
2005/0161,808 Wafer, intermediate wafer assembly and associated method for fabricating a silicon on insulator wafer having an improved edge profileAbandonedJan 22, 04Jul 28, 05[H01L]
2005/0128,572 Jig for microscopic inspection of bulk micro defects in single crystalsAbandonedDec 12, 03Jun 16, 05[G02B]
6896727 Method of determining nitrogen concentration within a waferExpiredJun 28, 02May 24, 05[C30B]
6889684 Apparatus, system and method for cutting a crystal ingotExpiredNov 06, 02May 10, 05[B28D]
2005/0087,126 Non-contact orbit control system for Czochralski crystal growthAbandonedOct 22, 03Apr 28, 05[C30B]
2005/0066,888 Active dampening orbit stopper for Czochralski crystal growthAbandonedSep 30, 03Mar 31, 05[C30B]
2005/0053,535 Gettering filter and associated method for removing oxygen from a gasAbandonedSep 08, 03Mar 10, 05[C01B, H01L]
6849548 Method of reducing particulate contamination during polishing of a waferExpiredApr 05, 02Feb 01, 05[H01L]
6825487 Method for isolation of wafer support-related crystal defectsExpiredJul 30, 02Nov 30, 04[G01N]
2004/0213,376 Method for locating an alignment feature of a crystalline bodyAbandonedMay 17, 04Oct 28, 04[G01N, G02F]
6798526 Methods and apparatus for predicting oxygen-induced stacking fault density in wafersExpiredSep 12, 02Sep 28, 04[G01B]
6794227 Method of producing an SOI waferExpiredJun 28, 02Sep 21, 04[H01L]
2004/0176,916 System and method for collecting, storing, and displaying process data including particle measurement dataAbandonedMar 11, 04Sep 09, 04[G06F]
2004/0157,461 Method for fabricating a wafer including dry etching the edge of the waferAbandonedFeb 10, 03Aug 12, 04[H01L]

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