SEMICONDUCTOR PHYSICS LABORATORY, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 7152
 
 
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 6200
 
 
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS495
 
 
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 2360
 
 
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 177
 
 
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 1127

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
7190458 Use of scanning beam for differential evaluation of adjacent regions for change in reflectivityDec 09, 03Mar 13, 07[G01N]
7136163 Differential evaluation of adjacent regions for change in reflectivityDec 09, 03Nov 14, 06[G01J]
7130055 Use of coefficient of a power curve to evaluate a semiconductor waferOct 29, 04Oct 31, 06[G01B]
7078711 Matching dose and energy of multiple ion implantersFeb 13, 04Jul 18, 06[H01J]
6963393 Measurement of lateral diffusion of diffused layersSep 23, 02Nov 08, 05[H01L, G01N]
6885458 Apparatus and method for determining the active dopant profile in a semiconductor waferAug 19, 02Apr 26, 05[G01B]
6878559 Measurement of lateral diffusion of diffused layersSep 23, 02Apr 12, 05[H01L]
6812717 Use of a coefficient of a power curve to evaluate a semiconductor waferMar 05, 01Nov 02, 04[G01N, G01R]
6489801 Apparatus and method for evaluating a semiconductor waferApr 06, 00Dec 03, 02[G01N, G01R]
6483594 Apparatus and method for determining the active dopant profile in a semiconductor waferNov 26, 01Nov 19, 02[G01B]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
7362108 Method and system for measurement of sidewall damage in etched dielectric structures using a near field microwave probeExpiredOct 14, 05Apr 22, 08[G01R]
7285963 Method and system for measurement of dielectric constant of thin films using a near field microwave probeExpiredApr 08, 05Oct 23, 07[H01P]
7282941 Method of measuring semiconductor wafers with an oxide enhanced probeExpiredApr 05, 05Oct 16, 07[G01R]
7102363 Method and system for non-contact measurement of microwave capacitance of miniature structures of integrated circuitsExpiredMay 26, 05Sep 05, 06[G01R]
7063992 Semiconductor substrate surface preparation using high temperature convection heatingExpiredAug 08, 03Jun 20, 06[H01L]
6991948 Method of electrical characterization of a silicon-on-insulator (SOI) waferExpiredNov 05, 03Jan 31, 06[H01L]
6856140 System and method for quantitative measurements of a material's complex permittivity with use of near-field microwave probesExpiredApr 14, 03Feb 15, 05[G01R]
6842029 Non-invasive electrical measurement of semiconductor wafersExpiredApr 11, 02Jan 11, 05[G01R]
6741093 Method of determining one or more properties of a semiconductor waferExpiredMar 18, 02May 25, 04[G01R]
6657454 High speed threshold voltage and average surface doping measurementsExpiredMar 15, 02Dec 02, 03[G01R]
6632691 Apparatus and method for determining doping concentration of a semiconductor waferExpiredApr 11, 02Oct 14, 03[G01R]
6597185 Apparatus for localized measurements of complex permittivity of a materialExpiredSep 20, 00Jul 22, 03[G01N, G01R]
6492827 Non-invasive electrical measurement of semiconductor wafersExpiredOct 19, 00Dec 10, 02[G01R]
6150832 Noncontact capacitance measuring deviceExpiredMar 19, 99Nov 21, 00[G01R]

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