SPUTTERING COMPONENTS, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 992
 
  
 
C25B ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON- METALS; APPARATUS THEREFOR 233
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 2126
 
  
 
H05B ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR 1110
 
  
 
H05H PLASMA TECHNIQUE 129

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
RE46599 Sputtering apparatusNov 30, 16Nov 07, 17[C23C, H01J]
9758862 Sputtering apparatusSep 03, 13Sep 12, 17[C23C, H01J]
9418823 Sputtering apparatusSep 06, 13Aug 16, 16[C23C, H01J, C25B]
9406487 Plasma enhanced chemical vapor deposition (PECVD) sourceDec 23, 13Aug 02, 16[H01J, H05B]
9312108 Sputtering apparatusApr 28, 14Apr 12, 16[C23C, H01J, C25B]
9198274 Ion control for a plasma sourceJul 01, 13Nov 24, 15[C23C, H01J, H05H]
8900428 Sputtering apparatusJan 06, 12Dec 02, 14[C23C, H01J]
8182662 Rotary cathode for magnetron sputtering apparatusMar 27, 09May 22, 12[C23C, C25B]
6905579 Cylindrical magnetron target and spindle apparatusFeb 13, 03Jun 14, 05[C23C]
6841051 High-power ion sputtering magnetronJan 23, 04Jan 11, 05[C23C]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2016/0225,591 SPUTTERING APPARATUSAbandonedApr 08, 16Aug 04, 16[H01J, C23C]
9362093 Plasma enhanced chemical vapor deposition (PECVD) sourceWithdrawnDec 23, 13Jun 07, 16[H01J, H05B]
2016/0064,191 ION CONTROL FOR A PLASMA SOURCEAbandonedNov 12, 15Mar 03, 16[H01J, C23C]
2015/0120,001 DECENTRALIZED PROCESS CONTROLLERAbandonedOct 31, 13Apr 30, 15[G05B]
2013/0032,476 ROTARY CATHODES FOR MAGNETRON SPUTTERING SYSTEMAbandonedJul 31, 12Feb 07, 13[C23C]
2011/0155,568 INDEXING MAGNET ASSEMBLY FOR ROTARY SPUTTERING CATHODEAbandonedDec 29, 09Jun 30, 11[C23C]
2011/0024,987 MECHANICAL SEAL ASSEMBLY FOR A ROTATABLE SHAFTAbandonedJul 31, 09Feb 03, 11[F16J]
2003/0173,217 High-power ion sputtering magnetronAbandonedMar 14, 02Sep 18, 03[C23C]

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