SHANGHAI HUALI MICROELECTRONICS CORPORATION

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 55307
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 4443
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS396
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 299
 
  
 
G11C STATIC STORES 2149
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 157
 
  
 
B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING 165
 
  
 
C25F PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR 117
 
  
 
G01R MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES 1158
 
  
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 1204

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0345,722 HIGH-K METAL GATE DEVICE AND MANUFATURING METHOD THEREOFAug 12, 16Nov 30, 17[H01L]
2017/0345,723 HIGH-K METAL GATE DEVICE AND MANUFATURING METHOD THEREOFMay 17, 17Nov 30, 17[H01L]
2017/0288,057 KITE SHAPED CAVITY FOR EMBEDDING MATERIALApr 17, 16Oct 05, 17[H01L]
2017/0250,265 SEMICONDUCTOR DEVICE WITH SHAPED CAVITIES FOR EMBEDDING GERMANIUM MATERIAL AND DOUBLE TRENCH MANUFACTURING PROCESSES THEREOFMay 15, 17Aug 31, 17[H01L]
2017/0062,583 METHODS AND SYSTEMS FOR REDUCING DISLOCATION DEFECTS IN HIGH CONCENTRATION EPITAXY PROCESSESOct 08, 15Mar 02, 17[H01L]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9871064 Method for forming shallow trenches of the dual active regionsSep 30, 16Jan 16, 18[H01L]
9842743 Method of etching a shallow trenchDec 22, 16Dec 12, 17[H01L]
9831251 Method of fabricating semiconductor device and semiconductor device fabricated therebyAug 12, 16Nov 28, 17[H01L]
9680023 Method of manufacturing a dual-gate FinFETAug 12, 16Jun 13, 17[H01L]
9666472 Method for establishing mapping relation in STI etch and controlling critical dimension of STIMar 29, 16May 30, 17[H01L]
9583619 Semiconductor devices with shaped cavities for embedding germanium material and manufacturing processes thereofApr 20, 15Feb 28, 17[H01L]
9583620 Shaped cavity for SiGe filling materialMay 08, 15Feb 28, 17[H01L]
9570562 Method of planarizing polysilicon gateAug 12, 16Feb 14, 17[H01L]
9570582 Method of removing dummy gate dielectric layerAug 12, 16Feb 14, 17[H01L]
9449866 Methods and systems for using oxidation layers to improve device surface uniformityJan 06, 15Sep 20, 16[H01L]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0322,476 METHOD OF MANUFACTURING A FIN FIELD EFFECT TRANSISTORAbandonedJul 06, 15Nov 03, 16[H01L]
2016/0308,051 SHAPED CAVITY FOR SIGE FILLING MATERIALAbandonedMay 08, 15Oct 20, 16[H01L]
2016/0291,458 METHOD INTEGRATING TARGET OPTIMIZATION AND OPTICAL PROXIMITY CORRECTIONAbandonedJun 29, 15Oct 06, 16[G06F, G03F]
2016/0240,680 SEMICONDUCTOR DEVICE HAVING A SILICON AND GERMANIUM MATERIAL FILLING A CAVITY REGION COMPRISING A NOTCH REGION FORMED WITHIN A SEMICONDUCTOR SUBSTRATEAbandonedApr 20, 15Aug 18, 16[H01L]
2015/0064,930 PROCESS OF MANUFACTURING THE GATE OXIDE LAYERAbandonedNov 18, 13Mar 05, 15[H01L]
2015/0017,785 METHOD OF FORMING SALICIDE BLOCK WITH REDUCED DEFECTSAbandonedNov 15, 13Jan 15, 15[H01L]
2015/0017,814 METHOD OF FORMING GATE OXIDE LAYERAbandonedNov 19, 13Jan 15, 15[H01L]
2015/0004,767 METHOD OF FORMING NICKEL SALICIDE ON A SILICON-GERMANIUM LAYERAbandonedDec 05, 13Jan 01, 15[H01L]
2014/0357,056 METHOD OF FORMING SIGMA-SHAPED TRENCHAbandonedNov 27, 13Dec 04, 14[H01L]
2014/0357,070 METHOD OF IMPROVING THE YIELD OF A SEMICONDUCTOR DEVICEAbandonedNov 20, 13Dec 04, 14[H01L]
2014/0346,510 DEVICE STRUCTURE SUITABLE FOR PARALLEL TESTAbandonedNov 19, 13Nov 27, 14[H01L]
2014/0349,464 METHOD FOR FORMING DUAL STI STRUCTUREAbandonedOct 16, 13Nov 27, 14[H01L]
2014/0322,879 METHOD OF FORMING SIGMA-SHAPED TRENCHAbandonedNov 21, 13Oct 30, 14[H01L]
2014/0302,254 PLASMA CLEANING METHODAbandonedNov 15, 13Oct 09, 14[H01L]
2014/0302,656 Method of Forming Ultra Shallow JunctionAbandonedNov 27, 13Oct 09, 14[H01L]
2014/0273,465 METHOD OF FORMING DUAL GATE OXIDEAbandonedOct 17, 13Sep 18, 14[H01L]
2014/0145,284 PHOTODIODE FOR AN IMAGE SENSOR AND METHOD OF FABRICATING THE SAMEAbandonedOct 16, 13May 29, 14[H01L]
2014/0147,999 METHOD OF FORMING GATE STRUCTUREAbandonedNov 15, 13May 29, 14[H01L]
2014/0124,849 B4-FLASH DEVICE AND THE MANUFACTURING METHOD THEROFAbandonedNov 01, 13May 08, 14[H01L]
2014/0104,745 MIM CAPACITOR AND FABRICATION METHOD THEREOFAbandonedDec 28, 12Apr 17, 14[H01G]

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