STEAG RTP SYSTEMS, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 672
 
  
 
H05B ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR 6105
 
  
 
A21B BAKERS' OVENS; MACHINES OR EQUIPMENT FOR BAKING 514
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 596
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 4358
 
  
 
F26B DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM 228
 
  
 
F27B FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS222
 
  
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 2204
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 244
 
  
 
F27D DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE 124

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
7037797 Localized heating and cooling of substratesMar 17, 00May 02, 06[H01L]
6717158 Heating device for heating semiconductor wafers in thermal processing chambersJan 06, 00Apr 06, 04[H01L]
6281141 Process for forming thin dielectric layers in semiconductor devicesFeb 08, 99Aug 28, 01[H01L]
6222990 Heating element for heating the edges of wafers in thermal processing chambersDec 03, 97Apr 24, 01[A21B]
6204484 System for measuring the temperature of a semiconductor wafer during thermal processingMar 31, 98Mar 20, 01[C23C, F26B, A21B]
6075922 Process for preventing gas leaks in an atmospheric thermal processing chamberAug 07, 97Jun 13, 00[F26B, A21B]
6056434 Apparatus and method for determining the temperature of objects in thermal processing chambersMar 12, 98May 02, 00[G01J, H05B, G01N]
6034357 Apparatus and process for measuring the temperature of semiconductor wafers in the presence of radiation absorbing gasesJun 08, 98Mar 07, 00[C23C]
6027244 Apparatus for determining the temperature of a semi-transparent radiating bodyJul 24, 97Feb 22, 00[G01J, H05B, G01N, A21B]
5997175 Method for determining the temperature of a semi-transparent radiating bodyJul 22, 99Dec 07, 99[G01J, H05B, G21K, A21B]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
6514876 Pre-metal dielectric rapid thermal processing for sub-micron technologyExpiredAug 23, 00Feb 04, 03[H01L]
6403923 System for controlling the temperature of a reflective substrate during rapid heatingExpiredAug 25, 00Jun 11, 02[F27B]
6359263 System for controlling the temperature of a reflective substrate during rapid heatingExpiredSep 03, 99Mar 19, 02[A21B]
6310328 Rapid thermal processing chamber for processing multiple wafersExpiredDec 10, 98Oct 30, 01[H01L]
6293696 System and process for calibrating pyrometers in thermal processing chambersExpiredMay 03, 99Sep 25, 01[G01K, G01J]
6221766 Method and apparatus for processing refractory metals on semiconductor substratesExpiredFeb 16, 99Apr 24, 01[H01L]
6210484 Heating device containing a multi-lamp cone for heating semiconductor wafersExpiredSep 09, 98Apr 03, 01[C23C, F27B]
6200023 Method for determining the temperature in a thermal processing chamberExpiredMar 15, 99Mar 13, 01[G01K]
6174651 Method for depositing atomized materials onto a substrate utilizing light exposure for heatingExpiredJan 14, 99Jan 16, 01[G03F]
6160242 Apparatus and process for measuring the temperature of semiconductor wafers in the presence of radiation absorbing gasesExpiredMar 07, 00Dec 12, 00[F27B]
5980637 System for depositing a material on a substrate using light energyExpiredDec 20, 96Nov 09, 99[B05B]
5970382 Process for forming coatings on semiconductor devicesExpiredJan 26, 98Oct 19, 99[H01L]
5820942 Process for depositing a material on a substrate using light energyExpiredDec 20, 96Oct 13, 98[C08F]
5165796 Bichannel radiation detection apparatusExpiredDec 07, 90Nov 24, 92[G01J]
5156820 Reaction chamber with controlled radiant energy heating and distributed reactant flowExpiredMay 15, 89Oct 20, 92[B01J]
5148714 Rotary/linear actuator for closed chamber, and reaction chamber utilizing sameExpiredOct 24, 90Sep 22, 92[C23C, F16H]
5114242 Bichannel radiation detection methodExpiredDec 07, 90May 19, 92[G01J]
5002630 Method for high temperature thermal processing with reduced convective heat lossExpiredJun 06, 89Mar 26, 91[C30B]
4989991 Emissivity calibration apparatus and methodExpiredJun 12, 89Feb 05, 91[G01J, G01N]
4919542 Emissivity correction apparatus and methodExpiredApr 27, 88Apr 24, 90[G01J, G01N]

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