SIEMENS COMPONENTS, INC.

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Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03B APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR 196
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 1361

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
6025639 Crack stopsApr 16, 98Feb 15, 00[H01L]
5712698 Independently controllable shutters and variable area apertures for off axis illuminationMar 04, 96Jan 27, 98[G03B]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
6265278 Deep trench cell capacitor with inverting counter electrodeExpiredMay 14, 98Jul 24, 01[H01L]
6103592 Manufacturing self-aligned polysilicon fet devices isolated with maskless shallow trench isolation and gate conductor fill technology with active devices and dummy doped regions formed in mesasExpiredMay 01, 97Aug 15, 00[H01L]
6057220 Titanium polycide stabilization with a porous barrierExpiredSep 23, 97May 02, 00[H01L]
5804490 Method of filling shallow trenchesExpiredApr 14, 97Sep 08, 98[H01L]
5800626 Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substratesExpiredFeb 18, 97Sep 01, 98[B08B]
5763315 Shallow trench isolation with oxide-nitride/oxynitride linerExpiredJan 28, 97Jun 09, 98[H01L]
5750414 Method of fabricating a semiconductor deviceExpiredOct 26, 94May 12, 98[H01R]
5735457 Rubber mixture for an elastic intermediate layer for a rail supportExpiredFeb 26, 96Apr 07, 98[E01B]
5637151 Method for reducing metal contamination of silicon wafers during semiconductor manufacturingExpiredJun 27, 94Jun 10, 97[C03C]
4900954 Mixed CML/ECL macro circuitryExpiredNov 30, 88Feb 13, 90[H03K, G06F]

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